Critical Point Dryer

Critical Point Dryer Instrument Type Support Tools, Substrate Processing Techniques Critical Point Drying Staff Manager Bert Mendoza Staff Email bertm@caltech.edu Staff Phone 626-395-4075 Reserve time on FBS Request training via FBS User Dashboard Lab Location B211 Steele Lab Phone 626-395-1538 Manufacturer Tousimis Model 915B

Description

For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing them from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.

Applications

• Prepare biological specimens for e.g. microscopy
• Protect 3D-printed structures from surface tension damage in post-lithography processing

Resources

SOPs & Troubleshooting

• Tousimis 915B - SOP & Troubleshooting

FBS Reservation Rules:

	Advanced Res (days)	Limit per Res (hrs)	Limit per week (hrs)
Weekday	7	4	12
Weeknight	7	6	18
Weekend	14	6	18

For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.

Manufacturer Manual

• Tousimis Automegasamdri 915B Manual

Manufacturer Website

• Tousimis.com - Main page.
• Tousimis.com - Tousimis page for general sample holders.
• Tousimis can also fabricate special holders upon request.

• Tousimis.com - Tousimis page for wafer and chip holders.

Specifications

Manufacturer Specifications

• Tousimis Automegasamdri 915B Manual

Notable Specifications

• Accommodated Sizes: Pieces & wafers up to 6"