CHA: Electron Beam Evaporator: Difference between revisions
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* All dry pumping system (cryo & dry mechanical pump) | * All dry pumping system (cryo & dry mechanical pump) | ||
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source | * Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source | ||
== Related Instrumentation in the KNI == | |||
===== Sputtering Systems ===== | |||
* [[ATC Orion 8: Chalcogenide Sputter System|ATC Orion 8: Chalcogenide Sputter System]] | |||
* [[ATC Orion 8: Dielectric Sputter System|ATC Orion 8: Dielectric Sputter System]] | |||
===== Electron Beam Evaporation Systems ===== | |||
* [[Labline: Electron Beam Evaporator|Labline: Electron Beam Evaporator]] | |||
===== Chemical Vapor Deposition ===== | |||
* [[FlexAL II: Atomic Layer Deposition (ALD)|FlexAL II: Atomic Layer Deposition (ALD)]] | |||
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD)|Plasma-Enhanced Chemical Vapor Deposition (PECVD)]] | |||
Revision as of 21:18, 20 September 2019
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Description
The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.
Applications
- Metal & Oxide Deposition
- Lift-off
- Etch Hard-mask Formation
Resources
SOPs & Troubleshooting
Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.
Video Tutorials
Specifications
Hardware Specifications
- Typical base pressure: 1E-6 to 1E-7 Torr
- All dry pumping system (cryo & dry mechanical pump)
- Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source