Difference between revisions of "Nanoscribe PPGT: Microscale 3D Printer"

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{{InstrumentInfobox|
{{InstrumentInfobox|
|InstrumentName = Photonic Professional GT  
|InstrumentName = Photonic Professional GT  
|HeaderColor = #F5A81C
|HeaderColor = #FFFFFF
|ImageOne =  
|ImageOne = Geodesic-Domes_Xiaoxing-Xia.jpg
|ImageTwo =  
|ImageTwo = Nanoscribe-PPGT.jpg
|InstrumentType = [[Equipment_List#Photolithography|Photolithography]]
|InstrumentType = [[Equipment_List#Photolithography|Photolithography]]
|RoomLocation =  
|RoomLocation = B203B Steele
|LabPhone = 626-395-1539
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alex Wertheim]]
|PrimaryStaff = [[Alex Wertheim]]
Line 11: Line 11:
|StaffPhone = 626-395-3371
|StaffPhone = 626-395-3371
|Manufacturer = Nanoscribe
|Manufacturer = Nanoscribe
|Techniques = 2-photon lithography (optical 3D printing)
|Model = PPGT
|Techniques = Two-Photon Lithography<br>(Optical 3D printing)
|RequestTraining = alexw@caltech.edu
|RequestTraining = alexw@caltech.edu
|EmailList = kni-nanoscribe@caltech.edu
|EmailList = kni-nanoscribe
|EmailListName = kni-nanoscribe
|EmailListName = Nanoscribe
}}
}}
== Description ==
== Description ==
The Photonic Professional GT (PPGT), by Nanoscribe, is a high precision microscale 3D printer that utilizes two photon polymerization of various photoresists. The PPGT uses its own scripting environment to control a wide variety of writing parameters and to define points and paths to be written in the chosen resist. While many resists can theoretically be used, nanoscribe has it's own specially formulated resins optimized for their 2-photon lithography system. Writing at different scales/resolutions can be optimized by choosing the appropriate resin. The software also includes slicing capability so that CAD files in STL format can be converted to a tool path much like what is found in common FDM 3D printers. Writing can be performed across areas as large as 100 x 100 mm^2, with features approximately as small as 200nm x 500nm, and can be viewed in real time during the writing process.
The Nanoscribe Photonic Professional GT (PPGT) is a high-precision microscale 3D printer that utilizes two-photon polymerization of various photoresists. The PPGT uses its own scripting environment to control a wide variety of writing parameters and to define points and paths to be written in the chosen resist. While many resists can theoretically be used, Nanoscribe has its own specially-formulated resins optimized for their two-photon lithography system. Writing at different length scales and resolutions can be optimized by choosing the appropriate resin. The software also includes slicing capability so that CAD files in STL format can be converted to a tool path much like what is found in common FDM 3D printers. Writing can be performed across areas as large as 100 mm x 100 mm, with features approximately as small as 200 nm x 500 nm, and can be viewed in real time during the writing process.


===== Applications =====
===== Applications =====
* Micro/mesoscale optical 3D printing
* Micro/mesoscale Optical 3D Printing
* Maskless 2D lithography
* Maskless 2D Lithography


== Resources ==
== Resources ==
===== Equipment Status =====
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Nanoscribe from the dropdown menu)
===== SOPs =====
===== SOPs =====
* [https://caltech.box.com/s/4yv8f5att77k3zq1rm6p0mqhkd8quslh KNI SOP]
* [https://caltech.box.com/s/poquw902yg9epv65pibqpat7zzoq7htq KNI SOP]
 
===== Scheduling Policy =====
* [https://caltech.box.com/s/tzu3ugpyh793s5itqb2ci0yd07ezbul9 Scheduling Policy]


===== Manufacturer Manuals =====
== Related Instrumentation in the KNI ==
* [https://caltech.box.com/s/bbx3pf7cn85bk6ztu9psrj2kew3lvbos PPGT Complete Manual]
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Optical Lithography Resources]]

Latest revision as of 18:33, 26 July 2022

Photonic Professional GT
Geodesic-Domes Xiaoxing-Xia.jpg
Instrument Type Photolithography
Techniques Two-Photon Lithography
(Optical 3D printing)
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on LabRunr
Request training by email
Sign up for Nanoscribe email list
Lab Location B203B Steele
Lab Phone 626-395-1539
Manufacturer Nanoscribe
Model PPGT
Nanoscribe-PPGT.jpg

Description

The Nanoscribe Photonic Professional GT (PPGT) is a high-precision microscale 3D printer that utilizes two-photon polymerization of various photoresists. The PPGT uses its own scripting environment to control a wide variety of writing parameters and to define points and paths to be written in the chosen resist. While many resists can theoretically be used, Nanoscribe has its own specially-formulated resins optimized for their two-photon lithography system. Writing at different length scales and resolutions can be optimized by choosing the appropriate resin. The software also includes slicing capability so that CAD files in STL format can be converted to a tool path much like what is found in common FDM 3D printers. Writing can be performed across areas as large as 100 mm x 100 mm, with features approximately as small as 200 nm x 500 nm, and can be viewed in real time during the writing process.

Applications
  • Micro/mesoscale Optical 3D Printing
  • Maskless 2D Lithography

Resources

Equipment Status
SOPs
Scheduling Policy

Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography