Equipment List

NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions: FBS Instructions

Lithography

Electron Beam Lithography

• Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)
• Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)
• Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)

Ion Beam Lithography

• He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)

Optical Lithography

• Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6
• i-Line Wafer Stepper: GCA model 6300
• Nano Imprint Lithography: NILT CNI-PV 2.1
• Direct-Write Laser System: Heidelberg Instruments DWL-66
• Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT
• Optical Lithography Resources

Deposition

Evaporation

• Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator
• Carbon: Leica EM ACE600 Carbon Evaporator
• Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator

Sputtering

• Dielectric Sputter System: AJA International ATC Orion 8
• Chalcogenide Sputter System: AJA International ATC Orion 8

Chemical Vapor Deposition (CVD)

• Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
• Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100

Dielectric Packaging / Moisture Barrier

• Parylene Coater: Para Tech LabTop 3000

Etching

Dry Etching

• Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE
• III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE
• Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE
• Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE
• Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE
• XeF₂ Etcher for Silicon

Wet Etching

• Available Wet Etching Techniques

Microscopy

KNI Microscopy Policies

• KNI Microscopy Policies

Microscopy High Performance PC

• Microscopy High Perfomance PC for 3D reconstruction and data processing

Guide to Choosing KNI SEMs & FIBs

• Consult this guide for help in choosing the best SEMs and FIBs for your work

Focused Ion Beam (FIB) Systems

• Helium, Neon & Gallium FIB: Zeiss ORION NanoFab
• SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab

Scanning Electron Microscopes (SEMs)

• Nova 200 NanoLab: SEM & EDS
• Sirion: SEM & EDS
• SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F
• SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab

Transmission Electron Microscope (TEM)

• TEM, STEM, EDS & HAADF: Thermo Fisher Tecnai TF-30 (50-300 kV)

Scanning Probe Microscopes

• Atomic Force Microscope (AFM): Bruker Dimension Icon
• Profilometer: Veeco Dektak 3ST

Optical Characterization

• Digital Microscope and Camera: Keyence HVX-7000
• Fluorescence Microscope: Olympus IX81
• Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer
• Spectroscopic Ellipsometer: Woolam M-2000

Sample Preparation for Microscopy

• Carbon Evaporator (Leica EM ACE600) to make samples conductive
• Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface