Difference between revisions of "Equipment List"

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 15: Line 15:
 
== Deposition ==
 
== Deposition ==
 
===== Evaporation =====
 
===== Evaporation =====
* [[KJL Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]
+
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]
* [[CHA Industries Mark 40: Electron Beam Evaporator | Metals & Oxides: CHA Industries Mark 40 Electron Beam Evaporator]]
+
* [[CHA: Electron Beam Evaporator | Metals & Oxides: CHA Industries Mark 40 Electron Beam Evaporator]]
 
* [[Carbon Evaporator | Carbon: Leica EM ACE600 Carbon Evaporator]]
 
* [[Carbon Evaporator | Carbon: Leica EM ACE600 Carbon Evaporator]]
 
===== Sputtering =====
 
===== Sputtering =====
Line 22: Line 22:
 
* [[ATC Orion 8: Chalcogenide Sputterer | Chalcogenide Sputterer: AJA International ATC Orion 8]]
 
* [[ATC Orion 8: Chalcogenide Sputterer | Chalcogenide Sputterer: AJA International ATC Orion 8]]
 
===== Chemical Vapor Deposition (CVD) =====
 
===== Chemical Vapor Deposition (CVD) =====
* [[Oxford FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
+
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Oxford 100: Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
+
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
 
===== Dielectric Packaging / Moisture Barrier =====
 
===== Dielectric Packaging / Moisture Barrier =====
* [[Para Tech LabTop 3000: Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]
+
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]
  
 
== Etching ==
 
== Etching ==

Revision as of 18:56, 27 May 2019

Lithography

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)
Dielectric Packaging / Moisture Barrier

Etching

Dry Etching
Wet Etching

Microscopy

Focused Ion Beam (FIB) Systems
Scanning Electron Microscopes (SEMs)
Transmission Electron Microscopes (TEMs)
Scanning Probe Microscopes
Optical Characterization
Sample Preparation for Microscopy

Wet Chemistry

Support Tools

Thermal Processing
Substrate Processing
Device Processing
Metrology
Sample Preparation