Difference between revisions of "Equipment List"

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===== Sample Preparation =====
 
===== Sample Preparation =====
 
* [[TEM Sample Preparation Equipment | TEM sample preparation equipment: Polishing Stations, 3 mm Core Drill, Dimpler, Argon Ion Mill]]
 
* [[TEM Sample Preparation Equipment | TEM sample preparation equipment: Polishing Stations, 3 mm Core Drill, Dimpler, Argon Ion Mill]]
 +
* [[Leica EM ACE600: Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
 +
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Revision as of 00:07, 7 May 2019

Lithography

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)
Dielectric Packaging / Moisture Barrier

Etching

Dry Etching
Wet Etching

Microscopy

Focused Ion Beam (FIB) Systems
Scanning Electron Microscopes (SEMs)
Transmission Electron Microscopes (TEMs)
Scanning Probe Microscopes
Optical Characterization
Sample Preparation for Microscopy

Support Tools

Thermal Processing
Substrate Processing
Device Processing
Sample Preparation