User contributions for Derose
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29 May 2021
- 18:0018:00, 29 May 2021 diff hist −7 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
26 May 2021
24 May 2021
- 21:0221:02, 24 May 2021 diff hist +88 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
11 May 2021
- 21:2821:28, 11 May 2021 diff hist +96 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 17:1817:18, 11 May 2021 diff hist +101 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
29 April 2021
- 17:1817:18, 29 April 2021 diff hist +113 Lab Rules & Safety No edit summary
7 April 2021
- 16:0416:04, 7 April 2021 diff hist +128 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 16:0416:04, 7 April 2021 diff hist +150 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
4 March 2021
- 17:4017:40, 4 March 2021 diff hist +139 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 17:4017:40, 4 March 2021 diff hist +139 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
11 February 2021
10 February 2021
9 February 2021
8 February 2021
- 18:1818:18, 8 February 2021 diff hist +135 Nova 200 NanoLab: SEM & EDS →Manufacturer Manuals
- 18:1618:16, 8 February 2021 diff hist −5 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Related Instrumentation in the KNI
- 18:1618:16, 8 February 2021 diff hist −102 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe →Manufacturer Manuals
- 18:1418:14, 8 February 2021 diff hist −4 Nova 200 NanoLab: SEM & EDS →Scanning Electron Microscopes (SEMs)
- 18:1118:11, 8 February 2021 diff hist −4 Equipment List →Scanning Electron Microscopes (SEMs)
5 February 2021
- 21:1221:12, 5 February 2021 diff hist −71 Nova 200 NanoLab: SEM & EDS No edit summary
29 January 2021
4 November 2020
27 October 2020
- 22:0022:00, 27 October 2020 diff hist +90 EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 21:5921:59, 27 October 2020 diff hist +90 EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 15:3915:39, 27 October 2020 diff hist +44 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Specifications and Manuals
- 15:3815:38, 27 October 2020 diff hist +44 EBPG 5000+: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:3815:38, 27 October 2020 diff hist +154 EBPG 5000+: 100 kV Electron Beam Lithography →Data Preparation Resources
- 15:3715:37, 27 October 2020 diff hist +44 EBPG 5200: 100 kV Electron Beam Lithography →Manufacturer Manuals
- 15:3615:36, 27 October 2020 diff hist +154 EBPG 5200: 100 kV Electron Beam Lithography →Data Preparation Resources
15 October 2020
- 01:0401:04, 15 October 2020 diff hist +320 FlexAL II: Atomic Layer Deposition (ALD) →ALD Precursor List
- 00:1500:15, 15 October 2020 diff hist +442 FlexAL II: Atomic Layer Deposition (ALD) →ALD Gas List
14 October 2020
- 23:5923:59, 14 October 2020 diff hist +401 FlexAL II: Atomic Layer Deposition (ALD) →Description
- 17:1117:11, 14 October 2020 diff hist +7 Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner No edit summary
- 17:0917:09, 14 October 2020 diff hist +7 Carbon Evaporator No edit summary
- 17:0817:08, 14 October 2020 diff hist +7 Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography No edit summary
- 17:0817:08, 14 October 2020 diff hist +7 Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF No edit summary
- 17:0717:07, 14 October 2020 diff hist +7 ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 17:0617:06, 14 October 2020 diff hist +7 Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
- 17:0517:05, 14 October 2020 diff hist +7 Sirion: SEM & EDS No edit summary
- 16:4616:46, 14 October 2020 diff hist +7 Nova 200 NanoLab: SEM & EDS No edit summary
- 16:4416:44, 14 October 2020 diff hist +7 Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe No edit summary
12 October 2020
- 16:3616:36, 12 October 2020 diff hist +1,134 Nanoscribe PPGT: Microscale 3D Printer No edit summary
- 16:3516:35, 12 October 2020 diff hist +1,171 DWL-66: Direct-Write Laser System No edit summary
- 16:3516:35, 12 October 2020 diff hist +1,211 Wafer Stepper No edit summary
- 16:3416:34, 12 October 2020 diff hist +1,167 Contact Mask Aligners: MA6 & MA6/BA6 No edit summary
- 16:3116:31, 12 October 2020 diff hist +87 Equipment List →Optical Lithography
- 16:2816:28, 12 October 2020 diff hist +276 CNI-PV 2.1: Nano Imprint Lithography No edit summary
- 16:1216:12, 12 October 2020 diff hist +81 N File:NILT Imprint process.png Flow diagram of an imprint process from the equipment manufacturer. current
- 16:0116:01, 12 October 2020 diff hist 0 N File:CNI NILT wiki.jpeg No edit summary current
