Tube Furnaces for Wet & Dry Processing

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Tystar Tytan Tube Furnaces 1 & 2
Instrument Type Support Tools,
Thermal Processing
Techniques Oxidation, Annealing
Staff Manager Kelly McKenzie
Staff Email
Staff Phone 626-395-5732
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B235 Steele
Lab Phone 626-395-1532
Manufacturer Tystar Corporation
Model Tytan Horizontal
Diffusion Furnace


The system is designed for processing up to one-hundred, 150 mm (6") silicon or sapphire wafers per tube and can accommodate smaller sample sizes also. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.

  • Dry & Wet oxidation
  • Annealing
Allowed Materials
  • Silicon, SiNx, or sapphire that is completely free of metal or organic contamination
    • Recommended to have undergone a standard RCA clean or similar beforehand
  • No other sample material allowed
  • No metal or organic contamination
    • Wafers must not have been contacted by metal tweezers, etc. without appropriate cleaning to remove metal contamination
Gas List
  • Nitrogen
  • Oxygen
  • Water Vapor (Tube 1)


Equipment Status
Tystar Oxidation Recipe
SOPs & Troubleshooting