Rapid Thermal Processor

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Solaris Rapid Thermal Processor
Instrument Type Metrology
Techniques Rapid Thermal Processing
Staff Manager Alireza Ghaffari
Staff Email alireza@caltech.edu
Staff Phone 626-395-3984
Reserve time on LabRunr
Request training by email
Lab Location B235 Steele
Lab Phone 626-395-1539
Manufacturer Surface science integration
Model Solaris 150


The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

  • Temperature range from room temperature to 1200 degrees C.
  • Processing gasses available:
    • Nitrogen
    • Argon
    • Forming Gas (5% H2 in N2)