Difference between revisions of "Equipment List"

From the KNI Lab at Caltech
Jump to navigation Jump to search
(101 intermediate revisions by 9 users not shown)
Line 1: Line 1:
= Lithography =
'''NOTE: For EQUIPMENT TRAINING, contact the tool owner via Email for scheduling - DO NOT USE Labrunr - Training Sessions.'''
 
== Lithography ==
===== Electron Beam Lithography =====
===== Electron Beam Lithography =====
* Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]
* Nanometer Pattern Generation System: Thermo Fisher Tecnai TF-20 S/TEM with NPGS (80-200 kV)
<!---* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Nanometer Pattern Generation System: Thermo Fisher Tecnai TF-20 S/TEM with NPGS (80-200 kV)]]--->
===== Ion Beam Lithography =====
===== Ion Beam Lithography =====
* He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
===== Optical Lithography =====
===== Optical Lithography =====
* Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* i-Line Wafer Stepper: GCA model 6300
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* Direct-Write Laser System: Heidelberg Instruments DWL-66
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]




= Deposition =
== Deposition ==
===== Evaporation =====
===== Evaporation =====
* Al, Au, Pt & Ti: Kurt J Lesker Labline  
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]
* Metals & Oxides: CHA Industries Mark 40
* [[CHA: Electron Beam Evaporator | Metals & Oxides: CHA Industries Mark 40 Electron Beam Evaporator]]
* Carbon: Leica EM ACE600 Carbon Evaporator
* [[Carbon Evaporator | Carbon: Leica EM ACE600 Carbon Evaporator]]
===== Sputtering =====
===== Sputtering =====
* Dielectric Sputterer: AJA International ATC Orion 8
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* Chalcogenide Sputterer: AJA International ATC Orion 5
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]
===== Plasma-Enhanced Deposition =====
* Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
* Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100
===== Packaging =====
* Parylene Coater: Para Tech LabTop 3000


===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]


== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF<sub>2</sub> Etcher for Silicon]]


= Etching =
===== Dry Etching =====
* Silicon Etcher: Oxford Instruments DRIE System 100 Cryo ICP–RIE
* Silicon, III/V Material & Metal Etcher: Oxford Instruments DRIE System 100 ICP–RIE
* Dielectric Material Etcher: Oxford Instruments Dielectric System 100, 380 V source, ICP–RIE
* Silicon, III/V Material & Organics Etcher: Plasmatherm RIE
* Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE
* XeF2 Silicon Etcher
===== Wet Etching =====
===== Wet Etching =====
* Available Wet Chemistry Techniques
* [[Wet Chemistry | Available Wet Etching Techniques]]
 
== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/mpsxkxmf5y8wjw9daijwbudeoqkkeudu KNI Microscopy Policies]


===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]


= Microscopy =
===== Focused Ion Beam (FIB) Systems =====
===== Focused Ion Beam (FIB) Systems =====
* He/Ne/Ga-FIB: Zeiss ORION NanoFab
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* SEM/Ga-FIB/Omniprobe: Thermo Fisher Nova NanoLab 600
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====
===== Scanning Electron Microscopes (SEMs) =====
* SEM/EDS/WDS: Thermo Fisher Nova NanoLab 200
* [[Nova 200 NanoLab: SEM, EDS & WDS | SEM & EDS: Thermo Fisher Nova 200 NanoLab]]
* SEM/Ga-FIB/Omniprobe: Thermo Fisher Nova NanoLab 600
* [[Sirion: SEM & EDS | SEM & EDS: Thermo Fisher Sirion]]
* SEM/EDS: Thermo Fisher Sirion
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* SEM/ESEM: Thermo Fisher Quanta 200F
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Transmission Electron Microscopes (TEMs) =====
 
* TEM/STEM/EDS/EELS/EFTEM/NPGS: Thermo Fisher Tecnai TF-20 (80-300 kV)
===== Transmission Electron Microscope (TEM) =====
* TEM/STEM/EDS/HAADF: Thermo Fisher Tecnai TF-30 (80-200 kV)
* [[Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF | TEM, STEM, EDS & HAADF: Thermo Fisher Tecnai TF-30 (50-300 kV)]]
<!---* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | TEM, STEM, EDS, EELS, EFTEM & Lithography: Thermo Fisher Tecnai TF-20 (40-200 kV)]]--->
 
===== Scanning Probe Microscopes =====
===== Scanning Probe Microscopes =====
* Atomic Force Microscope (AFM): Bruker Dimension ICON
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* Profilometer: Veeco Dektak 3ST
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]
===== Optical Microscopes =====
* Fluorescence Microscope: Olympus IX81


===== Optical Characterization =====
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]
* [[TEM Sample Preparation Equipment | TEM Sample Preparation Equipment: Polishing Stations, 3 mm Disk Cutter, Dimpler, Argon Ion Mill]]


= Support Tools =
===== Stubs for specimen mounting =====
===== Metrology =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.
* Spectroscopic Ellipsometry: Woolam M-2000
 
* Thin Film Measurement: Filmetrics model F40
** [https://www.tedpella.com/sem_html/SEMpinmount.htm Buy stubs without copper clips]
* Profilometer: Veeco Dektak 3ST
 
* Profilometer: Ambios Technology XP-2
== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety
 
- Chemicals Supplied by KNI
 
- Chemicals Approved for use in KNI cleanroom- Safety Data Sheet (SDS) Lists
 
- Requesting New Chemicals for use in the KNI cleanroom
 
===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview
 
-Hazardous Waste Handling and Labeling
 
-Decanting Chemicals
 
-Hot Plate Rules
 
-KNI Buddy System


===== Thermal Processing =====
-Secondary Containment and Other Best Practices.
* Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)
* Rapid Thermal Processing: Modular Process Technology RTP-600S
* Rapid Thermal Annealer: Jipelec Jetfirst 150


===== Wafer Processing =====
===== Wet Chemistry Resources page=====
* Scriber-Breaker: Dynatex GST-150
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
* Wafer Bonder: Suss Microtech model SB6L
- Contains fabrication recipes and procedures.
* Critical Point Dryer: Tousimis Automegasamdri 915B


== Support Tools ==
===== Laboratory Data =====
* [https://caltech.box.com/s/cl3ujgau2afl45joem7mg15e0oyxcgab General Laboratory Pass-down status information]
===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
<!---* [[Rapid Thermal Processor | Rapid Thermal Processing: Modular Process Technology RTP-600S]]--->
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]
* [[Wafer Bonder | Wafer Bonder: Suss MicroTec model SB6L]]
* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
===== Device Processing =====
* Wedge-Wedge Wire Bonder: Westbond model 7476D-79
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* Electrical Probing Station: Cascade Microtech M150
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
 
===== Sample Preparation =====
* [[TEM Sample Preparation Equipment | TEM Sample Preparation Equipment: Polishing Stations, 3 mm Disk Cutter, Dimpler, Argon Ion Mill]]
* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Revision as of 16:28, 17 March 2022

NOTE: For EQUIPMENT TRAINING, contact the tool owner via Email for scheduling - DO NOT USE Labrunr - Training Sessions.

Lithography

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography


Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)
Dielectric Packaging / Moisture Barrier

Etching

Dry Etching
Wet Etching

Microscopy

KNI Microscopy Policies
Guide to Choosing KNI SEMs & FIBs
Focused Ion Beam (FIB) Systems
Scanning Electron Microscopes (SEMs)
Transmission Electron Microscope (TEM)
Scanning Probe Microscopes
Optical Characterization
Sample Preparation for Microscopy
Stubs for specimen mounting
  • Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.

Wet Chemistry

Wet Chemistry Main page

- Facilities Procedures & Safety

- Chemicals Supplied by KNI

- Chemicals Approved for use in KNI cleanroom- Safety Data Sheet (SDS) Lists

- Requesting New Chemicals for use in the KNI cleanroom

Wet Chemistry Safety page

- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

Wet Chemistry Resources page

- Contains fabrication recipes and procedures.

Support Tools

Laboratory Data
Thermal Processing
Substrate Processing
Device Processing
Metrology
Sample Preparation
Retrieved from "https://lab.kni.caltech.edu/index.php?title=Equipment_List&oldid=2872"