| Labline Evaporator
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| Lab Location
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B235C Steele
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| Lab Phone
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626-395-1539
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| Manufacturer
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Kurt J. Lesker Company
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| Model
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Labline
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Description
The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.
Applications
- Metal deposition (Ti, Pt, Au, Al)
- Lift-off
- Non-selective etch
- Ion-assisted deposition (simultaneous etching & deposition)
Resources
SOPs & Troubleshooting
Tool Reservation Rules
|
Advanced Reservation (days) |
Limit per Reservation (hrs) |
Limit per week (hrs)
|
| Weekday |
7 |
6 |
18
|
| Weeknight |
7 |
8 |
18
|
| Weekend |
7 |
12 |
18
|
Video Tutorials
Specifications
Hardware Specifications
- Typical base pressure: 1E-7 to 1E-8 Torr
- All dry pumping system (cryo & scroll pumps)
- Load-lock-equipped system with manual wafer transfer
- Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
- 1x Argon ion source (Filament type)
- Accepts up to 1x 150mm wafer or smaller wafers/pieces
Related Instrumentation in the KNI
Sputtering Systems
Electron Beam Evaporation Systems
Chemical Vapor Deposition
