EBPG 5200: 100 kV Electron Beam Lithography
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Description
The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35 mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200 mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).
It is important that users have the time needed to prepare their data and job files without the pressure of being on the clock. This approach gives them a better chance of not having to repeat charged exposures through so much trial and error. Please note that we do not charge for the time required to prepare pattern files (in Layout Beamer and Tracer), or for preparing exposure job files (cjob). Users will receive instructions for secure remote access during training.
Operational Applications
- Non-aligned electron beam lithography
- Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
General SOPs
- EBPG reservation and use policy (Updated April 2024)
- EBPG SOP
- User's Guide to the EBPG pg computer desktop
- EBPG Troubleshooting Guide
- Remote EBPG access via HP Remote Graphics Server (Caltech-Only)
Training Materials
- EBPG Training Lecture video series (Caltech-only access)
- EBPG Pre-exposure Walkthrough procedure (video)
- EBPG System Introduction main room training video
- EBPG System Introduction service chase overview training video
- EBPG System Introduction UPS and alignment microscopes training video
- EBPG 5200 sample mounting training video (Caltech-only access)
Sample Prep and Writing SOPs
- EBPG Handling Large Pattern Files SOP
- EBPG High Resolution Mode SOP
- EBPG 5200 Piece part prep SOP
- EBPG 5200 Holder 200 SOP
- EBPG Preparing sample for exposure SOP
- EBPG Holder Fixture handling SOP
- EBPG Beam Adjustment SOP
- EBPG Adjust Aperture SOP
- EBPG Aperture changers SOP
- EBPG Marker definition Procedure
- EBPG JOY Marker Procedure
- EBPG Disable marker height check SOP
- EBPG 5200 Secondary Electron Detector SOP
- EBPG Holderfix SOP
- EBPG Remote Access SOP (log into LabRunr and download SOP from EBPG 5200 page)
Advanced Troubleshooting SOPs
- Information Archive Beam
- EBPG BEAMS crash recovery SOP (run before a coldstart if BEAMS freezes)
- BEAMS $pg shutdown / coldstart SOP
- EBPG Procedure to degauss the final lens (run after every coldstart)
- Beam file Recovery SOP
- Lindgren MACS SOP
- EBPG Emergency air cylinder SOP
- EBPG Unlocking the stage SOP
- EBPG SAEHT not initialized SOP
- EBPG SAEHT no route to host recovery SOP
- EBPG hotbox slave communications fault recovery SOP
- EBPG FEG recovery and new beam table SOP
- Raith Common errors and solutions with aligned writing SOP
- EBPG 5200 troubleshooting loader issues training video (Caltech-only access)
Data Preparation Resources
- SOP: KNI Introduction to Layout BEAMER
- App Note: 3D Surface Proximity Effect Correction (Caltech-only access)
- App Note: Fracture Optimization (Caltech-only access)
- App Note: Writing Time Optimization (Caltech-only access)
- App Note: Formulas in Beamer Modules (Caltech-only access)
- App Note: Multipass Exposure (Caltech-only access)
- App Note: Mixed Export Options (Caltech-only access)
- App Note: GPF Formatter (Caltech-only access)
- Webinar Series - BEAMER Training
- Webinar Series: Proximity Effect in E-Beam Lithography
- Webinar: e-Beam Lithography Simulation
- March 2020 Genisys BEAMeeting at Caltech
- June 2020 Genisys BEAMeeting Layout Beamer training video (Caltech-only access)
- September 2020 Genisys BEAMeeting MNE (virtual) Presentations and Training
- February - April 2021 Layout Beamer Training Webinars (Caltech-only access)
- GenIsys BEAMeeting presentations and notes (Caltech-only access)
Lithography Process Information
- Bi-Layer PMMA Resist Spinning Recipe
- Recipe to prepare PMMA developer (MIBK:IPA 1:3)
- MAN Resist Data Sheet
- PMMA Resist Data Sheet
- SML Resist Data Sheet
- ZEP Resist Data Sheet
- ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
- HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
- Supramolecular Resist processing (Caltech-only access)
- Laurell Spinner cleaning SOP
- New Laurell Spinner WS-650Mz-23NPPB-IND Documentation (Caltech-only access)
Manufacturer Manuals
- EBPG 5200 system manual (Caltech-only access)
- Raith cjob manual (Caltech-only access)
- Layout Beamer Release Notes (Caltech-only access)
- Layout Beamer Manual (Caltech-only access)
- CEBUS 2021 Presentations (Caltech-only access)
- Laurell Spin Coater Manual (log into LabRunr and download Manual from EBPG 5000+ page)
- Torrey Pines HS30A Programmable hotplate manual
Specifications
- Voltage Range: 20, 50 or 100 kV
- Current Range: 50 pA to 200 nA
- Main Field Size: Up to 1 mm x 1 mm
- Main Field Resolution: 20 bit
- Maximum Writing Frequency: 100 MHz
- Aperture Sizes: 200 μm, 300 μm, 400 μm
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography