Kelly McKenzie: Difference between revisions

Latest revision as of 21:33, 21 February 2023

Kelly McKenzie


Title	Plasma Process Engineer
Responsibilities	Etch and Deposition
Email	kmmckenz@caltech.edu
Phone	626-395-5732 (office)
Office	130 Steele

About

Role in the KNI

Kelly (they/them) is the Plasma Process Engineer for the Kavli Nanoscience Institute (KNI) at the California Institute of Technology. Kelly manages the KNI's suite of plasma etch and chemical vapor deposition systems, as well as the tools for wet and dry oxidation and annealing. In their roll, Kelly maintains equipment, trains researchers in equipment operation, and provides technical support for helping users carry out their projects' objectives.

Kelly joined Caltech in 2017 as a graduate student in the Atwater research group in the Applied Physics & Materials Science department where they completed their master's. They returned in July 2021 as the laboratory technician for the KNI.

Education

Kelly received their M.S. in Materials Science from Caltech and B.S. degrees in Electrical Engineering and in Physics from the University of Arkansas at Fayetteville.

Managed Equipment

Chemical Vapor Deposition (CVD)

Dry Etching

Thermal Processing

Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)

@@ Line 2: / Line 2: @@
 {{StaffMemberInfobox
 |StaffName = Kelly McKenzie
-|StaffPhoto = Kelly_McKenzie_2.jpg
+|StaffPhoto = McKenzie_Kelly_2.jpg
-|JobTitle = Laboratory Technician
+|JobTitle = Plasma Process Engineer
-|AreasResponsibility = General Lab Support
+|AreasResponsibility = Etch and Deposition
 |CaltechID = kmmckenz
 |Phone = 626-395-5732 (office)
@@ Line 12: / Line 12: @@
 ===== Role in the KNI =====
-Kelly is the Laboratory Technician for the Kavli Nanoscience Institute (KNI) at the California Institute of Technology. In her roll she supports the technical staff team across the labs in areas such as maintenance, equipment upkeep, walkthroughs, and supplies. She also works on process development and is a resource for users with lab-related questions.
+Kelly (they/them) is the Plasma Process Engineer for the Kavli Nanoscience Institute (KNI) at the California Institute of Technology. Kelly manages the KNI's suite of plasma etch and chemical vapor deposition systems, as well as the tools for wet and dry oxidation and annealing. In their roll, Kelly maintains equipment, trains researchers in equipment operation, and provides technical support for helping users carry out their projects' objectives.
-Kelly joined Caltech in 2017 as a graduate student in the Atwater research group in the Applied Physics & Materials Science department where she completed her master's. She returned in July 2021 in her current role at the KNI.
+Kelly joined Caltech in 2017 as a graduate student in the Atwater research group in the Applied Physics & Materials Science department where they completed their master's. They returned in July 2021 as the laboratory technician for the KNI.
 ===== Education =====
-Kelly received her M.S. in Materials Science from Caltech and B.S. degrees in Electrical Engineering and in Physics from the University of Arkansas at Fayetteville.
+Kelly received their M.S. in Materials Science from Caltech and B.S. degrees in Electrical Engineering and in Physics from the University of Arkansas at Fayetteville.
+===== Managed Equipment =====
+Chemical Vapor Deposition (CVD)
+* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
+* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
+Dry Etching
+* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
+* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
+* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
+* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
+Thermal Processing
+* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]