Critical Point Dryer

From the KNI Lab at Caltech
Jump to navigation Jump to search
Critical Point Dryer
Diamond-Lattice Eleftheria-Roumeli.jpg
Instrument Type Support Tools,
Substrate Processing
Techniques Critical Point Drying
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Reserve time on LabRunr
Request training by email
Sign up for CPD email list
Lab Location B211 Steele
Lab Phone 626-395-1538
Manufacturer Tousimis
Model 915B
TA-915B-Critical-Point-Dryer.jpg

Description

For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing them from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.

Applications
  • Prepare biological specimens for e.g. microscopy
  • Protect 3D-printed structures from surface tension damage in post-lithography processing

Resources

SOPs & Troubleshooting
Manufacturer Manual

Specifications

Manufacturer Specifications
Notable Specifications
  • Accommodated Sizes: Pieces & wafers up to 6"