User contributions for Derose
Jump to navigation
Jump to search
6 August 2020
3 August 2020
- 21:2821:28, 3 August 2020 diff hist +101 Lab Rules & Safety →KNI Lab Rules
- 21:2621:26, 3 August 2020 diff hist +7 Lab Rules & Safety →KNI Lab Rules
- 21:2521:25, 3 August 2020 diff hist +122 Lab Rules & Safety →KNI Lab Rules
- 19:3319:33, 3 August 2020 diff hist +133 ORION NanoFab: Helium, Neon & Gallium FIB →Resources
- 18:0118:01, 3 August 2020 diff hist +121 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 18:0018:00, 3 August 2020 diff hist +121 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 04:3704:37, 3 August 2020 diff hist +133 Carbon Evaporator →Resources
- 04:3404:34, 3 August 2020 diff hist +133 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF →Resources
- 04:3304:33, 3 August 2020 diff hist +133 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography →Resources
- 04:3304:33, 3 August 2020 diff hist +133 Sirion: SEM & EDS →Resources
- 04:3204:32, 3 August 2020 diff hist +133 Nova 200 NanoLab: SEM & EDS →Resources
- 04:3204:32, 3 August 2020 diff hist +133 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Resources
- 04:3104:31, 3 August 2020 diff hist +133 Quanta 200F: SEM, ESEM, Lithography & Probe Station →Resources
2 August 2020
- 05:0605:06, 2 August 2020 diff hist +139 Equipment List →Support Tools
- 05:0305:03, 2 August 2020 diff hist +130 XeF2 Etcher for Silicon →Resources
- 05:0205:02, 2 August 2020 diff hist +130 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner →Resources
- 05:0105:01, 2 August 2020 diff hist +130 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →Resources
- 05:0105:01, 2 August 2020 diff hist +130 ICP-RIE: Dielectric Etcher →Resources
- 05:0005:00, 2 August 2020 diff hist +130 ICP-RIE: III-V, Metal & Silicon Etcher →Resources
- 04:5804:58, 2 August 2020 diff hist +130 DRIE: Bosch & Cryo ICP-RIE for Silicon →Resources
1 August 2020
- 05:2105:21, 1 August 2020 diff hist +133 Tube Furnaces for Wet & Dry Processing →Resources
- 05:2005:20, 1 August 2020 diff hist +133 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Resources
- 05:1905:19, 1 August 2020 diff hist +133 FlexAL II: Atomic Layer Deposition (ALD) →Resources
- 05:1805:18, 1 August 2020 diff hist +133 ATC Orion 8: Dielectric Sputter System →Resources
- 05:1805:18, 1 August 2020 diff hist +133 ATC Orion 8: Chalcogenide Sputter System →Resources
- 05:1605:16, 1 August 2020 diff hist +133 CHA: Electron Beam Evaporator →Resources
- 05:1605:16, 1 August 2020 diff hist +133 Labline: Electron Beam Evaporator →Resources
- 04:0404:04, 1 August 2020 diff hist +134 Nanoscribe PPGT: Microscale 3D Printer →Resources
- 04:0304:03, 1 August 2020 diff hist +134 DWL-66: Direct-Write Laser System →Resources
- 04:0004:00, 1 August 2020 diff hist +134 Wafer Stepper →Resources
- 03:5903:59, 1 August 2020 diff hist +134 Contact Mask Aligners: MA6 & MA6/BA6 →Resources
- 03:5703:57, 1 August 2020 diff hist +127 EBPG 5200: 100 kV Electron Beam Lithography →Resources
- 03:5503:55, 1 August 2020 diff hist +127 EBPG 5000+: 100 kV Electron Beam Lithography →Resources
15 June 2020
- 21:0321:03, 15 June 2020 diff hist +131 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
- 21:0321:03, 15 June 2020 diff hist +131 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
3 May 2020
- 22:3422:34, 3 May 2020 diff hist +145 Quanta 200F: SEM, ESEM, Lithography & Probe Station →SOPs & Troubleshooting
16 April 2020
- 19:4319:43, 16 April 2020 diff hist +41 ORION NanoFab: Helium, Neon & Gallium FIB →Manufacturer Manuals
31 March 2020
- 23:0623:06, 31 March 2020 diff hist +122 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 22:5022:50, 31 March 2020 diff hist +104 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 22:4922:49, 31 March 2020 diff hist +104 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
- 15:5815:58, 31 March 2020 diff hist +111 EBPG 5000+: 100 kV Electron Beam Lithography →General SOPs
- 15:5715:57, 31 March 2020 diff hist +111 EBPG 5200: 100 kV Electron Beam Lithography →General SOPs
16 March 2020
11 March 2020
- 18:2618:26, 11 March 2020 diff hist +14 Lab Rules & Safety →KNI Lab Rules and Safety Documents
- 18:2618:26, 11 March 2020 diff hist +97 Lab Rules & Safety →KNI Lab Rules and Safety Documents
10 March 2020
- 22:4322:43, 10 March 2020 diff hist +118 EBPG 5000+: 100 kV Electron Beam Lithography →Lithography Process Information
- 22:4222:42, 10 March 2020 diff hist +118 EBPG 5200: 100 kV Electron Beam Lithography →Lithography Process Information