CNI-PV 2.1: Nano Imprint Lithography: Difference between revisions
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|InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System | |InstrumentName = NIL Technology CNI-PV 2.1 Nano Imprint Lithography System | ||
|HeaderColor = #F5A81C | |HeaderColor = #F5A81C | ||
|ImageResearch = | |ImageResearch = NILT_Imprint_process.png | ||
|ImageInstrument = | |ImageInstrument = CNI_NILT_wiki.jpeg | ||
|InstrumentType = Lithography | |InstrumentType = Lithography | ||
|RoomLocation = B217 Steele | |RoomLocation = B217 Steele | ||
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== Resources == | == Resources == | ||
===== Equipment Data ===== | ===== Equipment Data ===== | ||
* | * [https://caltech.box.com/s/b18bwz6vibzsz08hnhior52vcep8cww4 CNI v2.1 PV Edition description] | ||
===== General SOPs ===== | ===== General SOPs ===== | ||
* | * | ||
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* | * | ||
===== Sample Prep and Writing SOPs ===== | ===== Sample Prep and Writing SOPs ===== | ||
* | * [https://caltech.box.com/s/8tv6lvwmwbecgwd9qayq73mbdje4klmk NanoImprint Resists flyer] | ||
* [https://caltech.box.com/s/jsetuvrq4ec1alqvn25pz11kmtzuw8rc Laurell Spinner cleaning SOP] | |||
===== Advanced Troubleshooting SOPs ===== | ===== Advanced Troubleshooting SOPs ===== | ||
* | * | ||
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* | * | ||
===== Lithography Process Information ===== | ===== Lithography Process Information ===== | ||
* [https:// | * [https://youtu.be/YzzHchJZaCw Hot Embossing Demo from NILT (YouTube - external)] | ||
===== Manufacturer Manuals ===== | ===== Manufacturer Manuals ===== | ||
* | * | ||
Revision as of 16:28, 12 October 2020
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Description
The NIL Technology CNI-PV 2.1 Nano Imprint Lithography System is a lithography tool that is used to enable nanoscale printing by thermal or UV exposure of photoresist with an imprint stamp. Vacuum in the imprint chamber is enabled down to 1 micron, and thermal imprint of up to 240°C is available. The system is compatible with UV-cured resists, and has an integral UV light source for those processes. It allows up to 200 mm diameter substrates with UV, or up to 150x150 mm substrates with thermal processing.
Operational Applications
- Thermal Nano Imprint Lithography
- UV Nano Imprint Lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
Equipment Data
General SOPs
Training Materials
Sample Prep and Writing SOPs
Advanced Troubleshooting SOPs
Data Preparation Resources
Lithography Process Information
Manufacturer Manuals
Specifications
- Thermal NanoImprint: Up to 240°C with 150x150 mm substrate
- UV NanoImprint up to 200 mm wafers
Related Instrumentation in the KNI
Electron Beam Lithography
- EBPG 5200: 100 kV Electron Beam Lithography
- EBPG 5000+: 100 kV Electron Beam Lithography
- Quanta 200F: SEM with 1-30 kV Electron Beam Lithography
- Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography