Labline: Electron Beam Evaporator: Difference between revisions
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===== Video Tutorials ===== | ===== Video Tutorials ===== | ||
* [https://youtu.be/jq5M7fkgpfM Labline Training] | * [https://youtu.be/jq5M7fkgpfM Labline Training] | ||
* [https://youtu.be/5C6It9YO_jg Sample Load & Transfer] | |||
== Specifications == | == Specifications == | ||
Revision as of 17:39, 13 October 2020
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Description
The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.
Applications
- Metal deposition (Ti, Pt, Au, Al)
- Lift-off
- Non-selective etch
- Ion-assisted deposition (simultaneous etching & deposition)
Resources
Equipment Data
SOPs & Troubleshooting
Tool Reservation Rules
| Advanced Reservation (days) | Limit per Reservation (hrs) | Limit per week (hrs) | |
|---|---|---|---|
| Weekday | 7 | 6 | 18 |
| Weeknight | 7 | 8 | 18 |
| Weekend | 7 | 12 | 18 |
Video Tutorials
Specifications
Hardware Specifications
- Typical base pressure: 1E-7 to 1E-8 Torr
- All dry pumping system (cryo & scroll pumps)
- Load-lock-equipped system with manual wafer transfer
- Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
- 1x Argon ion source (Filament type)