DWL-66: Direct-Write Laser System

DWL-66 Direct-Write Laser System Instrument Type Lithography Techniques Direct Patterning, Pattern Alignment, Wafer and Mask Patterning Staff Manager Alex Wertheim Staff Email alexw@caltech.edu Staff Phone 626-395-3371 Reserve time on FBS Request training via FBS User Dashboard Lab Location B217 Steele Lab Phone 626-395-1536 Manufacturer Heidelberg Instruments Model DWL-66

Description

The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi (dots per inch) is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.

Applications

• Direct Writing
• Grayscale Writing

Resources

Equipment Data

• Lithography Pass-down equipment information

SOPs

• Operation SOP

Labrunr Reservation Rules:

	Advanced Res (days)	Limit per Res (hrs)	Limit per week (hrs)
Weekday	7	4	12
Weeknight	7	6	18
Weekend	14	6	18

For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.

Optical Lithography Resources

• Optical Lithography Resources Page

Manufacturer Manuals

• User Guide, Part 1
• User Guide, Part 2

Specifications

• Exposure: 442 nm wavelength HeCd laser

Related Instrumentation in the KNI

Electron Beam Lithography

• EBPG 5200: 100 kV Electron Beam Lithography
• EBPG 5000+: 100 kV Electron Beam Lithography
• Quanta 200F: SEM with 1-30 kV Electron Beam Lithography
• Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography

Ion Beam Lithography

• ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy

Optical Lithography

• Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6
• i-Line Wafer Stepper: GCA model 6300
• Nano Imprint Lithography: NILT CNI-PV 2.1
• Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT
• Optical Lithography Resources