User contributions for Kmmckenz

27 October 2026

• 16:1316:13, 27 October 2026 diff hist −6 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD No edit summary current
• 16:1216:12, 27 October 2026 diff hist 0 N File:OxidenitridePECVD.jpg No edit summary current

26 October 2026

• 20:3620:36, 26 October 2026 diff hist −4 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD No edit summary
• 20:3620:36, 26 October 2026 diff hist −29 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD No edit summary
• 20:3420:34, 26 October 2026 diff hist +25 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Related Instrumentation in the KNI current Tag: Visual edit
• 20:3320:33, 26 October 2026 diff hist +34 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →Allowed material in PECVD System Tag: Visual edit
• 20:2920:29, 26 October 2026 diff hist −37 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD No edit summary
• 20:2820:28, 26 October 2026 diff hist +8 m Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD No edit summary
• 20:2820:28, 26 October 2026 diff hist +14 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD No edit summary Tag: Visual edit: Switched
• 20:2720:27, 26 October 2026 diff hist +26 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD →Manufacturer Manuals Tag: Visual edit

21 October 2026

• 19:3719:37, 21 October 2026 diff hist +19 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD →System Features Tag: Visual edit
• 19:2519:25, 21 October 2026 diff hist +80 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD →SOPs & Troubleshooting Tag: Visual edit
• 19:2419:24, 21 October 2026 diff hist −127 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD →Process Documents Tag: Visual edit
• 19:1819:18, 21 October 2026 diff hist −263 Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD →Applications Tag: Visual edit
• 19:1419:14, 21 October 2026 diff hist +111 Equipment List →Dry Etching current Tag: Visual edit
• 19:1319:13, 21 October 2026 diff hist −335 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →SOPs & Troubleshooting current Tag: Visual edit
• 19:1219:12, 21 October 2026 diff hist +62 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Resources Tag: Visual edit

20 October 2026

• 00:3400:34, 20 October 2026 diff hist −68 ICP-RIE: III-V, Metal & Silicon Etcher →Manufacturer Manuals: changed Labrunr link and reference current Tag: Visual edit
• 00:3200:32, 20 October 2026 diff hist +61 III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Manufacturer Manuals Tag: Visual edit
• 00:2500:25, 20 October 2026 diff hist −128 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Manufacturer Specifications Tag: Visual edit
• 00:2400:24, 20 October 2026 diff hist −60 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →System Features Tag: Visual edit
• 00:1300:13, 20 October 2026 diff hist +19 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Manufacturer Manuals Tag: Visual edit
• 00:0700:07, 20 October 2026 diff hist +39 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Related Tools Tag: Visual edit
• 00:0600:06, 20 October 2026 diff hist +4 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Related Tools Tag: Visual edit
• 00:0200:02, 20 October 2026 diff hist −15 III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE updated photo
• 00:0100:01, 20 October 2026 diff hist +33 N File:Oxford Cobra 1.jpg Oxford Cobra etcher current

12 October 2026

• 17:2817:28, 12 October 2026 diff hist −228 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Review Articles Tag: Visual edit
• 17:2517:25, 12 October 2026 diff hist −752 III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Specifications: Filled out specs Tag: Visual edit
• 17:0117:01, 12 October 2026 diff hist +4 III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Allowed Material in Etcher Tag: Visual edit
• 16:4016:40, 12 October 2026 diff hist +19 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Allowed Material in Etcher Tag: Visual edit

8 October 2026

• 17:4017:40, 8 October 2026 diff hist +54 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Allowed Material in Etcher Tag: Visual edit

7 October 2026

• 19:3019:30, 7 October 2026 diff hist −16 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE removed N2 from gas list Tag: Visual edit
• 18:0718:07, 7 October 2026 diff hist +12 m III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE →Etching Gas List: typo Tag: Visual edit
• 18:0618:06, 7 October 2026 diff hist −130 III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE Beginning replacement of III-V template with Cobra information Tag: Visual edit: Switched

1 October 2026

• 00:2100:21, 1 October 2026 diff hist +6,758 N III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = III-V, Metal & Si Etcher |HeaderColor = #FFE2B9 |ImageOne = ICP-RIE_III-V,Metal,Si-Etcher.jpg |ImageTwo = |InstrumentType = Etching |RoomLocation = B235 Steele |LabPhone = 626-395-1532 |PrimaryStaff = Kelly McKenzie |StaffEmail = kmmckenz@caltech.edu |StaffPhone = 626-395-5732 |Manufacturer = Oxford Instruments |Techniques = pseudo-Bosch & Cryogenic Si Etch<br>Compound Semiconductor Etching |E..."

5 February 2024

• 20:2220:22, 5 February 2024 diff hist +54 m ICP-RIE: III-V, Metal & Silicon Etcher clarified allowed materials

22 August 2023

• 21:1621:16, 22 August 2023 diff hist +106 Dual Chamber RIE: Silicon, III-V Material & Organics Etcher →SOPs & Troubleshooting: added reservation policy
• 21:1621:16, 22 August 2023 diff hist −3 ICP-RIE: Dielectric Etcher →SOPs & Troubleshooting: added reservation policy
• 21:1521:15, 22 August 2023 diff hist −3 ICP-RIE: III-V, Metal & Silicon Etcher →SOPs & Troubleshooting: added reservation policy
• 21:1521:15, 22 August 2023 diff hist −192 DRIE: Bosch & Cryo ICP-RIE for Silicon →SOPs & Troubleshooting: removed old and duplicate links
• 21:0621:06, 22 August 2023 diff hist +98 DRIE: Bosch & Cryo ICP-RIE for Silicon →SOPs & Troubleshooting: added reservation policy
• 21:0321:03, 22 August 2023 diff hist +99 Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD →SOPs & Troubleshooting: added reservation policy
• 21:0221:02, 22 August 2023 diff hist +102 FlexAL II: Atomic Layer Deposition (ALD) →SOPs & Troubleshooting: added reservation policy

24 April 2023

• 23:4523:45, 24 April 2023 diff hist +8 Tube Furnaces for Wet & Dry Processing →Allowed Materials: added SiNx
• 23:1123:11, 24 April 2023 diff hist −16 DRIE: Bosch & Cryo ICP-RIE for Silicon →Allowed material in DRIE: removed SiO2 from allowed etch materials

21 February 2023

• 21:3321:33, 21 February 2023 diff hist −206 Kelly McKenzie →Managed Equipment: removed plasma cleaner and XeF2 etcher
• 21:3121:31, 21 February 2023 diff hist +2 m Kelly McKenzie →Education: updated pronouns
• 21:3021:30, 21 February 2023 diff hist +34 m Kelly McKenzie →Role in the KNI: updated pronouns

7 June 2022

• 22:1122:11, 7 June 2022 diff hist +1 Light Microscope with Spectroscopic Reflectometer No edit summary

28 April 2022

• 19:3619:36, 28 April 2022 diff hist +36 FlexAL II: Atomic Layer Deposition (ALD) Added to precursor list: BDEAS (silicon) (SDS coming soon)