Nanoscribe PPGT: Microscale 3D Printer: Difference between revisions
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|Techniques = Two-Photon Lithography<br>(Optical 3D printing) | |Techniques = Two-Photon Lithography<br>(Optical 3D printing) | ||
|RequestTraining = alexw@caltech.edu | |RequestTraining = alexw@caltech.edu | ||
|EmailList = kni-nanoscribe | |EmailList = kni-nanoscribe | ||
|EmailListName = Nanoscribe | |EmailListName = Nanoscribe | ||
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== Resources == | == Resources == | ||
===== Equipment Status ===== | |||
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Nanoscribe from the dropdown menu) | |||
===== SOPs ===== | ===== SOPs ===== | ||
* [https://caltech.box.com/s/ | * [https://caltech.box.com/s/poquw902yg9epv65pibqpat7zzoq7htq KNI SOP] | ||
===== | |||
* [https://caltech.box.com/s/ | ===== Scheduling Policy ===== | ||
* [https://caltech.box.com/s/tzu3ugpyh793s5itqb2ci0yd07ezbul9 Scheduling Policy] | |||
== Related Instrumentation in the KNI == | |||
===== Electron Beam Lithography ===== | |||
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]] | |||
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]] | |||
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]] | |||
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]] | |||
===== Ion Beam Lithography ===== | |||
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]] | |||
===== Optical Lithography ===== | |||
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]] | |||
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]] | |||
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]] | |||
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]] | |||
* [[Optical Lithography Resources]] | |||
Latest revision as of 18:33, 26 July 2022
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Description
The Nanoscribe Photonic Professional GT (PPGT) is a high-precision microscale 3D printer that utilizes two-photon polymerization of various photoresists. The PPGT uses its own scripting environment to control a wide variety of writing parameters and to define points and paths to be written in the chosen resist. While many resists can theoretically be used, Nanoscribe has its own specially-formulated resins optimized for their two-photon lithography system. Writing at different length scales and resolutions can be optimized by choosing the appropriate resin. The software also includes slicing capability so that CAD files in STL format can be converted to a tool path much like what is found in common FDM 3D printers. Writing can be performed across areas as large as 100 mm x 100 mm, with features approximately as small as 200 nm x 500 nm, and can be viewed in real time during the writing process.
Applications
- Micro/mesoscale Optical 3D Printing
- Maskless 2D Lithography
Resources
Equipment Status
- LabRunr Equipment Status (Select Nanoscribe from the dropdown menu)
SOPs
Scheduling Policy
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography
- Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography