Difference between revisions of "Equipment List"

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* [[Carbon Evaporator | Carbon: Leica EM ACE600 Carbon Evaporator]]
 
* [[Carbon Evaporator | Carbon: Leica EM ACE600 Carbon Evaporator]]
 
===== Sputtering =====
 
===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputterer | Dielectric Sputterer: AJA International ATC Orion 8]]
+
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputterer: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputterer | Chalcogenide Sputterer: AJA International ATC Orion 8]]
+
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputterer: AJA International ATC Orion 8]]
 +
 
 
===== Chemical Vapor Deposition (CVD) =====
 
===== Chemical Vapor Deposition (CVD) =====
 
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
 
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]

Revision as of 20:12, 27 May 2019

Lithography

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)
Dielectric Packaging / Moisture Barrier

Etching

Dry Etching
Wet Etching

Microscopy

Focused Ion Beam (FIB) Systems
Scanning Electron Microscopes (SEMs)
Transmission Electron Microscopes (TEMs)
Scanning Probe Microscopes
Optical Characterization
Sample Preparation for Microscopy

Wet Chemistry

Support Tools

Thermal Processing
Substrate Processing
Device Processing
Metrology
Sample Preparation