Difference between revisions of "CHA: Electron Beam Evaporator"

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* All dry pumping system (cryo & dry mechanical pump)
* All dry pumping system (cryo & dry mechanical pump)
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
== Related Instrumentation in the KNI ==
===== Sputtering Systems =====
* [[ATC Orion 8: Chalcogenide Sputter System|ATC Orion 8: Chalcogenide Sputter System]]
* [[ATC Orion 8: Dielectric Sputter System|ATC Orion 8: Dielectric Sputter System]]
===== Electron Beam Evaporation Systems =====
* [[Labline: Electron Beam Evaporator|Labline: Electron Beam Evaporator]]
===== Chemical Vapor Deposition =====
* [[FlexAL II: Atomic Layer Deposition (ALD)|FlexAL II: Atomic Layer Deposition (ALD)]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD)|Plasma-Enhanced Chemical Vapor Deposition (PECVD)]]

Revision as of 21:18, 20 September 2019

CHA Evaporator
CHA-Industries-Mark-40 E-Beam-Evaporator.jpg
Instrument Type Deposition
Techniques E-beam Evaporation
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on LabRunr
Request training by email
Sign up for E-beam Evaporator email list
Lab Location B235C Steele
Lab Phone 626-395-1539
Manufacturer CHA Industries
Model Mark 40

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications
  • Metal & Oxide Deposition
  • Lift-off
  • Etch Hard-mask Formation

Resources

SOPs & Troubleshooting

Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.

Video Tutorials

Specifications

Hardware Specifications
  • Typical base pressure: 1E-6 to 1E-7 Torr
  • All dry pumping system (cryo & dry mechanical pump)
  • Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source

Related Instrumentation in the KNI

Sputtering Systems
Electron Beam Evaporation Systems
Chemical Vapor Deposition