The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.
Applications
Metal deposition (Ti, Pt, Au, Al)
Other materials may be available upon request with restrictions: metals such as Cr, Fe, Ni, Co are not available. If you wish to deposit these see the links to related systems on this page.
