User contributions for Derose
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10 July 2025
- 17:1817:18, 10 July 2025 diff hist −24 m KNI Staff Members Title current Tag: Visual edit
18 February 2025
- 17:5317:53, 18 February 2025 diff hist −5 Wedge-Wedge Wire Bonder No edit summary current Tag: Visual edit: Switched
- 16:0816:08, 18 February 2025 diff hist +1 Electrical Probing Station No edit summary current Tag: Visual edit: Switched
5 February 2025
- 22:3922:39, 5 February 2025 diff hist 0 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →SOPs & Troubleshooting current
- 22:3822:38, 5 February 2025 diff hist 0 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting current
- 22:3622:36, 5 February 2025 diff hist 0 Sirion: SEM & EDS →SOPs & Troubleshooting current
- 22:3522:35, 5 February 2025 diff hist 0 Nova 200 NanoLab: SEM & EDS →SOPs & Manuals & SDS current
- 22:3522:35, 5 February 2025 diff hist 0 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →SOPs & Manuals & SDS current
- 22:3422:34, 5 February 2025 diff hist 0 ORION NanoFab: Helium, Neon & Gallium FIB →SOPs & Troubleshooting current
- 22:3322:33, 5 February 2025 diff hist 0 Equipment List →Microscopy current
22 January 2025
- 06:1906:19, 22 January 2025 diff hist −10 Wet Chemistry Resources →External Laboratories current Tag: Visual edit
- 06:1606:16, 22 January 2025 diff hist −13 Wet Chemistry Resources →External Laboratories Tag: Visual edit
11 November 2024
- 22:0622:06, 11 November 2024 diff hist −4 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs current
- 22:0522:05, 11 November 2024 diff hist −4 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs current
9 July 2024
- 00:4400:44, 9 July 2024 diff hist +6 Wedge-Wedge Wire Bonder No edit summary
29 June 2024
- 19:2219:22, 29 June 2024 diff hist +2 Wet Chemistry No edit summary
- 19:1719:17, 29 June 2024 diff hist 0 XeF2 Etcher for Silicon No edit summary current
- 19:1619:16, 29 June 2024 diff hist +1 Parylene Coater No edit summary current
- 19:1319:13, 29 June 2024 diff hist 0 CNI-PV 2.1: Nano Imprint Lithography No edit summary current
- 19:1219:12, 29 June 2024 diff hist −1 Wafer Stepper No edit summary current
- 19:1119:11, 29 June 2024 diff hist +6 Contact Mask Aligners: MA6 & MA6/BA6 No edit summary current
21 May 2024
- 21:4921:49, 21 May 2024 diff hist +101 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:4821:48, 21 May 2024 diff hist +101 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
24 April 2024
- 00:5100:51, 24 April 2024 diff hist +89 Dektak 3ST: Profilometer →Resources current
19 April 2024
17 February 2024
- 06:4106:41, 17 February 2024 diff hist −6 Contact Mask Aligners: MA6 & MA6/BA6 No edit summary
5 December 2023
- 22:0922:09, 5 December 2023 diff hist −4 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF No edit summary
1 October 2023
- 04:1704:17, 1 October 2023 diff hist +4 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
- 04:1604:16, 1 October 2023 diff hist +4 Sirion: SEM & EDS No edit summary
- 04:1604:16, 1 October 2023 diff hist +1 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 04:1504:15, 1 October 2023 diff hist +1 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
- 04:1504:15, 1 October 2023 diff hist +4 Nova 200 NanoLab: SEM & EDS No edit summary
- 04:1404:14, 1 October 2023 diff hist +3 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 04:1304:13, 1 October 2023 diff hist +3 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
21 September 2023
- 16:2816:28, 21 September 2023 diff hist +478 EBPG 5000+: 100 kV Electron Beam Lithography →Description
- 16:2716:27, 21 September 2023 diff hist +479 EBPG 5200: 100 kV Electron Beam Lithography →Description
31 August 2023
- 21:0021:00, 31 August 2023 diff hist +9 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 20:5920:59, 31 August 2023 diff hist +9 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 20:5820:58, 31 August 2023 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
30 August 2023
- 16:0416:04, 30 August 2023 diff hist −8 Parylene Coater No edit summary
19 July 2023
- 15:4115:41, 19 July 2023 diff hist −1 Light Microscope with Spectroscopic Reflectometer No edit summary current
- 15:3915:39, 19 July 2023 diff hist −1 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner No edit summary current
- 15:2615:26, 19 July 2023 diff hist −1 Carbon Evaporator No edit summary current
28 June 2023
- 18:1618:16, 28 June 2023 diff hist 0 File:RTP.jpeg Derose uploaded a new version of File:RTP.jpeg current
17 May 2023
- 21:4221:42, 17 May 2023 diff hist +38 KNI Staff Members No edit summary
12 May 2023
- 21:0521:05, 12 May 2023 diff hist +7 Wafer Bonder No edit summary
- 21:0421:04, 12 May 2023 diff hist +7 Dektak 3ST: Profilometer No edit summary
- 21:0321:03, 12 May 2023 diff hist +5 Dimension Icon: Atomic Force Microscope (AFM) No edit summary current
- 21:0321:03, 12 May 2023 diff hist +7 XeF2 Etcher for Silicon No edit summary
- 21:0221:02, 12 May 2023 diff hist +7 Parylene Coater No edit summary
5 April 2023
