Difference between revisions of "Equipment List"

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= Microscopy =
 
= Microscopy =
 
===== Focused Ion Beam (FIB) Systems =====
 
===== Focused Ion Beam (FIB) Systems =====
* He/Ne/Ga-FIB: Zeiss ORION NanoFab
+
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab]]
* [[Nova_600_NanoLab:_SEM,_Ga-FIB,_Omniprobe|Ga-FIB/SEM/Omniprobe: Thermo Fisher Nova 600 NanoLab]]
+
* [[Nova_600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM/Ga-FIB/GIS/Omniprobe: Thermo Fisher Nova 600 NanoLab]]
  
 
===== Scanning Electron Microscopes (SEMs) =====
 
===== Scanning Electron Microscopes (SEMs) =====
* SEM/EDS/WDS: Thermo Fisher Nova 200 NanoLab
+
* [[Nova 200 NanoLab: SEM, EDS & WDS | SEM/EDS/WDS: Thermo Fisher Nova 200 NanoLab]]
* SEM/EDS: Thermo Fisher Sirion
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* [[Sirion: SEM & EDS | SEM/EDS: Thermo Fisher Sirion]]
* SEM/ESEM: Thermo Fisher Quanta 200F
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* [[Quanta 200F: SEM, ESEM & Probe Station | SEM/ESEM: Thermo Fisher Quanta 200F]]
* [[Nova_600_NanoLab:_SEM,_Ga-FIB,_Omniprobe|SEM/Ga-FIB/Omniprobe: Thermo Fisher Nova 600 NanoLab]]
+
* [[Nova_600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM/Ga-FIB/GIS/Omniprobe: Thermo Fisher Nova 600 NanoLab]]
 
===== Transmission Electron Microscopes (TEMs) =====
 
===== Transmission Electron Microscopes (TEMs) =====
* TEM/STEM/EDS/HAADF: Thermo Fisher Tecnai TF-30 (80-300 kV)
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* [[Tecnai TF-30: 300 kV TEM, STEM, EDS & HAADF | TEM/STEM/EDS/HAADF: Thermo Fisher Tecnai TF-30 (80-300 kV)]]
* TEM/STEM/EDS/EELS/EFTEM/NPGS: Thermo Fisher Tecnai TF-20 (80-200 kV)
+
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | TEM/STEM/EDS/EELS/EFTEM/NPGS: Thermo Fisher Tecnai TF-20 (80-200 kV)]]
  
 
===== Scanning Probe Microscopes =====
 
===== Scanning Probe Microscopes =====
* Atomic Force Microscope (AFM): Bruker Dimension ICON
+
* [[Dimension ICON: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension ICON]]
* Profilometer: Veeco Dektak 3ST
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* [[Veeco Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]
 
===== Optical Characterization =====
 
===== Optical Characterization =====
* Spectroscopic Ellipsometry: Woolam M-2000
+
* [[Woolam M-2000: Spectroscopic Ellipsometer | Spectroscopic Ellipsometry: Woolam M-2000]]
* Light Microscope: Olympus BX51M with Filmetrics model F40
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* [[Olympus BX51M with Filmetrics F40: Light Microscope | Light Microscope: Olympus BX51M with Filmetrics model F40]]
* Fluorescence Microscope: Olympus IX81
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* [[Olympus IX81: Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
  
 
= Support Tools =
 
= Support Tools =
 
===== Thermal Processing =====
 
===== Thermal Processing =====
* Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)
+
* [[Tystar Tytan 1 & 2: Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* Rapid Thermal Processing: Modular Process Technology RTP-600S
+
* [[RTP-600S: Rapid Thermal Processor | Rapid Thermal Processing: Modular Process Technology RTP-600S]]
* Rapid Thermal Annealer: Jipelec Jetfirst 150  
+
* [[Jipelec Jetfirst 150: Rapid Thermal Annealer | Rapid Thermal Annealer: Jipelec Jetfirst 150]]
 
===== Substrate Processing =====
 
===== Substrate Processing =====
* Scriber-Breaker: Dynatex GST-150
+
* [[Dynatex GST-150: Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]
* Wafer Bonder: Suss MicroTec model SB6L
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* [[Suss MicroTec SB6L: Wafer Bonder | Wafer Bonder: Suss MicroTec model SB6L]]
* Critical Point Dryer: Tousimis Automegasamdri 915B
+
* [[TA 915B: Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
  
 
===== Device Processing =====
 
===== Device Processing =====
* Wedge-Wedge Wire Bonder: Westbond model 7476D-79
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* [[Westbond 7476D-79: Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* Electrical Probing Station: Cascade Microtech M150
+
* [[Cascade Microtech M150: Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]

Revision as of 17:08, 23 April 2019

Lithography

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography

Deposition

Evaporation
Sputtering
Chemical Vapor Deposition (CVD)
Dielectric Packaging / Moisture Barrier

Etching

Dry Etching
Wet Etching

Microscopy

Focused Ion Beam (FIB) Systems
Scanning Electron Microscopes (SEMs)
Transmission Electron Microscopes (TEMs)
Scanning Probe Microscopes
Optical Characterization

Support Tools

Thermal Processing
Substrate Processing
Device Processing