CNI-PV 2.1: Nano Imprint Lithography

NIL Technology CNI-PV 2.1 Nano Imprint Lithography System File:Research.jpg Instrument Type Lithography Techniques Thermal and UV Nanoimprint Lithography Staff Manager Bert Mendoza Staff Email bertm@caltech.edu Staff Phone 626-395-4075 Request training by email Lab Location B217 Steele Lab Phone 626-395-1536 Manufacturer NIL Technology File:Instrument.jpg

Description

The NIL Technology CNI-PV 2.1 Nano Imprint Lithography System is a lithography tool that is used to enable nanoscale printing by thermal or UV exposure of photoresist with an imprint stamp. Vacuum in the imprint chamber is enabled down to 1 micron, and thermal imprint of up to 240°C is available. The system is compatible with UV-cured resists, and has an integral UV light source for those processes. It allows up to 200 mm diameter substrates with UV, or up to 150x150 mm substrates with thermal processing.

Operational Applications

• Thermal Nano Imprint Lithography
• UV Nano Imprint Lithography

Scientific / Technical Applications

• Nanophotonics
• Nano-optics
• Waveguides

Resources

Lithography Process Information

• Laurell Spinner cleaning SOP

Specifications

• Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
• UV nanoImprint up to 200 mm wafers

Related Instrumentation in the KNI

Electron Beam Lithography

• EBPG 5200: 100 kV Electron Beam Lithography
• EBPG 5000+: 100 kV Electron Beam Lithography
• Quanta 200F: SEM with 1-30 kV Electron Beam Lithography
• Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography

Ion Beam Lithography

• ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy

Optical Lithography

• Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6
• i-Line Wafer Stepper: GCA model 6300
• Direct-Write Laser System: Heidelberg Instruments DWL-66
• Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT
• Optical Lithography Resources