DWL-66: Direct-Write Laser System

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DWL-66 Direct-Write Laser System
Heidelberg-DWL-66.jpg
Instrument Type Lithography
Techniques Direct Patterning,
Pattern Alignment,
Wafer and Mask Patterning
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on LabRunr
Request training by email
Sign up for DWL66 email list
Lab Location B217 Steele
Lab Phone 626-395-1536
Manufacturer Heidelberg Instruments
Model DWL-66

Description

The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi (dots per inch) is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.

Applications
  • Direct Writing
  • Grayscale Writing

Resources

Equipment Data
SOPs
Optical Lithography Resources
Manufacturer Manuals

Specifications

  • Exposure: 442 nm wavelength HeCd laser

Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography