User contributions for Nathslee

28 July 2026

• 01:1901:19, 28 July 2026 diff hist +33 Wet Chemistry →NEVER bring in any chemicals into the KNI Lab before receiving an approval through email that your chemical has been allowed to be used inside the lab. current

30 July 2021

• 18:3618:36, 30 July 2021 diff hist −3 FlexAL II: Atomic Layer Deposition (ALD) No edit summary

4 May 2021

• 00:3600:36, 4 May 2021 diff hist −138 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD No edit summary

4 August 2020

• 19:0819:08, 4 August 2020 diff hist +35 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →PECVD Gas List
• 19:0319:03, 4 August 2020 diff hist +19 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →PECVD Gas List
• 17:2717:27, 4 August 2020 diff hist +9 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Current PECVD Table Temperature
• 17:2417:24, 4 August 2020 diff hist +130 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Resources

11 March 2020

• 19:4819:48, 11 March 2020 diff hist +20 Process Recipe Library No edit summary
• 19:4619:46, 11 March 2020 diff hist +142 Process Recipe Library No edit summary
• 19:4019:40, 11 March 2020 diff hist +120 Tube Furnaces for Wet & Dry Processing →Resources

6 February 2020

• 22:2222:22, 6 February 2020 diff hist +86 Process Recipe Library →Chemical Vapor Deposition (CVD)
• 21:3821:38, 6 February 2020 diff hist 0 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Process Documents
• 21:3721:37, 6 February 2020 diff hist +87 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Process Documents

29 May 2019

• 19:4219:42, 29 May 2019 diff hist −18 ICP-RIE: Dielectric Etcher →Dielectric Etcher Gas List
• 19:4119:41, 29 May 2019 diff hist 0 ICP-RIE: Dielectric Etcher →SOPs & Troubleshooting
• 19:4119:41, 29 May 2019 diff hist 0 ICP-RIE: III-V, Metal & Silicon Etcher →SOPs & Troubleshooting
• 19:4019:40, 29 May 2019 diff hist 0 DRIE: Bosch & Cryo ICP-RIE for Silicon →SOPs & Troubleshooting
• 17:1717:17, 29 May 2019 diff hist −8 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →SOPs & Troubleshooting
• 11:1311:13, 29 May 2019 diff hist −13 Nathan S. Lee →Experience & Education
• 11:1111:11, 29 May 2019 diff hist +123 Nathan S. Lee →Role in the KNI
• 10:4510:45, 29 May 2019 diff hist −7 Nathan S. Lee →Experience & Education
• 10:4210:42, 29 May 2019 diff hist +245 Nathan S. Lee No edit summary
• 10:1910:19, 29 May 2019 diff hist −7 KNI Staff Members No edit summary

28 May 2019

• 22:3622:36, 28 May 2019 diff hist −333 Nathan S. Lee No edit summary
• 22:2122:21, 28 May 2019 diff hist 0 ICP-RIE: III-V, Metal & Silicon Etcher →Description
• 22:1822:18, 28 May 2019 diff hist +44 ICP-RIE: III-V, Metal & Silicon Etcher →Description
• 22:1522:15, 28 May 2019 diff hist −111 DRIE: Bosch & Cryo ICP-RIE for Silicon →Description
• 22:0322:03, 28 May 2019 diff hist 0 DRIE: Bosch & Cryo ICP-RIE for Silicon →Description
• 21:5821:58, 28 May 2019 diff hist −2 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Description
• 21:5021:50, 28 May 2019 diff hist −4 FlexAL II: Atomic Layer Deposition (ALD) →SOPs & Troubleshooting
• 17:4617:46, 28 May 2019 diff hist −232 FlexAL II: Atomic Layer Deposition (ALD) →Process Documents
• 17:2917:29, 28 May 2019 diff hist −83 ICP-RIE: Dielectric Etcher →Process Documents
• 17:2817:28, 28 May 2019 diff hist −12 ICP-RIE: Dielectric Etcher →Allowed material in Dielectric Etch System
• 17:1117:11, 28 May 2019 diff hist +11 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →RIE Gas List
• 16:3816:38, 28 May 2019 diff hist 0 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →PECVD Gas List
• 16:3816:38, 28 May 2019 diff hist 0 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →PECVD Gas List
• 16:2916:29, 28 May 2019 diff hist −13 Tube Furnaces for Wet & Dry Processing →SOPs & Troubleshooting
• 16:2716:27, 28 May 2019 diff hist +26 Tube Furnaces for Wet & Dry Processing →SOPs & Troubleshooting

24 May 2019

• 21:2121:21, 24 May 2019 diff hist +122 Tube Furnaces for Wet & Dry Processing No edit summary
• 21:1821:18, 24 May 2019 diff hist +786 N Tube Furnaces for Wet & Dry Processing Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Tystar Tytan Tube Furnaces 1 & 2 |HeaderColor = #E6E7E8 |ImageOne = |ImageTwo = |InstrumentType = Equipment_List#Support_Too..."

23 April 2019

• 19:0419:04, 23 April 2019 diff hist 0 N File:Oxford etchers instrument image.jpg No edit summary current