Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe

Nova 600 Instrument Type Microscopy Techniques SEM, Ga-FIB, Omniprobe, Immersion Lens Imaging, GIS, Cross-sectioning, TEM Lamella Sample Prep Staff Manager Matthew S. Hunt, PhD Staff Email matthew.hunt@caltech.edu Staff Phone 626-395-5994 Reserve time on LabRunr Request training by email Lab Location B233B Steele Lab Phone 626-395-1534 Manufacturer FEI (now Thermo Fisher) Model Nova 600 NanoLab

Description

The Nova 600 is a "dual-beam" system that combines a field emission gun (FEG) scanning electron microscope (SEM) with a gallium focused ion beam (Ga-FIB). It can be used to capture high-quality images (clearly resolving sub-10 nm features) and perform site-specific etching and material deposition (creating sub-20 nm features). It is also equipped with an Omniprobe nanomanipulator, which can be used to lift out lamella samples that are prepared for use in a transmission electron microscope (TEM). See a full list of training and educational resources for this instrument below.

SEM Applications

• Ultra-High-Resolution Imaging (Immersion Mode aka UHR Mode)
• High-Resolution Imaging (Field-Free Mode aka Normal Mode)
• Secondary Electron (SE) imaging with an Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
• Backscattered Electron (BSE) imaging with a TLD
• Platinum deposition via Gas Injection System (GIS)
• Automated imaging with RunScript program & AutoScript language

Ga-FIB Applications

• Directly etch patterns into material
• Cutting & Imaging Cross-Sections
• TEM Lamella Sample Preparation using an Omniprobe for Liftout
• Platinum & SiO_x deposition via GIS
• Enhanced etch with XeF₂ via GIS
• Automated patterning with RunScript program & AutoScript language

Resources

SOPs & Troubleshooting

• SEM SOPs (Short Version | Long Version)
• Ga-FIB SOPs (Short Version | Long Version)
• TEM Lamella Sample Preparation SOPs (Short Version | Long Version)
• Cutting & Imaging Cross-Sections SOP
• Troubleshooting Guide

Video Tutorials

• Getting Started | Basic SEM Alignment
• Astigmatism Correction (Details | On Right-Angle Features | Stigmator Alignment)
• Eucentric Height: What it means, When to use it & How to get there
• TEM Lamella Sample Prep (Playlist)
• Cutting & Imaging Cross-sections (Playlist)
• Milling Non-Conductive Samples using Charge Compensation
• Perfecting Ga-FIB Alignments
• Adjusting TLD Voltage to Capture SE vs. BSE Signal

Graphical Handouts

• SEM Concepts
• Ga-FIB Concepts
• SEM & Ga-FIB Alignments
• Guide to Optimizing SEM Imaging

Presentations

• Scanning Electron Microscopy: Principles, Techniques & Applications
• Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications

Manufacturer Manuals

• Nova NanoLab Operation Manual
• EDAX Genesis EDS & WDS Operation Manual
• Gas Injection Systems – Deposition of Platinum (Technical Note)
• Gas Injection Systems – Deposition of SiOx (Technical Note)
• Gas Injection Systems – Etching with IEE aka XeF2 Etch (Technical Note)
• Gas Injection Systems – Beam Chemistries Presentation
• Scripting – AutoScript Language Manual (year 2000 Technical Note: most complete)
• Scripting – AutoScript Language Manual (year 2005 Technical Note: less complete, still useful)
• Scripting – RunScript Manual

Simulation Software

• CASINO Electron Beam Simulation Software – simulate e-beam/specimen interactions
• The Stopping & Range of Ions in Matter (SRIM) – simulate i-beam/specimen interactions

Calibrate Measurements with NIST Standard

• The KNI has a NIST-traceable standard against which SEM and Ga-FIB measurements can be compared. See Slides 54-55 of the SEM Presentation for details. Ask staff for help finding and using the standard in the lab.

Sample Preparation

• Use the Carbon Evaporator to make non-conductive samples conductive by applying 2-10 nm of evaporated carbon.
• Use the O₂/Ar Plasma Cleaner to remove hydrocarbons from the sample surface to avoid creating dark contamination spots on your features while imaging them.

Order Your Own Stubs

• Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some old stubs at each SEM/FIB, yet you should buy your own so that you can keep them clean and available to you. There are many stub geometries and configurations, some of which will be right for you to purchase and keep with your other cleanroom items.
  • Buy stubs with copper clips (recommended for most devices, esp with non-conductive substrates);
  • Buy stubs without copper clips (ok for devices with conductive substrates)

Specifications

Manufacturer Specifications

• Nova 600 NanoLab Data Sheet (not all parameters apply to our instrument, see below for details specific to the KNI's Nova 600)

SEM Specifications

• Minimum Feature Size Resolved in Immersion Mode: ~5 nm
• Voltage Range: 0.2 to 30.0 kV
• Current Range: ~10 pA to 20 nA
• Apertures: 10 μm, 15 μm, 20 μm, 30 μm
• Eucentric Height: ~5.15 mm working distance (WD)
• Stage Range: ±80 mm X & Y travel, 12 mm Z travel, -12 to 58° tilt, 360° rotation
• ETD Grid Bias Range: -150 to 300 V
• TLD Bias Range: -100 to 150 V
• Ultimate Vacuum: 5e-7 mbar

Ga-FIB Specifications

• Minumum Probe Size Achieved: ~7 nm
• Minimum Feature Size Etched: ~25 nm
• Minimum Feature Size Resolved by Imaging: ~10 nm
• Voltage Range: 5 to 30 kV
• Current Range: 1 pA to 20 nA
• Eucentric Height: ~5.15 mm working distance (WD)
• Stage Tilt to be perpendicular to Ga-FIB: 52°
• ETD Grid Bias Range: -150 to 300 V
• TLD Bias Range: -100 to 150 V

Related Instrumentation in the KNI

Scanning Electron Microscopes (SEMs)

• Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
• Nova 200 NanoLab: SEM, EDS & WDS
• Sirion: SEM & EDS
• Quanta 200F: SEM, ESEM, Lithography & Probe Station

Focused Ion Beam (FIB) Systems

• Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
• ORION NanoFab: Helium, Neon & Gallium FIB

Sample Preparation for Microscopy

• Carbon Evaporator (Leica EM ACE600) to make samples conductive
• Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface

Transmission Electron Microscopes

• Tecnai TF-30: TEM, STEM, EDS & HAADF (50-300 kV)
• Tecnai TF-20: TEM, STEM, EDS, EELS, EFTEM & Lithography (40-200 kV)

Scanning Probe Microscopes

• Dimension Icon: Atomic Force Microscope (AFM)
• Dektak 3ST: Profilometer