User contributions for Nathslee
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30 July 2021
- 18:3618:36, 30 July 2021 diff hist −3 FlexAL II: Atomic Layer Deposition (ALD) No edit summary
4 May 2021
- 00:3600:36, 4 May 2021 diff hist −138 Plasma-Enhanced Chemical Vapor Deposition (PECVD) No edit summary
4 August 2020
- 19:0819:08, 4 August 2020 diff hist +35 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →PECVD Gas List
- 19:0319:03, 4 August 2020 diff hist +19 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →PECVD Gas List
- 17:2717:27, 4 August 2020 diff hist +9 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Current PECVD Table Temperature
- 17:2417:24, 4 August 2020 diff hist +130 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Resources
11 March 2020
- 19:4819:48, 11 March 2020 diff hist +20 Process Recipe Library No edit summary
- 19:4619:46, 11 March 2020 diff hist +142 Process Recipe Library No edit summary
- 19:4019:40, 11 March 2020 diff hist +120 Tube Furnaces for Wet & Dry Processing →Resources
6 February 2020
- 22:2222:22, 6 February 2020 diff hist +86 Process Recipe Library →Chemical Vapor Deposition (CVD)
- 21:3821:38, 6 February 2020 diff hist 0 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Process Documents
- 21:3721:37, 6 February 2020 diff hist +87 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Process Documents
29 May 2019
- 19:4219:42, 29 May 2019 diff hist −18 ICP-RIE: Dielectric Etcher →Dielectric Etcher Gas List
- 19:4119:41, 29 May 2019 diff hist 0 ICP-RIE: Dielectric Etcher →SOPs & Troubleshooting
- 19:4119:41, 29 May 2019 diff hist 0 ICP-RIE: III-V, Metal & Silicon Etcher →SOPs & Troubleshooting
- 19:4019:40, 29 May 2019 diff hist 0 DRIE: Bosch & Cryo ICP-RIE for Silicon →SOPs & Troubleshooting
- 17:1717:17, 29 May 2019 diff hist −8 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →SOPs & Troubleshooting
- 11:1311:13, 29 May 2019 diff hist −13 Nathan S. Lee →Experience & Education current
- 11:1111:11, 29 May 2019 diff hist +123 Nathan S. Lee →Role in the KNI
- 10:4510:45, 29 May 2019 diff hist −7 Nathan S. Lee →Experience & Education
- 10:4210:42, 29 May 2019 diff hist +245 Nathan S. Lee No edit summary
- 10:1910:19, 29 May 2019 diff hist −7 KNI Staff Members No edit summary
28 May 2019
- 22:3622:36, 28 May 2019 diff hist −333 Nathan S. Lee No edit summary
- 22:2122:21, 28 May 2019 diff hist 0 ICP-RIE: III-V, Metal & Silicon Etcher →Description
- 22:1822:18, 28 May 2019 diff hist +44 ICP-RIE: III-V, Metal & Silicon Etcher →Description
- 22:1522:15, 28 May 2019 diff hist −111 DRIE: Bosch & Cryo ICP-RIE for Silicon →Description
- 22:0322:03, 28 May 2019 diff hist 0 DRIE: Bosch & Cryo ICP-RIE for Silicon →Description
- 21:5821:58, 28 May 2019 diff hist −2 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →Description
- 21:5021:50, 28 May 2019 diff hist −4 FlexAL II: Atomic Layer Deposition (ALD) →SOPs & Troubleshooting
- 17:4617:46, 28 May 2019 diff hist −232 FlexAL II: Atomic Layer Deposition (ALD) →Process Documents
- 17:2917:29, 28 May 2019 diff hist −83 ICP-RIE: Dielectric Etcher →Process Documents
- 17:2817:28, 28 May 2019 diff hist −12 ICP-RIE: Dielectric Etcher →Allowed material in Dielectric Etch System
- 17:1117:11, 28 May 2019 diff hist +11 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →RIE Gas List
- 16:3816:38, 28 May 2019 diff hist 0 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →PECVD Gas List
- 16:3816:38, 28 May 2019 diff hist 0 Plasma-Enhanced Chemical Vapor Deposition (PECVD) →PECVD Gas List
- 16:2916:29, 28 May 2019 diff hist −13 Tube Furnaces for Wet & Dry Processing →SOPs & Troubleshooting
- 16:2716:27, 28 May 2019 diff hist +26 Tube Furnaces for Wet & Dry Processing →SOPs & Troubleshooting
24 May 2019
- 21:2121:21, 24 May 2019 diff hist +122 Tube Furnaces for Wet & Dry Processing No edit summary
- 21:1821:18, 24 May 2019 diff hist +786 N Tube Furnaces for Wet & Dry Processing Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Tystar Tytan Tube Furnaces 1 & 2 |HeaderColor = #E6E7E8 |ImageOne = |ImageTwo = |InstrumentType = Equipment_List#Support_Too..."
23 April 2019
- 19:0419:04, 23 April 2019 diff hist 0 N File:Oxford etchers instrument image.jpg No edit summary current
