Difference between revisions of "Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe"

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* [https://youtu.be/R_RYbtumU20 Adjusting TLD Voltage to Capture SE vs. BSE Signal]  
* [https://youtu.be/R_RYbtumU20 Adjusting TLD Voltage to Capture SE vs. BSE Signal]  
===== Graphical Handouts =====
===== Graphical Handouts =====
* [https://caltech.box.com/s/14ffgscc39vhrvlyva0jbucsep7j6dvv SEM Concepts]
* [https://caltech.box.com/s/pxl99bbc1jm1tbjshfaotm91xm0mqs1i SEM Concepts]
* [https://caltech.box.com/s/kxaxtslwol1o5a276f3lrqbhss8zvwje Ga-FIB Concepts]
* [https://caltech.box.com/s/kxaxtslwol1o5a276f3lrqbhss8zvwje Ga-FIB Concepts]
* [https://caltech.box.com/s/k2iy75hxiwkehv0ogqelz2sux9e1cs5k SEM & Ga-FIB Alignments]
* [https://caltech.box.com/s/k2iy75hxiwkehv0ogqelz2sux9e1cs5k SEM & Ga-FIB Alignments]
* [https://caltech.box.com/s/ijd8gprg9gcavb6of5uegu7osinzsdet Guide to Optimizing SEM Imaging]
* [https://caltech.box.com/s/ijd8gprg9gcavb6of5uegu7osinzsdet Guide to Optimizing SEM Imaging]
===== Presentations =====
===== Presentations =====
* [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Scanning Electron Microscopy: Principles, Techniques & Applications]
* [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Scanning Electron Microscopy: Principles, Techniques & Applications]

Revision as of 22:00, 12 October 2019

Nova 600
YVO-Nanobeam-Resonator Jake-Rochman.jpg
Instrument Type Microscopy
Techniques SEM, Ga-FIB, Omniprobe,
Immersion Lens Imaging,
GIS, Cross-sectioning,
TEM Lamella Sample Prep
Staff Manager Matthew S. Hunt, PhD
Staff Email matthew.hunt@caltech.edu
Staff Phone 626-395-5994
Reserve time on LabRunr
Request training by email
Sign up for SEM-FIB email list
Lab Location B233B Steele
Lab Phone 626-395-1534
Manufacturer FEI (now Thermo Fisher)
Model Nova 600 NanoLab
Nova-NanoLab-600.jpg

Description

The Nova 600 is a "dual-beam" system that combines a field emission gun (FEG) scanning electron microscope (SEM) with a gallium focused ion beam (Ga-FIB). It can be used to capture high-quality images (clearly resolving sub-10 nm features) and perform site-specific etching and material deposition (creating sub-20 nm features). It is also equipped with an Omniprobe nanomanipulator, which can be used to lift out lamella samples that are prepared for use in a transmission electron microscope (TEM). See a full list of training and educational resources for this instrument below.

SEM Applications
  • Ultra-High-Resolution Imaging (Immersion Mode aka UHR Mode)
  • High-Resolution Imaging (Field-Free Mode aka Normal Mode)
  • Secondary Electron (SE) imaging with an Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
  • Backscattered Electron (BSE) imaging with a TLD
  • Platinum deposition via Gas Injection System (GIS)
  • Automated imaging with RunScript program & AutoScript language
Ga-FIB Applications
  • Directly etch patterns into material
  • Cutting & Imaging Cross-Sections
  • TEM Lamella Sample Preparation using an Omniprobe for Liftout
  • Platinum & SiOx deposition via GIS
  • Enhanced etch with XeF2 via GIS
  • Automated patterning with RunScript program & AutoScript language

Resources

SOPs & Troubleshooting
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals
Simulation Software
Calibrate Measurements with NIST Standard
  • The KNI has a NIST-traceable standard against which SEM and Ga-FIB measurements can be compared. See Slides 54-55 of the SEM Presentation for details. Ask staff for help finding and using the standard in the lab.
Sample Preparation
  • Use the Carbon Evaporator to make non-conductive samples conductive by applying 2-10 nm of evaporated carbon.
  • Use the O2/Ar Plasma Cleaner to remove hydrocarbons from the sample surface to avoid creating dark contamination spots on your features while imaging them.
Order Your Own Stubs
  • Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some old stubs at each SEM/FIB, yet you should buy your own so that you can keep them clean and available to you. There are many stub geometries and configurations, some of which will be right for you to purchase and keep with your other cleanroom items.

Specifications

Manufacturer Specifications
SEM Specifications
  • Minimum Feature Size Resolved in Immersion Mode: ~5 nm
  • Voltage Range: 0.2 to 30.0 kV
  • Current Range: ~10 pA to 20 nA
  • Apertures: 10 μm, 15 μm, 20 μm, 30 μm
  • Eucentric Height: ~5.15 mm working distance (WD)
  • Stage Range: ±80 mm X & Y travel, 12 mm Z travel, -12 to 58° tilt, 360° rotation
  • ETD Grid Bias Range: -150 to 300 V
  • TLD Bias Range: -100 to 150 V
  • Ultimate Vacuum: 5e-7 mbar
Ga-FIB Specifications
  • Minumum Probe Size Achieved: ~7 nm
  • Minimum Feature Size Etched: ~25 nm
  • Minimum Feature Size Resolved by Imaging: ~10 nm
  • Voltage Range: 5 to 30 kV
  • Current Range: 1 pA to 20 nA
  • Eucentric Height: ~5.15 mm working distance (WD)
  • Stage Tilt to be perpendicular to Ga-FIB: 52°
  • ETD Grid Bias Range: -150 to 300 V
  • TLD Bias Range: -100 to 150 V



Related Instrumentation in the KNI

Scanning Electron Microscopes (SEMs)
Focused Ion Beam (FIB) Systems
Sample Preparation for Microscopy
Transmission Electron Microscopes
Scanning Probe Microscopes
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