AJA Orion ATC Series Electron Beam Evaporator: Difference between revisions
Jump to navigation
Jump to search
m (Removed link to Equipment Status under Resources since the status can be viewed directly by users in FBS, per Tiffany 4/15/24 sg) |
|||
| Line 28: | Line 28: | ||
===== SOPs & Troubleshooting ===== | ===== SOPs & Troubleshooting ===== | ||
* [https://caltech.box.com/s/zygxa14nklirrtd6aw0fjdvqlggdyjh6 Standard Operating Procedures (SOP)] | * [https://caltech.box.com/s/zygxa14nklirrtd6aw0fjdvqlggdyjh6 Standard Operating Procedures (SOP)] | ||
=== Tool Reservation Rules === | === Tool Reservation Rules === | ||
Revision as of 00:41, 26 April 2024
|
Description
The AJA International ATC Orion Series system allows for electron beam evaporation of various metals, oxides, and semiconductors. This tool is a true UHV design equipped with dedicated heating jackets and internal heat lamps for an efficient bake-out process. A multi-crystal QCM protects against failed processes due to real-time thickness measurement errors and allows for long periods of maintained UHV conditions by removing the need to vent the chamber for regular sensor upkeep. In addition, crucibles may be swapped without breaking chamber vacuum via the use of a dedicated manual crucible exchanging system.
Applications
- Metal deposition
- Semiconductor deposition (in-situ doping not possible)
- Oxide deposition
- Lift-off
Resources
SOPs & Troubleshooting
Tool Reservation Rules
| Advanced Reservation (days) | Limit per Reservation (hrs) | Limit per week (hrs) | |
|---|---|---|---|
| Weekday | 7 | 6 | 18 |
| Weeknight | 7 | 8 | 18 |
| Weekend | 7 | 12 | 18 |
Video Tutorials
- [linkgoeshere General System Operation]
- [linkgoeshere In-Situ Crucible Exchange]
Specifications
Hardware Specifications
- Typical base pressure: <5E-9 Torr
- All dry pumping system (cryo & scroll pumps)
- Load-lock-equipped system with automatic wafer transfer
- Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
- Pockets 1-4 allow in-situ crucible exchange through dedicated secondary load lock, allowing for crucible swap without breaking UHV chamber conditions.
- Accepts up to 1x 150mm wafer or smaller wafers/pieces
- Optional lift-off dome holds 4x 100mm wafers for batch processing
- Camera for E-Beam/Crucible observation during process
- Inficon CrystalSix(TM)
- 6-crystal QCM with automatic crystal switching in event of crystal fail or low Q. Enables long periods of maintained UHV conditions without requiring venting to exchange crystals
- Programmable deposition processes