CNI-PV 2.1: Nano Imprint Lithography
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Description
The NIL Technology CNI-PV 2.1 Nano Imprint Lithography System is a lithography tool that is used to enable nanoscale printing by thermal or UV exposure of photoresist with an imprint stamp. Vacuum in the imprint chamber is enabled down to 1 micron, and thermal imprint of up to 240°C is available. The system is compatible with UV-cured resists, and has an integral UV light source for those processes. It allows up to 200 mm diameter substrates with UV, or up to 150x150 mm substrates with thermal processing.
Operational Applications
- Thermal Nano Imprint Lithography
- UV Nano Imprint Lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
Equipment Data
General SOPs
FBS Reservation Rules:
| Advanced Res (days) | Limit per Res (hrs) | Limit per week (hrs) | |
|---|---|---|---|
| Weekday | 7 | 4 | 12 |
| Weeknight | 7 | 6 | 18 |
| Weekend | 14 | 6 | 18 |
For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.
Training Materials
Sample Prep and Writing SOPs
Advanced Troubleshooting SOPs
Data Preparation Resources
Lithography Process Information
Manufacturer Manuals
Specifications
- Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
- UV NanoImprint up to 200 mm wafers
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography
- Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography