Difference between revisions of "CHA: Electron Beam Evaporator"

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|Model = Mark 40
|Model = Mark 40
|Techniques = E-beam Evaporation
|Techniques = E-beam Evaporation
|EmailList = cha-labline
|EmailList = kni-cha
|EmailListName =  E-beam Evaporator
|EmailListName =  E-beam Evaporator
}}
}}

Revision as of 21:40, 20 February 2020

CHA Evaporator
CHA-Industries-Mark-40 E-Beam-Evaporator.jpg
Instrument Type Deposition
Techniques E-beam Evaporation
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on LabRunr
Request training by email
Sign up for E-beam Evaporator email list
Lab Location B235C Steele
Lab Phone 626-395-1539
Manufacturer CHA Industries
Model Mark 40

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications
  • Metal & Oxide Deposition
  • Lift-off
  • Etch Hard-mask Formation

Resources

SOPs & Troubleshooting

Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.

Video Tutorials

Specifications

Hardware Specifications
  • Typical base pressure: 1E-6 to 1E-7 Torr
  • All dry pumping system (cryo & dry mechanical pump)
  • Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source

Related Instrumentation in the KNI

Sputtering Systems
Electron Beam Evaporation Systems
Chemical Vapor Deposition