- 04:5804:58, 5 April 2023 diff hist +139 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 04:5704:57, 5 April 2023 diff hist +139 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
17 March 2023
- 06:0206:02, 17 March 2023 diff hist +364 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 06:0106:01, 17 March 2023 diff hist +364 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
15 March 2023
31 October 2022
- 04:2804:28, 31 October 2022 diff hist +12 Process Recipe Library →Electron Beam Lithography current
- 04:1504:15, 31 October 2022 diff hist +128 Process Recipe Library →Electron Beam Lithography
3 October 2022
- 15:0215:02, 3 October 2022 diff hist +2,581 Covid-19 No edit summary
- 14:3314:33, 3 October 2022 diff hist −3 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 14:3114:31, 3 October 2022 diff hist −3 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
6 July 2022
- 21:4821:48, 6 July 2022 diff hist −9 ORION NanoFab: Helium, Neon & Gallium FIB →Scanning Electron Microscopes (SEMs)
- 21:4821:48, 6 July 2022 diff hist −10 Dimension Icon: Atomic Force Microscope (AFM) →Scanning Electron & Ion Microscopes
- 21:4721:47, 6 July 2022 diff hist −139 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Transmission Electron Microscopes
- 21:4721:47, 6 July 2022 diff hist −9 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Scanning Electron Microscopes (SEMs)
- 21:4521:45, 6 July 2022 diff hist −10 Equipment List →Scanning Electron Microscopes (SEMs)
- 21:4321:43, 6 July 2022 diff hist +41 N Nova 200 NanoLab: SEM, EDS & WDS Derose moved page Nova 200 NanoLab: SEM, EDS & WDS to Nova 200 NanoLab: SEM & EDS: Change of available features current Tag: New redirect
- 21:4321:43, 6 July 2022 diff hist 0 m Nova 200 NanoLab: SEM & EDS Derose moved page Nova 200 NanoLab: SEM, EDS & WDS to Nova 200 NanoLab: SEM & EDS: Change of available features
- 21:4121:41, 6 July 2022 diff hist −13 Matthew S. Hunt, PhD No edit summary Tag: Manual revert
- 21:4021:40, 6 July 2022 diff hist +13 Matthew S. Hunt, PhD No edit summary
30 June 2022
- 05:3805:38, 30 June 2022 diff hist +24 Tube Furnaces for Wet & Dry Processing →Equipment Data
- 05:3805:38, 30 June 2022 diff hist +13 Nanoscribe PPGT: Microscale 3D Printer →Equipment Data
- 05:3705:37, 30 June 2022 diff hist +13 DWL-66: Direct-Write Laser System →Equipment Data
- 05:3605:36, 30 June 2022 diff hist +13 Wafer Stepper →Equipment Data
- 05:3505:35, 30 June 2022 diff hist +17 Contact Mask Aligners: MA6 & MA6/BA6 →Equipment Data
- 05:3405:34, 30 June 2022 diff hist −109 Equipment List →Laboratory Data
- 05:3305:33, 30 June 2022 diff hist +11 XeF2 Etcher for Silicon →Equipment Data
- 05:3205:32, 30 June 2022 diff hist +10 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Equipment Data
- 05:3205:32, 30 June 2022 diff hist +24 ICP-RIE: Dielectric Etcher →Equipment Data
- 05:3105:31, 30 June 2022 diff hist +19 ICP-RIE: III-V, Metal & Silicon Etcher →Equipment Data
- 05:3005:30, 30 June 2022 diff hist +18 DRIE: Bosch & Cryo ICP-RIE for Silicon →Equipment Data
- 05:2905:29, 30 June 2022 diff hist +16 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Equipment Data
- 05:2905:29, 30 June 2022 diff hist +7 FlexAL II: Atomic Layer Deposition (ALD) →Equipment Data
- 05:2805:28, 30 June 2022 diff hist +22 ATC Orion 8: Dielectric Sputter System →Equipment Data
- 05:2805:28, 30 June 2022 diff hist +17 ATC Orion 8: Chalcogenide Sputter System →Equipment Data
- 05:2705:27, 30 June 2022 diff hist +4 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Status
- 05:2605:26, 30 June 2022 diff hist +13 CHA: Electron Beam Evaporator →Equipment Data
- 05:2505:25, 30 June 2022 diff hist +16 Labline: Electron Beam Evaporator →Equipment Data
- 05:2405:24, 30 June 2022 diff hist −103 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Equipment Data
- 05:2405:24, 30 June 2022 diff hist −105 Carbon Evaporator →Equipment Data
- 05:2105:21, 30 June 2022 diff hist +16 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Equipment Data
- 05:2005:20, 30 June 2022 diff hist +10 Sirion: SEM & EDS →Equipment Data
- 05:1905:19, 30 June 2022 diff hist +20 Nova 200 NanoLab: SEM & EDS →Equipment Data
- 05:1905:19, 30 June 2022 diff hist +19 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Equipment Data
- 05:1805:18, 30 June 2022 diff hist +17 ORION NanoFab: Helium, Neon & Gallium FIB →Equipment Data
- 05:1705:17, 30 June 2022 diff hist +15 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Equipment Data
- 05:1605:16, 30 June 2022 diff hist +19 EBPG 5000+: 100 kV Electron Beam Lithography →Equipment Data
29 June 2022
- 15:4215:42, 29 June 2022 diff hist +2 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 15:4215:42, 29 June 2022 diff hist +23 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 15:3715:37, 29 June 2022 diff hist −7 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 01:3001:30, 29 June 2022 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
13 May 2022
- 18:5118:51, 13 May 2022 diff hist −112 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 18:5018:50, 13 May 2022 diff hist −112 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
21 January 2022
- 18:1118:11, 21 January 2022 diff hist +25 KNI Staff Members No edit summary
16 December 2021
- 00:3200:32, 16 December 2021 diff hist +4 Contact Mask Aligners: MA6 & MA6/BA6 No edit summary
- 00:3100:31, 16 December 2021 diff hist +77 KNI Staff Members No edit summary
4 November 2021
- 17:5617:56, 4 November 2021 diff hist +148 Email Lists No edit summary
12 October 2021
- 01:1901:19, 12 October 2021 diff hist +124 Equipment List →Microscopy
- 01:1701:17, 12 October 2021 diff hist −138 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Transmission Electron Microscopes
- 01:1701:17, 12 October 2021 diff hist +87 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →SOPs & Troubleshooting
- 01:1601:16, 12 October 2021 diff hist +87 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting
- 01:1501:15, 12 October 2021 diff hist +88 Sirion: SEM & EDS →SOPs & Troubleshooting
- 01:1401:14, 12 October 2021 diff hist +88 Nova 200 NanoLab: SEM & EDS →SOPs & Troubleshooting
- 01:1101:11, 12 October 2021 diff hist +88 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →SOPs & Troubleshooting
- 01:1101:11, 12 October 2021 diff hist +87 ORION NanoFab: Helium, Neon & Gallium FIB →SOPs & Troubleshooting
11 October 2021
- 17:0017:00, 11 October 2021 diff hist +1 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 16:5916:59, 11 October 2021 diff hist +1 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 04:0704:07, 11 October 2021 diff hist +95 Lab Rules & Safety →KNI Lab General SOPs
1 October 2021
- 22:4922:49, 1 October 2021 diff hist +87 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
21 September 2021
- 22:4222:42, 21 September 2021 diff hist +1 DRIE: Bosch & Cryo ICP-RIE for Silicon No edit summary
24 August 2021
- 00:1400:14, 24 August 2021 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 00:1400:14, 24 August 2021 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
17 August 2021
- 05:3105:31, 17 August 2021 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
23 July 2021
- 03:0303:03, 23 July 2021 diff hist +96 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
22 July 2021
- 18:3518:35, 22 July 2021 diff hist +6,467 N LabRunr Information Instructions and resources to use LabRunr equipment scheduling, tracking, and billing system current
2 July 2021
- 18:5018:50, 2 July 2021 diff hist +3 Carbon Evaporator No edit summary
- 18:4918:49, 2 July 2021 diff hist +3 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner No edit summary
- 18:4818:48, 2 July 2021 diff hist +4 Dimension Icon: Atomic Force Microscope (AFM) No edit summary
- 18:4118:41, 2 July 2021 diff hist −3 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
- 18:4018:40, 2 July 2021 diff hist −4 Nova 200 NanoLab: SEM & EDS No edit summary
- 18:4018:40, 2 July 2021 diff hist −4 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
- 18:3918:39, 2 July 2021 diff hist −4 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 18:3918:39, 2 July 2021 diff hist −3 Sirion: SEM & EDS No edit summary
- 16:2516:25, 2 July 2021 diff hist +1 Nova 200 NanoLab: SEM & EDS No edit summary
- 16:2316:23, 2 July 2021 diff hist +1 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
- 16:2216:22, 2 July 2021 diff hist +4 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
30 June 2021
- 02:0302:03, 30 June 2021 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 02:0302:03, 30 June 2021 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
23 June 2021
- 04:5004:50, 23 June 2021 diff hist +110 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 04:5004:50, 23 June 2021 diff hist +110 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
3 June 2021
- 06:2206:22, 3 June 2021 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 06:2106:21, 3 June 2021 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
29 May 2021
- 18:0818:08, 29 May 2021 diff hist −14 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 18:0718:07, 29 May 2021 diff hist −13 Carbon Evaporator No edit summary
- 18:0618:06, 29 May 2021 diff hist −13 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner No edit summary
- 18:0618:06, 29 May 2021 diff hist −7 Dimension Icon: Atomic Force Microscope (AFM) No edit summary
- 18:0418:04, 29 May 2021 diff hist −7 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography No edit summary
- 18:0418:04, 29 May 2021 diff hist −7 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF No edit summary
- 18:0318:03, 29 May 2021 diff hist −7 Sirion: SEM & EDS No edit summary
- 18:0218:02, 29 May 2021 diff hist −7 Nova 200 NanoLab: SEM & EDS No edit summary
- 18:0118:01, 29 May 2021 diff hist −7 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
- 18:0118:01, 29 May 2021 diff hist 0 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
- 18:0018:00, 29 May 2021 diff hist −7 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
26 May 2021
24 May 2021
- 21:0221:02, 24 May 2021 diff hist +88 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
11 May 2021
- 21:2821:28, 11 May 2021 diff hist +96 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 17:1817:18, 11 May 2021 diff hist +101 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
29 April 2021
- 17:1817:18, 29 April 2021 diff hist +113 Lab Rules & Safety No edit summary
7 April 2021
- 16:0416:04, 7 April 2021 diff hist +128 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 16:0416:04, 7 April 2021 diff hist +150 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
4 March 2021
- 17:4017:40, 4 March 2021 diff hist +139 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 17:4017:40, 4 March 2021 diff hist +139 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
11 February 2021
10 February 2021
9 February 2021
8 February 2021
- 18:1818:18, 8 February 2021 diff hist +135 Nova 200 NanoLab: SEM & EDS →Manufacturer Manuals
- 18:1618:16, 8 February 2021 diff hist −5 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Related Instrumentation in the KNI
- 18:1618:16, 8 February 2021 diff hist −102 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Manufacturer Manuals
- 18:1418:14, 8 February 2021 diff hist −4 Nova 200 NanoLab: SEM & EDS →Scanning Electron Microscopes (SEMs)
- 18:1118:11, 8 February 2021 diff hist −4 Equipment List →Scanning Electron Microscopes (SEMs)
5 February 2021
- 21:1221:12, 5 February 2021 diff hist −71 Nova 200 NanoLab: SEM & EDS No edit summary
29 January 2021
4 November 2020
27 October 2020
- 22:0022:00, 27 October 2020 diff hist +90 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:5921:59, 27 October 2020 diff hist +90 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:3915:39, 27 October 2020 diff hist +44 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Specifications and Manuals
- 15:3815:38, 27 October 2020 diff hist +44 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:3815:38, 27 October 2020 diff hist +154 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 15:3715:37, 27 October 2020 diff hist +44 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:3615:36, 27 October 2020 diff hist +154 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
15 October 2020
- 01:0401:04, 15 October 2020 diff hist +320 FlexAL II: Atomic Layer Deposition (ALD) →ALD Precursor List
- 00:1500:15, 15 October 2020 diff hist +442 FlexAL II: Atomic Layer Deposition (ALD) →ALD Gas List
14 October 2020
- 23:5923:59, 14 October 2020 diff hist +401 FlexAL II: Atomic Layer Deposition (ALD) →Description
- 17:1117:11, 14 October 2020 diff hist +7 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner No edit summary
- 17:0917:09, 14 October 2020 diff hist +7 Carbon Evaporator No edit summary
- 17:0817:08, 14 October 2020 diff hist +7 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography No edit summary
- 17:0817:08, 14 October 2020 diff hist +7 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF No edit summary
- 17:0717:07, 14 October 2020 diff hist +7 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 17:0617:06, 14 October 2020 diff hist +7 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
- 17:0517:05, 14 October 2020 diff hist +7 Sirion: SEM & EDS No edit summary
- 16:4616:46, 14 October 2020 diff hist +7 Nova 200 NanoLab: SEM & EDS No edit summary
- 16:4416:44, 14 October 2020 diff hist +7 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
12 October 2020
- 16:3616:36, 12 October 2020 diff hist +1,134 Nanoscribe PPGT: Microscale 3D Printer No edit summary
- 16:3516:35, 12 October 2020 diff hist +1,171 DWL-66: Direct-Write Laser System No edit summary
- 16:3516:35, 12 October 2020 diff hist +1,211 Wafer Stepper No edit summary
- 16:3416:34, 12 October 2020 diff hist +1,167 Contact Mask Aligners: MA6 & MA6/BA6 No edit summary
- 16:3116:31, 12 October 2020 diff hist +87 Equipment List →Optical Lithography
- 16:2816:28, 12 October 2020 diff hist +276 CNI-PV 2.1: Nano Imprint Lithography No edit summary
- 16:1216:12, 12 October 2020 diff hist +81 N File:NILT Imprint process.png Flow diagram of an imprint process from the equipment manufacturer. current
- 16:0116:01, 12 October 2020 diff hist 0 N File:CNI NILT wiki.jpeg No edit summary current
6 October 2020
- 21:0621:06, 6 October 2020 diff hist +127 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 21:0621:06, 6 October 2020 diff hist +127 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
2 October 2020
- 16:2016:20, 2 October 2020 diff hist +138 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 16:2016:20, 2 October 2020 diff hist +138 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
1 October 2020
28 September 2020
- 23:3023:30, 28 September 2020 diff hist +1 CNI-PV 2.1: Nano Imprint Lithography →Specifications
- 23:2923:29, 28 September 2020 diff hist +3,011 N CNI-PV 2.1: Nano Imprint Lithography Created page with "{{instrument|{{PAGENAME}} |InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System |HeaderColor = #F5A81C |ImageResearch = Research.jpg |ImageInstrument = I..."
24 September 2020
- 22:2922:29, 24 September 2020 diff hist +135 EBPG 5000+: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 22:2422:24, 24 September 2020 diff hist +135 EBPG 5200: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
18 September 2020
- 23:5523:55, 18 September 2020 diff hist +8 EBPG 5000+: 100 kV Electron Beam Lithography →Training materials
- 23:5423:54, 18 September 2020 diff hist +8 EBPG 5200: 100 kV Electron Beam Lithography →Training Materials
16 September 2020
15 September 2020
- 17:4917:49, 15 September 2020 diff hist +132 EBPG 5000+: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
- 17:4617:46, 15 September 2020 diff hist +132 EBPG 5200: 100 kV Electron Beam Lithography →Advanced Troubleshooting SOPs
13 September 2020
- 05:2105:21, 13 September 2020 diff hist +186 Contact Mask Aligners: MA6 & MA6/BA6 →SOPs & Troubleshooting
22 August 2020
- 22:1022:10, 22 August 2020 diff hist +195 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Manufacturer Manuals
- 21:5321:53, 22 August 2020 diff hist +117 Sirion: SEM & EDS →Manufacturer Manuals
20 August 2020
- 16:5216:52, 20 August 2020 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Training materials
- 16:5216:52, 20 August 2020 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Training Materials
18 August 2020
- 23:3423:34, 18 August 2020 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
- 23:3423:34, 18 August 2020 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 21:2021:20, 18 August 2020 diff hist +301 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 20:5720:57, 18 August 2020 diff hist +543 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
14 August 2020
- 21:4421:44, 14 August 2020 diff hist +7 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 21:3921:39, 14 August 2020 diff hist +8 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
11 August 2020
10 August 2020
- 18:5118:51, 10 August 2020 diff hist +379 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 18:4918:49, 10 August 2020 diff hist +379 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
6 August 2020
3 August 2020
- 21:2821:28, 3 August 2020 diff hist +101 Lab Rules & Safety →KNI Lab Rules
- 21:2621:26, 3 August 2020 diff hist +7 Lab Rules & Safety →KNI Lab Rules
- 21:2521:25, 3 August 2020 diff hist +122 Lab Rules & Safety →KNI Lab Rules
- 19:3319:33, 3 August 2020 diff hist +133 ORION NanoFab: Helium, Neon & Gallium FIB →Resources
- 18:0118:01, 3 August 2020 diff hist +121 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 18:0018:00, 3 August 2020 diff hist +121 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 04:3704:37, 3 August 2020 diff hist +133 Carbon Evaporator →Resources
- 04:3404:34, 3 August 2020 diff hist +133 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Resources
- 04:3304:33, 3 August 2020 diff hist +133 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography →Resources
- 04:3304:33, 3 August 2020 diff hist +133 Sirion: SEM & EDS →Resources
- 04:3204:32, 3 August 2020 diff hist +133 Nova 200 NanoLab: SEM & EDS →Resources
- 04:3204:32, 3 August 2020 diff hist +133 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Resources
- 04:3104:31, 3 August 2020 diff hist +133 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Resources
2 August 2020
- 05:0605:06, 2 August 2020 diff hist +139 Equipment List →Support Tools
- 05:0305:03, 2 August 2020 diff hist +130 XeF2 Etcher for Silicon →Resources
- 05:0205:02, 2 August 2020 diff hist +130 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Resources
- 05:0105:01, 2 August 2020 diff hist +130 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Resources
- 05:0105:01, 2 August 2020 diff hist +130 ICP-RIE: Dielectric Etcher →Resources
- 05:0005:00, 2 August 2020 diff hist +130 ICP-RIE: III-V, Metal & Silicon Etcher →Resources
- 04:5804:58, 2 August 2020 diff hist +130 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
1 August 2020
- 05:2105:21, 1 August 2020 diff hist +133 Tube Furnaces for Wet & Dry Processing →Resources
- 05:2005:20, 1 August 2020 diff hist +133 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Resources
- 05:1905:19, 1 August 2020 diff hist +133 FlexAL II: Atomic Layer Deposition (ALD) →Resources
- 05:1805:18, 1 August 2020 diff hist +133 ATC Orion 8: Dielectric Sputter System →Resources
- 05:1805:18, 1 August 2020 diff hist +133 ATC Orion 8: Chalcogenide Sputter System →Resources
- 05:1605:16, 1 August 2020 diff hist +133 CHA: Electron Beam Evaporator →Resources
- 05:1605:16, 1 August 2020 diff hist +133 Labline: Electron Beam Evaporator →Resources
- 04:0404:04, 1 August 2020 diff hist +134 Nanoscribe PPGT: Microscale 3D Printer →Resources
- 04:0304:03, 1 August 2020 diff hist +134 DWL-66: Direct-Write Laser System →Resources
- 04:0004:00, 1 August 2020 diff hist +134 Wafer Stepper →Resources
- 03:5903:59, 1 August 2020 diff hist +134 Contact Mask Aligners: MA6 & MA6/BA6 →Resources
- 03:5703:57, 1 August 2020 diff hist +127 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 03:5503:55, 1 August 2020 diff hist +127 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
15 June 2020
- 21:0321:03, 15 June 2020 diff hist +131 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 21:0321:03, 15 June 2020 diff hist +131 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
3 May 2020
- 22:3422:34, 3 May 2020 diff hist +145 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting
16 April 2020
- 19:4319:43, 16 April 2020 diff hist +41 ORION NanoFab: Helium, Neon & Gallium FIB →Manufacturer Manuals
31 March 2020
- 23:0623:06, 31 March 2020 diff hist +122 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 22:5022:50, 31 March 2020 diff hist +104 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 22:4922:49, 31 March 2020 diff hist +104 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 15:5815:58, 31 March 2020 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 15:5715:57, 31 March 2020 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
16 March 2020
11 March 2020
- 18:2618:26, 11 March 2020 diff hist +14 Lab Rules & Safety →KNI Lab Rules and Safety Documents
- 18:2618:26, 11 March 2020 diff hist +97 Lab Rules & Safety →KNI Lab Rules and Safety Documents
10 March 2020
- 22:4322:43, 10 March 2020 diff hist +118 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 22:4222:42, 10 March 2020 diff hist +118 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
28 February 2020
- 16:0716:07, 28 February 2020 diff hist +108 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 16:0516:05, 28 February 2020 diff hist +108 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
6 February 2020
- 06:2206:22, 6 February 2020 diff hist +102 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 06:2206:22, 6 February 2020 diff hist +102 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 06:1906:19, 6 February 2020 diff hist +104 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
29 January 2020
- 17:3517:35, 29 January 2020 diff hist +122 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 17:3517:35, 29 January 2020 diff hist +122 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
26 January 2020
- 04:4104:41, 26 January 2020 diff hist +2 Contact Mask Aligners: MA6 & MA6/BA6 →Manufacturer Manuals
- 04:4004:40, 26 January 2020 diff hist +24 Contact Mask Aligners: MA6 & MA6/BA6 →Manufacturer Manuals
- 04:3004:30, 26 January 2020 diff hist +84 Contact Mask Aligners: MA6 & MA6/BA6 →SOPs & Troubleshooting
20 January 2020
- 23:2423:24, 20 January 2020 diff hist +103 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 23:2223:22, 20 January 2020 diff hist +116 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Specifications
- 23:2123:21, 20 January 2020 diff hist +112 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 23:2023:20, 20 January 2020 diff hist +112 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 23:1823:18, 20 January 2020 diff hist +212 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
10 December 2019
- 22:2722:27, 10 December 2019 diff hist +86 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 22:2722:27, 10 December 2019 diff hist +86 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
5 December 2019
- 23:1523:15, 5 December 2019 diff hist +98 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 23:1523:15, 5 December 2019 diff hist +98 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 18:2418:24, 5 December 2019 diff hist +92 Contact Mask Aligners: MA6 & MA6/BA6 →Optical Lithography Resources
- 18:2218:22, 5 December 2019 diff hist +92 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 18:2118:21, 5 December 2019 diff hist +92 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information
18 October 2019
- 15:3815:38, 18 October 2019 diff hist +90 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 15:3815:38, 18 October 2019 diff hist +90 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
9 October 2019
- 16:2616:26, 9 October 2019 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
13 September 2019
- 14:5914:59, 13 September 2019 diff hist +527 EBPG 5000+: 100 kV Electron Beam Lithography No edit summary
- 14:5514:55, 13 September 2019 diff hist +527 EBPG 5200: 100 kV Electron Beam Lithography No edit summary
12 September 2019
- 18:4118:41, 12 September 2019 diff hist +88 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:4118:41, 12 September 2019 diff hist +88 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
29 August 2019
- 21:3421:34, 29 August 2019 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:3321:33, 29 August 2019 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:0518:05, 29 August 2019 diff hist 0 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 18:0418:04, 29 August 2019 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:0615:06, 29 August 2019 diff hist +82 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:0515:05, 29 August 2019 diff hist +82 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
25 June 2019
- 15:4315:43, 25 June 2019 diff hist 0 m EBPG 5000+: 100 kV Electron Beam Lithography →Specifications
- 15:4315:43, 25 June 2019 diff hist +140 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:4215:42, 25 June 2019 diff hist +140 m EBPG 5200: 100 kV Electron Beam Lithography →Resources
5 June 2019
- 15:2915:29, 5 June 2019 diff hist +480 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 15:2815:28, 5 June 2019 diff hist +481 EBPG 5200: 100 kV Electron Beam Lithography →Resources
31 May 2019
- 21:4121:41, 31 May 2019 diff hist +19 EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 21:3921:39, 31 May 2019 diff hist +104 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
29 May 2019
- 18:1218:12, 29 May 2019 diff hist 0 m EBPG 5000+: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 17:2317:23, 29 May 2019 diff hist +628 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Resources
- 17:2217:22, 29 May 2019 diff hist +817 ICP-RIE: Dielectric Etcher →Resources
- 17:1417:14, 29 May 2019 diff hist +781 ICP-RIE: III-V, Metal & Silicon Etcher →Resources
- 16:3516:35, 29 May 2019 diff hist −1 m DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 16:3416:34, 29 May 2019 diff hist +783 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 16:1316:13, 29 May 2019 diff hist +78 FlexAL II: Atomic Layer Deposition (ALD) →Manufacturer Manuals
- 16:0616:06, 29 May 2019 diff hist +472 FlexAL II: Atomic Layer Deposition (ALD) →Process Resources
- 14:3114:31, 29 May 2019 diff hist +173 FlexAL II: Atomic Layer Deposition (ALD) →Resources
- 14:2414:24, 29 May 2019 diff hist +6 Bert Mendoza →Role in the KNI
- 14:2214:22, 29 May 2019 diff hist +48 Guy A. DeRose, PhD →Role in the KNI current
- 14:2014:20, 29 May 2019 diff hist −15 Guy A. DeRose, PhD →Role in the KNI
28 May 2019
- 22:2222:22, 28 May 2019 diff hist 0 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Manufacturer Specifications
- 22:1322:13, 28 May 2019 diff hist +34 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Manufacturer Manuals
- 22:0322:03, 28 May 2019 diff hist 0 ATC Orion 8: Chalcogenide Sputter System →Description
- 22:0122:01, 28 May 2019 diff hist +10 Bert Mendoza →Role in the KNI
- 21:5921:59, 28 May 2019 diff hist 0 ATC Orion 8: Dielectric Sputter System →Description
- 21:5721:57, 28 May 2019 diff hist 0 Carbon Evaporator →Manufacturer Specifications
- 21:5421:54, 28 May 2019 diff hist +9 FlexAL II: Atomic Layer Deposition (ALD) →Manufacturer Manuals
- 21:5221:52, 28 May 2019 diff hist +10 FlexAL II: Atomic Layer Deposition (ALD) →Manufacturer Manuals
- 21:4621:46, 28 May 2019 diff hist 0 DWL-66: Direct-Write Laser System →SOPs
- 21:2821:28, 28 May 2019 diff hist +525 FlexAL II: Atomic Layer Deposition (ALD) →Process Documents
- 20:5220:52, 28 May 2019 diff hist +40 Wet Chemistry →Safety Data Sheets (SDS)
- 20:5020:50, 28 May 2019 diff hist −21 Wet Chemistry →Resources
- 20:4920:49, 28 May 2019 diff hist +1,628 Wet Chemistry →Chemicals Provided by the KNI
- 20:0620:06, 28 May 2019 diff hist −43 ICP-RIE: III-V, Metal & Silicon Etcher →System Features
- 20:0120:01, 28 May 2019 diff hist +34 ICP-RIE: III-V, Metal & Silicon Etcher →Manufacturer Manuals
- 19:5019:50, 28 May 2019 diff hist +44 DRIE: Bosch & Cryo ICP-RIE for Silicon →Manufacturer Manuals
- 17:2817:28, 28 May 2019 diff hist −92 ICP-RIE: Dielectric Etcher →SOPs & Troubleshooting
- 17:2717:27, 28 May 2019 diff hist −92 DRIE: Bosch & Cryo ICP-RIE for Silicon →SOPs & Troubleshooting
- 17:1417:14, 28 May 2019 diff hist −174 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →SOPs & Troubleshooting
- 17:1417:14, 28 May 2019 diff hist −499 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Process Documents
- 16:4816:48, 28 May 2019 diff hist +58 Wet Chemistry →Description
- 16:4016:40, 28 May 2019 diff hist 0 m Lab Rules & Safety →KNI Documents
- 16:2016:20, 28 May 2019 diff hist 0 m Scriber-Breaker →Manufacturer Manuals
- 15:4515:45, 28 May 2019 diff hist +2,777 Guy A. DeRose, PhD No edit summary
- 03:4403:44, 28 May 2019 diff hist +32 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher No edit summary
- 03:4003:40, 28 May 2019 diff hist +84 Contact Mask Aligners: MA6 & MA6/BA6 →Manufacturer Manuals
- 03:3203:32, 28 May 2019 diff hist +919 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 03:3103:31, 28 May 2019 diff hist +194 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
- 03:2403:24, 28 May 2019 diff hist +125 Guy A. DeRose, PhD →Role in the KNI
27 May 2019
- 20:2920:29, 27 May 2019 diff hist −74 Guy A. DeRose, PhD →Education
- 20:2820:28, 27 May 2019 diff hist +193 Guy A. DeRose, PhD →Role in the KNI
23 May 2019
- 21:2821:28, 23 May 2019 diff hist +105 Lab Rules & Safety No edit summary
22 May 2019
- 22:1422:14, 22 May 2019 diff hist +30 m DRIE: Bosch & Cryo ICP-RIE for Silicon No edit summary
- 22:1322:13, 22 May 2019 diff hist +30 m ICP-RIE: Dielectric Etcher No edit summary
- 22:1122:11, 22 May 2019 diff hist +76 m ICP-RIE: Dielectric Etcher →Process Documents
- 21:5121:51, 22 May 2019 diff hist +168 m DRIE: Bosch & Cryo ICP-RIE for Silicon →Process Documents
- 21:4321:43, 22 May 2019 diff hist +78 DRIE: Bosch & Cryo ICP-RIE for Silicon →Process Documents
- 21:1921:19, 22 May 2019 diff hist +93 ICP-RIE: Dielectric Etcher →Process Documents
- 21:1121:11, 22 May 2019 diff hist +1,132 DRIE: Bosch & Cryo ICP-RIE for Silicon →Specifications
- 21:0321:03, 22 May 2019 diff hist +101 ICP-RIE: Dielectric Etcher →Resources
- 21:0321:03, 22 May 2019 diff hist −291 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
- 20:4820:48, 22 May 2019 diff hist −424 EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 18:4018:40, 22 May 2019 diff hist +6 m EBPG 5200: 100 kV Electron Beam Lithography →Specifications
- 15:5515:55, 22 May 2019 diff hist −605 ICP-RIE: Dielectric Etcher →Resources
- 15:5315:53, 22 May 2019 diff hist −8 ICP-RIE: Dielectric Etcher →System Specifications
- 15:5315:53, 22 May 2019 diff hist +992 ICP-RIE: Dielectric Etcher →Specifications
- 15:2915:29, 22 May 2019 diff hist +11 ICP-RIE: Dielectric Etcher →Manufacturer Specifications
- 15:2415:24, 22 May 2019 diff hist +81 ICP-RIE: Dielectric Etcher →Manufacturer Manuals
- 15:1615:16, 22 May 2019 diff hist +14 ICP-RIE: Dielectric Etcher →Process Documents
21 May 2019
- 21:3021:30, 21 May 2019 diff hist +352 ICP-RIE: Dielectric Etcher →Resources
- 14:5914:59, 21 May 2019 diff hist +560 EBPG 5200: 100 kV Electron Beam Lithography →Resources
14 May 2019
- 20:4020:40, 14 May 2019 diff hist +92 m EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 15:1015:10, 14 May 2019 diff hist −98 m EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 15:0615:06, 14 May 2019 diff hist +103 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 15:0415:04, 14 May 2019 diff hist +105 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 14:5714:57, 14 May 2019 diff hist +19 m EBPG 5200: 100 kV Electron Beam Lithography No edit summary
13 May 2019
- 22:3622:36, 13 May 2019 diff hist +191 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
10 May 2019
- 15:2815:28, 10 May 2019 diff hist +4 Usage Rates →Equipment Rates
- 15:1715:17, 10 May 2019 diff hist +56 Email Lists No edit summary
- 15:1315:13, 10 May 2019 diff hist +3 Lab Phone List →Call the Lab
7 May 2019
- 15:1715:17, 7 May 2019 diff hist −12 EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 15:1615:16, 7 May 2019 diff hist 0 N File:EBPG-5200-A230.jpg No edit summary current
- 15:1015:10, 7 May 2019 diff hist +3,938 N EBPG 5000+: 100 kV Electron Beam Lithography Created page with "{{InstrumentInfobox| |InstrumentName = EBPG 5000+ |HeaderColor = #FFFFFF |ImageOne = EBPG-5000-Research-Image.jpg |ImageTwo = EBPG-5000-Instrument-Image.jpg |InstrumentType =..."
- 14:5014:50, 7 May 2019 diff hist 0 File:EBPG-5200-Instrument-Image.jpg Derose uploaded a new version of File:EBPG-5200-Instrument-Image.jpg current
- 04:2704:27, 7 May 2019 diff hist +122 EBPG 5200: 100 kV Electron Beam Lithography →Troubleshooting SOPs
- 04:1204:12, 7 May 2019 diff hist +524 m EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 03:3903:39, 7 May 2019 diff hist +407 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
3 May 2019
- 20:2120:21, 3 May 2019 diff hist −46 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 20:1620:16, 3 May 2019 diff hist +39 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
2 May 2019
- 18:2918:29, 2 May 2019 diff hist +19 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 18:2118:21, 2 May 2019 diff hist 0 Lab Phone List →Call the Staff
- 18:1718:17, 2 May 2019 diff hist +4 Lab Phone List →Call the Lab
- 18:1218:12, 2 May 2019 diff hist +27 Lab Phone List →Other General Numbers
- 18:1018:10, 2 May 2019 diff hist +29 Lab Phone List →Caltech Emergency Number
- 18:0818:08, 2 May 2019 diff hist +932 Lab Phone List →Call the Lab
- 17:3417:34, 2 May 2019 diff hist −1 m EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 17:3117:31, 2 May 2019 diff hist +4 EBPG 5200: 100 kV Electron Beam Lithography →SOPs & Troubleshooting
- 17:2317:23, 2 May 2019 diff hist +15 Lab Phone List →Call the Lab
- 17:0617:06, 2 May 2019 diff hist +15 m EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 17:0417:04, 2 May 2019 diff hist +22 m EBPG 5200: 100 kV Electron Beam Lithography →Description
1 May 2019
- 15:1515:15, 1 May 2019 diff hist +46 N File:EBPG-5200-Instrument-Image.jpg Raith EBPG 5200 Instrument image
- 15:0115:01, 1 May 2019 diff hist −72 EBPG 5200: 100 kV Electron Beam Lithography Cleaned up some text in the description and application section
30 April 2019
- 17:4717:47, 30 April 2019 diff hist +6 m EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 17:4517:45, 30 April 2019 diff hist +290 EBPG 5200: 100 kV Electron Beam Lithography No edit summary
18 April 2019
- 14:2614:26, 18 April 2019 diff hist 0 m Equipment List →Etching
- 04:1004:10, 18 April 2019 diff hist 0 m Equipment List →Substrate Processing
- 04:0804:08, 18 April 2019 diff hist +1 m Equipment List →Transmission Electron Microscopes (TEMs)
- 04:0604:06, 18 April 2019 diff hist +2 Equipment List →Dry Etching
- 04:0304:03, 18 April 2019 diff hist +1 m Equipment List →Sputtering
- 04:0104:01, 18 April 2019 diff hist +50 m Equipment List →Evaporation
- 04:0004:00, 18 April 2019 diff hist −4 m Equipment List →Optical Lithography