Wafer Stepper: Difference between revisions

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* [https://caltech.box.com/s/j19tuhv68bk0nsa5nruc95g4dizzxtr7 Lithography Pass-down equipment information]
* [https://caltech.box.com/s/j19tuhv68bk0nsa5nruc95g4dizzxtr7 Lithography Pass-down equipment information]
===== SOPs =====
===== SOPs =====
* [https://caltech.box.com/s/ufsyvbdxxhbnpkqjt7mashqmkyxsrq70 General SOP]
* [https://caltech.box.com/s/z6q0ovarnkwe1sec645uq8kti44r4jwc GCA 6300 Operation Quick Guide Reference]
* [https://caltech.box.com/s/o634f2xum216ah4lrmxy67nurxbt5iqg GCA 6300 Operation SOP]
* [https://caltech.box.com/s/kdcnpkzlkb3sz42elrs07wq8wstr8pvr GCA 6300 Power-up SOP]
* [https://caltech.box.com/s/kdcnpkzlkb3sz42elrs07wq8wstr8pvr GCA 6300 Power-up SOP]

Revision as of 20:34, 17 June 2021

I-Line-Wafer-Stepper GCA-6300.jpg
Instrument Type Lithography
Techniques Wafer Patterning,
Pattern Alignments
Staff Manager Bert Mendoza
Staff Email bertm@caltech.edu
Staff Phone 626-395-4075
Reserve time on LabRunr
Request training by email
Lab Location B217 Steele
Lab Phone 626-395-1536
Manufacturer GCA
Model 6300


The 6000 Series DSW Wafer Stepper wafer exposure system is fully automatic and capable of exposing an array of images directly on photoresist-coated wafers. Image field size is dependent on the lens selected for the user's particular application. The lens in this system is a Zeiss 10X with a maximum field size of 10 mm x 10 mm. This reduces the pattern from the reticle by a factor of 10 onto the substrate. The KNI stepper has paddles for wafer handling to accommodate 2-, 3-, 4-, 6-, and 8-inch wafers as well as pieces. The stepper is located inside of an environmental chamber set to maintain +/-0.1 °C temperature control.

Software allows conversational input dialogue to reduce errors and simplify the specification of complex operating parameters, a part of which permits selection of either circular of rectangular arrays on the wafer. A laser position transducer with automatic compensation for atmospheric conditions and work piece temperature is employed to meter X- & Y-coordinate stage positioning over a 150 mm x 150 mm (6 in x 6 in) square exposable area. Maximum throughput is assured through use of X- & Y-coordinate stage speeds of up to 50 mm (2 in) per second and exposures in both directions of travel (boustrophedonic stepping). The GCA 6300 at KNI has been fully refurbished by RZE Enterprises with a new PC and control electronics.

  • Step exposure with alignments
  • Step exposure without alignments


Equipment Data
Optical Lithography Resources
Manufacturer Manuals


  • Spectral Line: 365 nm wavelength (aka "i-line") via Hg lamp
  • System is setup for 4 inch wafers and pieces smaller than 100mm.

Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography