Difference between revisions of "Nathan S. Lee"

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{{StaffMemberInfobox
{{StaffMemberInfobox
|StaffName = Nathan S. Lee
|StaffName = Nathan S. Lee
|StaffPhoto = Nathan-S-Lee.jpg
|StaffPhoto = Nathan-S-Lee.jpg
|JobTitle = Plasma Process Engineer
|JobTitle = Plasma Process Engineer
|AreasResponsibility = Reactive-Ion Etching,<br>Plasma-Enhanced Deposition
|AreasResponsibility = Reactive Ion Etching,<br>Plasma-Enhanced CVD
|CaltechID = nathslee
|CaltechID = nathslee
|Phone = 626-395-1319 (office)
|Phone = 626-395-1319 (office)
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== About ==
== About ==
===== Role in the KNI =====
===== Role in the KNI =====
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Nathan Lee is the Plasma Process Engineer for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology.  He oversees the daily operation of the plasma processing tools in the KNI, maintains good working order, and provides trainings on the tools for the KNI users. <br>
 
After working in the semiconductor equipment industry as a hardware and process engineer for 15 years, Nathan joined Caltech in January of 2016 as a plasma process engineer for the KNI. He brings to the KNI breadth of experience in plasma process development and hardware optimization.
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===== Education =====
===== Education =====
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Nathan received his B.S. in Structural Engineering from the University of California, San Diego.


== List of Managed Instruments ==
== List of Managed Instruments ==
===== Etching =====
===== Etching =====
* [[Oxford 100 DRIE: Bosch & Cryo ICP–RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP–RIE]]
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[Oxford 100 ICP–RIE: III/V, Metal & Silicon Etcher | III/V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP–RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[Oxford Dielectric 100 ICP–RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP–RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Plasmatherm Dual Chamber RIE: Silicon, III/V Material & Organics Etcher | Silicon, III/V Material & Organics Etcher: Plasmatherm Dual Chamber RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]


===== Deposition =====
===== Deposition =====
* [[Oxford FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Oxford 100: Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]


===== Support Tools =====
===== Support Tools =====
* [[Tystar Tytan 1 & 2: Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
 
== Other Notable Content ==
===== Sub-Heading 1 =====
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===== Sub-Heading 2 =====
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== Personal ==
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Latest revision as of 11:13, 29 May 2019

Nathan S. Lee
Nathan-S-Lee.jpg
Title Plasma Process Engineer
Responsibilities Reactive Ion Etching,
Plasma-Enhanced CVD
Email nathslee@caltech.edu
Phone 626-395-1319 (office)
Office 319 Steele

About

Role in the KNI

Nathan Lee is the Plasma Process Engineer for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He oversees the daily operation of the plasma processing tools in the KNI, maintains good working order, and provides trainings on the tools for the KNI users.
After working in the semiconductor equipment industry as a hardware and process engineer for 15 years, Nathan joined Caltech in January of 2016 as a plasma process engineer for the KNI. He brings to the KNI breadth of experience in plasma process development and hardware optimization.

Education

Nathan received his B.S. in Structural Engineering from the University of California, San Diego.

List of Managed Instruments

Etching
Deposition
Support Tools