User contributions for Derose
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- 21:48, 6 July 2022 diff hist −9 ORION NanoFab: Helium, Neon & Gallium FIB →Scanning Electron Microscopes (SEMs) current
- 21:48, 6 July 2022 diff hist −10 Dimension Icon: Atomic Force Microscope (AFM) →Scanning Electron & Ion Microscopes current
- 21:47, 6 July 2022 diff hist −139 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Transmission Electron Microscopes current
- 21:47, 6 July 2022 diff hist −9 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Scanning Electron Microscopes (SEMs)
- 21:45, 6 July 2022 diff hist −10 Equipment List →Scanning Electron Microscopes (SEMs) current
- 21:43, 6 July 2022 diff hist +41 N Nova 200 NanoLab: SEM, EDS & WDS Derose moved page Nova 200 NanoLab: SEM, EDS & WDS to Nova 200 NanoLab: SEM & EDS: Change of available features current Tag: New redirect
- 21:43, 6 July 2022 diff hist 0 m Nova 200 NanoLab: SEM & EDS Derose moved page Nova 200 NanoLab: SEM, EDS & WDS to Nova 200 NanoLab: SEM & EDS: Change of available features current
- 21:41, 6 July 2022 diff hist −13 Matthew S. Hunt, PhD current Tag: Manual revert
- 21:40, 6 July 2022 diff hist +13 Matthew S. Hunt, PhD
- 05:38, 30 June 2022 diff hist +24 Tube Furnaces for Wet & Dry Processing →Equipment Data current
- 05:38, 30 June 2022 diff hist +13 Nanoscribe PPGT: Microscale 3D Printer →Equipment Data
- 05:37, 30 June 2022 diff hist +13 DWL-66: Direct-Write Laser System →Equipment Data current
- 05:36, 30 June 2022 diff hist +13 Wafer Stepper →Equipment Data current
- 05:35, 30 June 2022 diff hist +17 Contact Mask Aligners: MA6 & MA6/BA6 →Equipment Data current
- 05:34, 30 June 2022 diff hist −109 Equipment List →Laboratory Data
- 05:33, 30 June 2022 diff hist +11 XeF2 Etcher for Silicon →Equipment Data current
- 05:32, 30 June 2022 diff hist +10 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Equipment Data current
- 05:32, 30 June 2022 diff hist +24 ICP-RIE: Dielectric Etcher →Equipment Data current
- 05:31, 30 June 2022 diff hist +19 ICP-RIE: III-V, Metal & Silicon Etcher →Equipment Data current
- 05:30, 30 June 2022 diff hist +18 DRIE: Bosch & Cryo ICP-RIE for Silicon →Equipment Data current
- 05:29, 30 June 2022 diff hist +16 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Equipment Data current
- 05:29, 30 June 2022 diff hist +7 FlexAL II: Atomic Layer Deposition (ALD) →Equipment Data current
- 05:28, 30 June 2022 diff hist +22 ATC Orion 8: Dielectric Sputter System →Equipment Data current
- 05:28, 30 June 2022 diff hist +17 ATC Orion 8: Chalcogenide Sputter System →Equipment Data current
- 05:27, 30 June 2022 diff hist +4 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Status current
- 05:26, 30 June 2022 diff hist +13 CHA: Electron Beam Evaporator →Equipment Data current
- 05:25, 30 June 2022 diff hist +16 Labline: Electron Beam Evaporator →Equipment Data current
- 05:24, 30 June 2022 diff hist −103 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Equipment Data current
- 05:24, 30 June 2022 diff hist −105 Carbon Evaporator →Equipment Data current
- 05:21, 30 June 2022 diff hist +16 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Equipment Data current
- 05:20, 30 June 2022 diff hist +10 Sirion: SEM & EDS →Equipment Data current
- 05:19, 30 June 2022 diff hist +20 Nova 200 NanoLab: SEM & EDS →Equipment Data
- 05:19, 30 June 2022 diff hist +19 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Equipment Data current
- 05:18, 30 June 2022 diff hist +17 ORION NanoFab: Helium, Neon & Gallium FIB →Equipment Data
- 05:17, 30 June 2022 diff hist +15 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Equipment Data
- 05:16, 30 June 2022 diff hist +19 EBPG 5000+: 100 kV Electron Beam Lithography →Equipment Data current
- 15:42, 29 June 2022 diff hist +2 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 15:42, 29 June 2022 diff hist +23 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 15:37, 29 June 2022 diff hist −7 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 01:30, 29 June 2022 diff hist 0 EBPG 5200: 100 kV Electron Beam Lithography →Equipment Data
- 18:51, 13 May 2022 diff hist −112 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 18:50, 13 May 2022 diff hist −112 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 18:11, 21 January 2022 diff hist +25 KNI Staff Members current
- 00:32, 16 December 2021 diff hist +4 Contact Mask Aligners: MA6 & MA6/BA6
- 00:31, 16 December 2021 diff hist +77 KNI Staff Members
- 17:56, 4 November 2021 diff hist +148 Email Lists
- 01:19, 12 October 2021 diff hist +124 Equipment List →Microscopy
- 01:17, 12 October 2021 diff hist −138 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Transmission Electron Microscopes
- 01:17, 12 October 2021 diff hist +87 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →SOPs & Troubleshooting
- 01:16, 12 October 2021 diff hist +87 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting