The AJA International ATC Orion Series system allows for electron beam evaporation of various metals, oxides, and semiconductors. This tool is a true UHV design equipped with dedicated heating jackets and internal heat lamps for an efficient bake-out process. A multi-crystal QCM protects against failed processes due to real-time thickness measurement errors and allows for long periods of maintained UHV conditions by removing the need to vent the chamber for regular sensor upkeep. In addition, crucibles may be swapped without breaking chamber vacuum via the use of a dedicated manual crucible exchanging system.
Applications
Metal deposition
Semiconductor deposition (in-situ doping not possible)
Load-lock-equipped system with automatic wafer transfer
Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
Pockets 1-4 allow in-situ crucible exchange through dedicated secondary load lock, allowing for crucible swap without breaking UHV chamber conditions.
Accepts up to 1x 150mm wafer or smaller wafers/pieces
Optional lift-off dome holds 4x 100mm wafers for batch processing
Camera for E-Beam/Crucible observation during process
Inficon CrystalSix(TM)
6-crystal QCM with automatic crystal switching in event of crystal fail or low Q. Enables long periods of maintained UHV conditions without requiring venting to exchange crystals
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