Nathan S. Lee

Nathan S. Lee Title Plasma Process Engineer Responsibilities Reactive Ion Etching, Plasma-Enhanced CVD Email nathslee@caltech.edu Phone 626-395-1319 (office) Office 319 Steele

About

Role in the KNI

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Education

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List of Managed Instruments

Etching

• Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE
• III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE
• Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE
• Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE

Deposition

• Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
• Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100

Support Tools

• Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)