Rapid Thermal Processor
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The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
- Temperature range from room temperature to 1200 degrees C.
- Processing gasses available:
- Forming Gas (5% H2 in N2)