User contributions for Derose
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- 04:28, 31 October 2022 diff hist +12 Process Recipe Library →Electron Beam Lithography current
- 04:15, 31 October 2022 diff hist +128 Process Recipe Library →Electron Beam Lithography
- 15:02, 3 October 2022 diff hist +2,581 Covid-19 current
- 14:33, 3 October 2022 diff hist −3 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs current
- 14:31, 3 October 2022 diff hist −3 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs current
- 21:48, 6 July 2022 diff hist −9 ORION NanoFab: Helium, Neon & Gallium FIB →Scanning Electron Microscopes (SEMs) current
- 21:48, 6 July 2022 diff hist −10 Dimension Icon: Atomic Force Microscope (AFM) →Scanning Electron & Ion Microscopes current
- 21:47, 6 July 2022 diff hist −139 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Transmission Electron Microscopes current
- 21:47, 6 July 2022 diff hist −9 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Scanning Electron Microscopes (SEMs)
- 21:45, 6 July 2022 diff hist −10 Equipment List →Scanning Electron Microscopes (SEMs)
- 21:43, 6 July 2022 diff hist +41 N Nova 200 NanoLab: SEM, EDS & WDS Derose moved page Nova 200 NanoLab: SEM, EDS & WDS to Nova 200 NanoLab: SEM & EDS: Change of available features current Tag: New redirect
- 21:43, 6 July 2022 diff hist 0 m Nova 200 NanoLab: SEM & EDS Derose moved page Nova 200 NanoLab: SEM, EDS & WDS to Nova 200 NanoLab: SEM & EDS: Change of available features current
- 21:41, 6 July 2022 diff hist −13 Matthew S. Hunt, PhD current Tag: Manual revert
- 21:40, 6 July 2022 diff hist +13 Matthew S. Hunt, PhD
- 05:38, 30 June 2022 diff hist +24 Tube Furnaces for Wet & Dry Processing →Equipment Data current
- 05:38, 30 June 2022 diff hist +13 Nanoscribe PPGT: Microscale 3D Printer →Equipment Data
- 05:37, 30 June 2022 diff hist +13 DWL-66: Direct-Write Laser System →Equipment Data current
- 05:36, 30 June 2022 diff hist +13 Wafer Stepper →Equipment Data current
- 05:35, 30 June 2022 diff hist +17 Contact Mask Aligners: MA6 & MA6/BA6 →Equipment Data current
- 05:34, 30 June 2022 diff hist −109 Equipment List →Laboratory Data
- 05:33, 30 June 2022 diff hist +11 XeF2 Etcher for Silicon →Equipment Data current
- 05:32, 30 June 2022 diff hist +10 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Equipment Data current
- 05:32, 30 June 2022 diff hist +24 ICP-RIE: Dielectric Etcher →Equipment Data current
- 05:31, 30 June 2022 diff hist +19 ICP-RIE: III-V, Metal & Silicon Etcher →Equipment Data current
- 05:30, 30 June 2022 diff hist +18 DRIE: Bosch & Cryo ICP-RIE for Silicon →Equipment Data current
- 05:29, 30 June 2022 diff hist +16 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Equipment Data current
- 05:29, 30 June 2022 diff hist +7 FlexAL II: Atomic Layer Deposition (ALD) →Equipment Data current
- 05:28, 30 June 2022 diff hist +22 ATC Orion 8: Dielectric Sputter System →Equipment Data current
- 05:28, 30 June 2022 diff hist +17 ATC Orion 8: Chalcogenide Sputter System →Equipment Data current
- 05:27, 30 June 2022 diff hist +4 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Status
- 05:26, 30 June 2022 diff hist +13 CHA: Electron Beam Evaporator →Equipment Data current
- 05:25, 30 June 2022 diff hist +16 Labline: Electron Beam Evaporator →Equipment Data current
- 05:24, 30 June 2022 diff hist −103 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Equipment Data current
- 05:24, 30 June 2022 diff hist −105 Carbon Evaporator →Equipment Data current
- 05:21, 30 June 2022 diff hist +16 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Equipment Data current
- 05:20, 30 June 2022 diff hist +10 Sirion: SEM & EDS →Equipment Data current
- 05:19, 30 June 2022 diff hist +20 Nova 200 NanoLab: SEM & EDS →Equipment Data
- 05:19, 30 June 2022 diff hist +19 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Equipment Data current
- 05:18, 30 June 2022 diff hist +17 ORION NanoFab: Helium, Neon & Gallium FIB →Equipment Data
- 05:17, 30 June 2022 diff hist +15 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Equipment Data
- 05:16, 30 June 2022 diff hist +19 EBPG 5000+: 100 kV Electron Beam Lithography →Equipment Data
- 15:42, 29 June 2022 diff hist +2 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 15:42, 29 June 2022 diff hist +23 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 15:37, 29 June 2022 diff hist −7 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 01:30, 29 June 2022 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 18:51, 13 May 2022 diff hist −112 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 18:50, 13 May 2022 diff hist −112 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 18:11, 21 January 2022 diff hist +25 KNI Staff Members current
- 00:32, 16 December 2021 diff hist +4 Contact Mask Aligners: MA6 & MA6/BA6
- 00:31, 16 December 2021 diff hist +77 KNI Staff Members
- 17:56, 4 November 2021 diff hist +148 Email Lists
- 01:19, 12 October 2021 diff hist +124 Equipment List →Microscopy
- 01:17, 12 October 2021 diff hist −138 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Transmission Electron Microscopes
- 01:17, 12 October 2021 diff hist +87 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →SOPs & Troubleshooting
- 01:16, 12 October 2021 diff hist +87 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting
- 01:15, 12 October 2021 diff hist +88 Sirion: SEM & EDS →SOPs & Troubleshooting
- 01:14, 12 October 2021 diff hist +88 Nova 200 NanoLab: SEM & EDS →SOPs & Troubleshooting
- 01:11, 12 October 2021 diff hist +88 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →SOPs & Troubleshooting
- 01:11, 12 October 2021 diff hist +87 ORION NanoFab: Helium, Neon & Gallium FIB →SOPs & Troubleshooting
- 17:00, 11 October 2021 diff hist +1 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 16:59, 11 October 2021 diff hist +1 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 04:07, 11 October 2021 diff hist +95 Lab Rules & Safety →KNI Lab General SOPs
- 22:49, 1 October 2021 diff hist +87 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 22:42, 21 September 2021 diff hist +1 DRIE: Bosch & Cryo ICP-RIE for Silicon
- 00:14, 24 August 2021 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 00:14, 24 August 2021 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 05:31, 17 August 2021 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 03:03, 23 July 2021 diff hist +96 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:35, 22 July 2021 diff hist +6,467 N LabRunr Information Instructions and resources to use LabRunr equipment scheduling, tracking, and billing system current
- 18:50, 2 July 2021 diff hist +3 Carbon Evaporator
- 18:49, 2 July 2021 diff hist +3 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner
- 18:48, 2 July 2021 diff hist +4 Dimension Icon: Atomic Force Microscope (AFM)
- 18:41, 2 July 2021 diff hist −3 Quanta 200F: SEM, ESEM, Lithography & Probe Station
- 18:40, 2 July 2021 diff hist −4 Nova 200 NanoLab: SEM & EDS
- 18:40, 2 July 2021 diff hist −4 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
- 18:39, 2 July 2021 diff hist −4 ORION NanoFab: Helium, Neon & Gallium FIB
- 18:39, 2 July 2021 diff hist −3 Sirion: SEM & EDS
- 16:25, 2 July 2021 diff hist +1 Nova 200 NanoLab: SEM & EDS
- 16:23, 2 July 2021 diff hist +1 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
- 16:22, 2 July 2021 diff hist +4 ORION NanoFab: Helium, Neon & Gallium FIB
- 02:03, 30 June 2021 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 02:03, 30 June 2021 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 04:50, 23 June 2021 diff hist +110 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 04:50, 23 June 2021 diff hist +110 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 06:22, 3 June 2021 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 06:21, 3 June 2021 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 18:08, 29 May 2021 diff hist −14 ORION NanoFab: Helium, Neon & Gallium FIB
- 18:07, 29 May 2021 diff hist −13 Carbon Evaporator
- 18:06, 29 May 2021 diff hist −13 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner
- 18:06, 29 May 2021 diff hist −7 Dimension Icon: Atomic Force Microscope (AFM)
- 18:04, 29 May 2021 diff hist −7 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography
- 18:04, 29 May 2021 diff hist −7 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF
- 18:03, 29 May 2021 diff hist −7 Sirion: SEM & EDS
- 18:02, 29 May 2021 diff hist −7 Nova 200 NanoLab: SEM & EDS
- 18:01, 29 May 2021 diff hist −7 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
- 18:01, 29 May 2021 diff hist 0 Quanta 200F: SEM, ESEM, Lithography & Probe Station
- 18:00, 29 May 2021 diff hist −7 Quanta 200F: SEM, ESEM, Lithography & Probe Station
- 02:24, 26 May 2021 diff hist +639 Lab Rules & Safety →KNI Lab Rules and Safety Documents
- 21:02, 24 May 2021 diff hist +88 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:28, 11 May 2021 diff hist +96 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 17:18, 11 May 2021 diff hist +101 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 17:18, 29 April 2021 diff hist +113 Lab Rules & Safety
- 16:04, 7 April 2021 diff hist +128 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 16:04, 7 April 2021 diff hist +150 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 17:40, 4 March 2021 diff hist +139 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 17:40, 4 March 2021 diff hist +139 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 20:22, 11 February 2021 diff hist +125 Nova 200 NanoLab: SEM & EDS →Resources
- 18:35, 10 February 2021 diff hist +26 Nova 200 NanoLab: SEM & EDS →Video Tutorials
- 05:42, 9 February 2021 diff hist +7 Nova 200 NanoLab: SEM & EDS →Video Tutorials
- 18:18, 8 February 2021 diff hist +135 Nova 200 NanoLab: SEM & EDS →Manufacturer Manuals
- 18:16, 8 February 2021 diff hist −5 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Related Instrumentation in the KNI
- 18:16, 8 February 2021 diff hist −102 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Manufacturer Manuals
- 18:14, 8 February 2021 diff hist −4 Nova 200 NanoLab: SEM & EDS →Scanning Electron Microscopes (SEMs)
- 18:11, 8 February 2021 diff hist −4 Equipment List →Scanning Electron Microscopes (SEMs)
- 21:12, 5 February 2021 diff hist −71 Nova 200 NanoLab: SEM & EDS
- 22:01, 29 January 2021 diff hist +100 Nova 200 NanoLab: SEM & EDS →Manufacturer Manuals
- 07:00, 4 November 2020 diff hist +112 Lab Rules & Safety →KNI Lab General SOPs
- 22:00, 27 October 2020 diff hist +90 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:59, 27 October 2020 diff hist +90 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:39, 27 October 2020 diff hist +44 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Specifications and Manuals
- 15:38, 27 October 2020 diff hist +44 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:38, 27 October 2020 diff hist +154 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 15:37, 27 October 2020 diff hist +44 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:36, 27 October 2020 diff hist +154 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 01:04, 15 October 2020 diff hist +320 FlexAL II: Atomic Layer Deposition (ALD) →ALD Precursor List
- 00:15, 15 October 2020 diff hist +442 FlexAL II: Atomic Layer Deposition (ALD) →ALD Gas List
- 23:59, 14 October 2020 diff hist +401 FlexAL II: Atomic Layer Deposition (ALD) →Description
- 17:11, 14 October 2020 diff hist +7 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner
- 17:09, 14 October 2020 diff hist +7 Carbon Evaporator
- 17:08, 14 October 2020 diff hist +7 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography
- 17:08, 14 October 2020 diff hist +7 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF
- 17:07, 14 October 2020 diff hist +7 ORION NanoFab: Helium, Neon & Gallium FIB
- 17:06, 14 October 2020 diff hist +7 Quanta 200F: SEM, ESEM, Lithography & Probe Station
- 17:05, 14 October 2020 diff hist +7 Sirion: SEM & EDS
- 16:46, 14 October 2020 diff hist +7 Nova 200 NanoLab: SEM & EDS
- 16:44, 14 October 2020 diff hist +7 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
- 16:36, 12 October 2020 diff hist +1,134 Nanoscribe PPGT: Microscale 3D Printer
- 16:35, 12 October 2020 diff hist +1,171 DWL-66: Direct-Write Laser System
- 16:35, 12 October 2020 diff hist +1,211 Wafer Stepper
- 16:34, 12 October 2020 diff hist +1,167 Contact Mask Aligners: MA6 & MA6/BA6
- 16:31, 12 October 2020 diff hist +87 Equipment List →Optical Lithography
- 16:28, 12 October 2020 diff hist +276 CNI-PV 2.1: Nano Imprint Lithography
- 16:12, 12 October 2020 diff hist +81 N File:NILT Imprint process.png Flow diagram of an imprint process from the equipment manufacturer. current
- 16:01, 12 October 2020 diff hist 0 N File:CNI NILT wiki.jpeg current
- 21:06, 6 October 2020 diff hist +127 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 21:06, 6 October 2020 diff hist +127 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 16:20, 2 October 2020 diff hist +138 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 16:20, 2 October 2020 diff hist +138 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 00:38, 1 October 2020 diff hist −4 Carbon Evaporator →Manufacturer Manual
- 23:30, 28 September 2020 diff hist +1 CNI-PV 2.1: Nano Imprint Lithography →Specifications
- 23:29, 28 September 2020 diff hist +3,011 N CNI-PV 2.1: Nano Imprint Lithography Created page with "{{instrument|{{PAGENAME}} |InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System |HeaderColor = #F5A81C |ImageResearch = Research.jpg |ImageInstrument = I..."
- 22:29, 24 September 2020 diff hist +135 EBPG 5000+: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 22:24, 24 September 2020 diff hist +135 EBPG 5200: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 23:55, 18 September 2020 diff hist +8 EBPG 5000+: 100 kV Electron Beam Lithography →Training materials
- 23:54, 18 September 2020 diff hist +8 EBPG 5200: 100 kV Electron Beam Lithography →Training Materials
- 04:31, 16 September 2020 diff hist +84 Lab Rules & Safety →KNI Lab General SOPs
- 17:49, 15 September 2020 diff hist +132 EBPG 5000+: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 17:46, 15 September 2020 diff hist +132 EBPG 5200: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 05:21, 13 September 2020 diff hist +186 Contact Mask Aligners: MA6 & MA6/BA6 →SOPs & Troubleshooting
- 22:10, 22 August 2020 diff hist +195 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Manufacturer Manuals
- 21:53, 22 August 2020 diff hist +117 Sirion: SEM & EDS →Manufacturer Manuals
- 16:52, 20 August 2020 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Training materials
- 16:52, 20 August 2020 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Training Materials
- 23:34, 18 August 2020 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
- 23:34, 18 August 2020 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 21:20, 18 August 2020 diff hist +301 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 20:57, 18 August 2020 diff hist +543 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 21:44, 14 August 2020 diff hist +7 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 21:39, 14 August 2020 diff hist +8 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 19:23, 11 August 2020 diff hist +100 Lab Rules & Safety →KNI Lab General SOPs
- 18:51, 10 August 2020 diff hist +379 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 18:49, 10 August 2020 diff hist +379 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 17:35, 6 August 2020 diff hist +7 Lab Rules & Safety →KNI Lab Rules
- 21:28, 3 August 2020 diff hist +101 Lab Rules & Safety →KNI Lab Rules
- 21:26, 3 August 2020 diff hist +7 Lab Rules & Safety →KNI Lab Rules
- 21:25, 3 August 2020 diff hist +122 Lab Rules & Safety →KNI Lab Rules
- 19:33, 3 August 2020 diff hist +133 ORION NanoFab: Helium, Neon & Gallium FIB →Resources
- 18:01, 3 August 2020 diff hist +121 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 18:00, 3 August 2020 diff hist +121 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 04:37, 3 August 2020 diff hist +133 Carbon Evaporator →Resources
- 04:34, 3 August 2020 diff hist +133 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Resources
- 04:33, 3 August 2020 diff hist +133 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography →Resources
- 04:33, 3 August 2020 diff hist +133 Sirion: SEM & EDS →Resources
- 04:32, 3 August 2020 diff hist +133 Nova 200 NanoLab: SEM & EDS →Resources
- 04:32, 3 August 2020 diff hist +133 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Resources
- 04:31, 3 August 2020 diff hist +133 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Resources
- 05:06, 2 August 2020 diff hist +139 Equipment List →Support Tools
- 05:03, 2 August 2020 diff hist +130 XeF2 Etcher for Silicon →Resources
- 05:02, 2 August 2020 diff hist +130 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Resources
- 05:01, 2 August 2020 diff hist +130 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Resources
- 05:01, 2 August 2020 diff hist +130 ICP-RIE: Dielectric Etcher →Resources
- 05:00, 2 August 2020 diff hist +130 ICP-RIE: III-V, Metal & Silicon Etcher →Resources
- 04:58, 2 August 2020 diff hist +130 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 05:21, 1 August 2020 diff hist +133 Tube Furnaces for Wet & Dry Processing →Resources
- 05:20, 1 August 2020 diff hist +133 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Resources
- 05:19, 1 August 2020 diff hist +133 FlexAL II: Atomic Layer Deposition (ALD) →Resources
- 05:18, 1 August 2020 diff hist +133 ATC Orion 8: Dielectric Sputter System →Resources
- 05:18, 1 August 2020 diff hist +133 ATC Orion 8: Chalcogenide Sputter System →Resources
- 05:16, 1 August 2020 diff hist +133 CHA: Electron Beam Evaporator →Resources
- 05:16, 1 August 2020 diff hist +133 Labline: Electron Beam Evaporator →Resources
- 04:04, 1 August 2020 diff hist +134 Nanoscribe PPGT: Microscale 3D Printer →Resources
- 04:03, 1 August 2020 diff hist +134 DWL-66: Direct-Write Laser System →Resources
- 04:00, 1 August 2020 diff hist +134 Wafer Stepper →Resources
- 03:59, 1 August 2020 diff hist +134 Contact Mask Aligners: MA6 & MA6/BA6 →Resources
- 03:57, 1 August 2020 diff hist +127 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 03:55, 1 August 2020 diff hist +127 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 21:03, 15 June 2020 diff hist +131 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 21:03, 15 June 2020 diff hist +131 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 22:34, 3 May 2020 diff hist +145 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting
- 19:43, 16 April 2020 diff hist +41 ORION NanoFab: Helium, Neon & Gallium FIB →Manufacturer Manuals
- 23:06, 31 March 2020 diff hist +122 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 22:50, 31 March 2020 diff hist +104 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 22:49, 31 March 2020 diff hist +104 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 15:58, 31 March 2020 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 15:57, 31 March 2020 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 14:55, 16 March 2020 diff hist +18 Lab Rules & Safety →KNI Lab Rules and Safety Documents
- 18:26, 11 March 2020 diff hist +14 Lab Rules & Safety →KNI Lab Rules and Safety Documents
- 18:26, 11 March 2020 diff hist +97 Lab Rules & Safety →KNI Lab Rules and Safety Documents
- 22:43, 10 March 2020 diff hist +118 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 22:42, 10 March 2020 diff hist +118 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
- 16:07, 28 February 2020 diff hist +108 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 16:05, 28 February 2020 diff hist +108 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 06:22, 6 February 2020 diff hist +102 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 06:22, 6 February 2020 diff hist +102 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 06:19, 6 February 2020 diff hist +104 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 17:35, 29 January 2020 diff hist +122 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 17:35, 29 January 2020 diff hist +122 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 04:41, 26 January 2020 diff hist +2 Contact Mask Aligners: MA6 & MA6/BA6 →Manufacturer Manuals
- 04:40, 26 January 2020 diff hist +24 Contact Mask Aligners: MA6 & MA6/BA6 →Manufacturer Manuals
- 04:30, 26 January 2020 diff hist +84 Contact Mask Aligners: MA6 & MA6/BA6 →SOPs & Troubleshooting
- 23:24, 20 January 2020 diff hist +103 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 23:22, 20 January 2020 diff hist +116 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Specifications
- 23:21, 20 January 2020 diff hist +112 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 23:20, 20 January 2020 diff hist +112 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 23:18, 20 January 2020 diff hist +212 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 22:27, 10 December 2019 diff hist +86 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 22:27, 10 December 2019 diff hist +86 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 23:15, 5 December 2019 diff hist +98 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 23:15, 5 December 2019 diff hist +98 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 18:24, 5 December 2019 diff hist +92 Contact Mask Aligners: MA6 & MA6/BA6 →Optical Lithography Resources
- 18:22, 5 December 2019 diff hist +92 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 18:21, 5 December 2019 diff hist +92 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
- 15:38, 18 October 2019 diff hist +90 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 15:38, 18 October 2019 diff hist +90 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 16:26, 9 October 2019 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 14:59, 13 September 2019 diff hist +527 EBPG 5000+: 100 kV Electron Beam Lithography
- 14:55, 13 September 2019 diff hist +527 EBPG 5200: 100 kV Electron Beam Lithography
- 18:41, 12 September 2019 diff hist +88 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:41, 12 September 2019 diff hist +88 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:34, 29 August 2019 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:33, 29 August 2019 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:05, 29 August 2019 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:04, 29 August 2019 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:06, 29 August 2019 diff hist +82 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:05, 29 August 2019 diff hist +82 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:43, 25 June 2019 diff hist 0 m EBPG 5000+: 100 kV Electron Beam Lithography →Specifications
- 15:43, 25 June 2019 diff hist +140 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:42, 25 June 2019 diff hist +140 m EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 15:29, 5 June 2019 diff hist +480 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 15:28, 5 June 2019 diff hist +481 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 21:41, 31 May 2019 diff hist +19 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 21:39, 31 May 2019 diff hist +104 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 18:12, 29 May 2019 diff hist 0 m EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 17:23, 29 May 2019 diff hist +628 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Resources
- 17:22, 29 May 2019 diff hist +817 ICP-RIE: Dielectric Etcher →Resources
- 17:14, 29 May 2019 diff hist +781 ICP-RIE: III-V, Metal & Silicon Etcher →Resources
- 16:35, 29 May 2019 diff hist −1 m DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 16:34, 29 May 2019 diff hist +783 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 16:13, 29 May 2019 diff hist +78 FlexAL II: Atomic Layer Deposition (ALD) →Manufacturer Manuals
- 16:06, 29 May 2019 diff hist +472 FlexAL II: Atomic Layer Deposition (ALD) →Process Resources
- 14:31, 29 May 2019 diff hist +173 FlexAL II: Atomic Layer Deposition (ALD) →Resources
- 14:24, 29 May 2019 diff hist +6 Bert Mendoza →Role in the KNI
- 14:22, 29 May 2019 diff hist +48 Guy A. DeRose, PhD →Role in the KNI current
- 14:20, 29 May 2019 diff hist −15 Guy A. DeRose, PhD →Role in the KNI
- 22:22, 28 May 2019 diff hist 0 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Manufacturer Specifications
- 22:13, 28 May 2019 diff hist +34 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Manufacturer Manuals
- 22:03, 28 May 2019 diff hist 0 ATC Orion 8: Chalcogenide Sputter System →Description
- 22:01, 28 May 2019 diff hist +10 Bert Mendoza →Role in the KNI
- 21:59, 28 May 2019 diff hist 0 ATC Orion 8: Dielectric Sputter System →Description
- 21:57, 28 May 2019 diff hist 0 Carbon Evaporator →Manufacturer Specifications
- 21:54, 28 May 2019 diff hist +9 FlexAL II: Atomic Layer Deposition (ALD) →Manufacturer Manuals
- 21:52, 28 May 2019 diff hist +10 FlexAL II: Atomic Layer Deposition (ALD) →Manufacturer Manuals
- 21:46, 28 May 2019 diff hist 0 DWL-66: Direct-Write Laser System →SOPs
- 21:28, 28 May 2019 diff hist +525 FlexAL II: Atomic Layer Deposition (ALD) →Process Documents
- 20:52, 28 May 2019 diff hist +40 Wet Chemistry →Safety Data Sheets (SDS)
- 20:50, 28 May 2019 diff hist −21 Wet Chemistry →Resources
- 20:49, 28 May 2019 diff hist +1,628 Wet Chemistry →Chemicals Provided by the KNI
- 20:06, 28 May 2019 diff hist −43 ICP-RIE: III-V, Metal & Silicon Etcher →System Features
- 20:01, 28 May 2019 diff hist +34 ICP-RIE: III-V, Metal & Silicon Etcher →Manufacturer Manuals
- 19:50, 28 May 2019 diff hist +44 DRIE: Bosch & Cryo ICP-RIE for Silicon →Manufacturer Manuals
- 17:28, 28 May 2019 diff hist −92 ICP-RIE: Dielectric Etcher →SOPs & Troubleshooting
- 17:27, 28 May 2019 diff hist −92 DRIE: Bosch & Cryo ICP-RIE for Silicon →SOPs & Troubleshooting
- 17:14, 28 May 2019 diff hist −174 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →SOPs & Troubleshooting
- 17:14, 28 May 2019 diff hist −499 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Process Documents
- 16:48, 28 May 2019 diff hist +58 Wet Chemistry →Description
- 16:40, 28 May 2019 diff hist 0 m Lab Rules & Safety →KNI Documents
- 16:20, 28 May 2019 diff hist 0 m Scriber-Breaker →Manufacturer Manuals
- 15:45, 28 May 2019 diff hist +2,777 Guy A. DeRose, PhD
- 03:44, 28 May 2019 diff hist +32 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher
- 03:40, 28 May 2019 diff hist +84 Contact Mask Aligners: MA6 & MA6/BA6 →Manufacturer Manuals
- 03:32, 28 May 2019 diff hist +919 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 03:31, 28 May 2019 diff hist +194 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 03:24, 28 May 2019 diff hist +125 Guy A. DeRose, PhD →Role in the KNI
- 20:29, 27 May 2019 diff hist −74 Guy A. DeRose, PhD →Education
- 20:28, 27 May 2019 diff hist +193 Guy A. DeRose, PhD →Role in the KNI
- 21:28, 23 May 2019 diff hist +105 Lab Rules & Safety
- 22:14, 22 May 2019 diff hist +30 m DRIE: Bosch & Cryo ICP-RIE for Silicon
- 22:13, 22 May 2019 diff hist +30 m ICP-RIE: Dielectric Etcher
- 22:11, 22 May 2019 diff hist +76 m ICP-RIE: Dielectric Etcher →Process Documents
- 21:51, 22 May 2019 diff hist +168 m DRIE: Bosch & Cryo ICP-RIE for Silicon →Process Documents
- 21:43, 22 May 2019 diff hist +78 DRIE: Bosch & Cryo ICP-RIE for Silicon →Process Documents
- 21:19, 22 May 2019 diff hist +93 ICP-RIE: Dielectric Etcher →Process Documents
- 21:11, 22 May 2019 diff hist +1,132 DRIE: Bosch & Cryo ICP-RIE for Silicon →Specifications
- 21:03, 22 May 2019 diff hist +101 ICP-RIE: Dielectric Etcher →Resources
- 21:03, 22 May 2019 diff hist −291 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 20:48, 22 May 2019 diff hist −424 EBPG 5200: 100 kV Electron Beam Lithography
- 18:40, 22 May 2019 diff hist +6 m EBPG 5200: 100 kV Electron Beam Lithography →Specifications
- 15:55, 22 May 2019 diff hist −605 ICP-RIE: Dielectric Etcher →Resources
- 15:53, 22 May 2019 diff hist −8 ICP-RIE: Dielectric Etcher →System Specifications
- 15:53, 22 May 2019 diff hist +992 ICP-RIE: Dielectric Etcher →Specifications
- 15:29, 22 May 2019 diff hist +11 ICP-RIE: Dielectric Etcher →Manufacturer Specifications
- 15:24, 22 May 2019 diff hist +81 ICP-RIE: Dielectric Etcher →Manufacturer Manuals
- 15:16, 22 May 2019 diff hist +14 ICP-RIE: Dielectric Etcher →Process Documents
- 21:30, 21 May 2019 diff hist +352 ICP-RIE: Dielectric Etcher →Resources
- 14:59, 21 May 2019 diff hist +560 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 20:40, 14 May 2019 diff hist +92 m EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 15:10, 14 May 2019 diff hist −98 m EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 15:06, 14 May 2019 diff hist +103 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 15:04, 14 May 2019 diff hist +105 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 14:57, 14 May 2019 diff hist +19 m EBPG 5200: 100 kV Electron Beam Lithography
- 22:36, 13 May 2019 diff hist +191 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:28, 10 May 2019 diff hist +4 Usage Rates →Equipment Rates
- 15:17, 10 May 2019 diff hist +56 Email Lists
- 15:13, 10 May 2019 diff hist +3 Lab Phone List →Call the Lab
- 15:17, 7 May 2019 diff hist −12 EBPG 5200: 100 kV Electron Beam Lithography
- 15:16, 7 May 2019 diff hist 0 N File:EBPG-5200-A230.jpg current
- 15:10, 7 May 2019 diff hist +3,938 N EBPG 5000+: 100 kV Electron Beam Lithography Created page with "{{InstrumentInfobox| |InstrumentName = EBPG 5000+ |HeaderColor = #FFFFFF |ImageOne = EBPG-5000-Research-Image.jpg |ImageTwo = EBPG-5000-Instrument-Image.jpg |InstrumentType =..."
- 14:50, 7 May 2019 diff hist 0 File:EBPG-5200-Instrument-Image.jpg Derose uploaded a new version of File:EBPG-5200-Instrument-Image.jpg current
- 04:27, 7 May 2019 diff hist +122 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 04:12, 7 May 2019 diff hist +524 m EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 03:39, 7 May 2019 diff hist +407 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 20:21, 3 May 2019 diff hist −46 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 20:16, 3 May 2019 diff hist +39 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 18:29, 2 May 2019 diff hist +19 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 18:21, 2 May 2019 diff hist 0 Lab Phone List →Call the Staff
- 18:17, 2 May 2019 diff hist +4 Lab Phone List →Call the Lab
- 18:12, 2 May 2019 diff hist +27 Lab Phone List →Other General Numbers
- 18:10, 2 May 2019 diff hist +29 Lab Phone List →Caltech Emergency Number
- 18:08, 2 May 2019 diff hist +932 Lab Phone List →Call the Lab
- 17:34, 2 May 2019 diff hist −1 m EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 17:31, 2 May 2019 diff hist +4 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 17:23, 2 May 2019 diff hist +15 Lab Phone List →Call the Lab
- 17:06, 2 May 2019 diff hist +15 m EBPG 5200: 100 kV Electron Beam Lithography
- 17:04, 2 May 2019 diff hist +22 m EBPG 5200: 100 kV Electron Beam Lithography →Description
- 15:15, 1 May 2019 diff hist +46 N File:EBPG-5200-Instrument-Image.jpg Raith EBPG 5200 Instrument image
- 15:01, 1 May 2019 diff hist −72 EBPG 5200: 100 kV Electron Beam Lithography Cleaned up some text in the description and application section
- 17:47, 30 April 2019 diff hist +6 m EBPG 5200: 100 kV Electron Beam Lithography
- 17:45, 30 April 2019 diff hist +290 EBPG 5200: 100 kV Electron Beam Lithography
- 14:26, 18 April 2019 diff hist 0 m Equipment List →Etching
- 04:10, 18 April 2019 diff hist 0 m Equipment List →Substrate Processing
- 04:08, 18 April 2019 diff hist +1 m Equipment List →Transmission Electron Microscopes (TEMs)
- 04:06, 18 April 2019 diff hist +2 Equipment List →Dry Etching
- 04:03, 18 April 2019 diff hist +1 m Equipment List →Sputtering
- 04:01, 18 April 2019 diff hist +50 m Equipment List →Evaporation
- 04:00, 18 April 2019 diff hist −4 m Equipment List →Optical Lithography
