Difference between revisions of "Tube Furnaces for Wet & Dry Processing"

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|InstrumentName = Tystar Tytan Tube Furnaces 1 & 2
|InstrumentName = Tystar Tytan Tube Furnaces 1 & 2
|HeaderColor = #E6E7E8
|HeaderColor = #E6E7E8
|ImageOne =  
|ImageOne = Tystar-Tytan-Tube-Furnaces.jpg
|ImageTwo =  
|ImageTwo =  
|InstrumentType = [[Equipment_List#Support_Tools|Support Tools]]
|InstrumentType = [[Equipment_List#Support_Tools|Support Tools]],<br>[[Equipment_List#Thermal_Processing|Thermal Processing]]
|RoomLocation =  
|RoomLocation = B235 Steele
|LabPhone = 626-395-1532
|LabPhone = 626-395-1532
|PrimaryStaff = [[Nathan S. Lee]]
|PrimaryStaff = [[Kelly McKenzie]]
|StaffEmail = nathslee@caltech.edu
|StaffEmail = kmmckenz@caltech.edu
|StaffPhone = 626-395-1319
|StaffPhone = 626-395-5732
|Manufacturer = Tystar Corporation
|Manufacturer = Tystar Corporation
|Model = Tystar Tytan Horizontal Diffusion Furnace
|Model = Tytan Horizontal<br>Diffusion Furnace
|Techniques = Oxidation/Annealing
|Techniques = Oxidation, Annealing
|EmailList = kni-tystar@caltech.edu
|EmailList = kni-tystar
|EmailListName = tystar
|EmailListName = Tystar
}}
}}
== Description ==
== Description ==
The system is designed for processing up to 100 ea. 150 mm (6") wafers per tube. Tube 1 is designated for Wet/Dry oxidation using Flask Evaporator. Tube 2 is designated for Dry oxidation/Anneal.   
The system is designed for processing up to one-hundred, 150 mm (6") silicon or sapphire wafers per tube and can accommodate smaller sample sizes also. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.   
===== Applications =====
===== Applications =====
* Dry/Wet oxidation
* Dry & Wet oxidation
* Annealing
* Annealing
===== Allowed Materials =====
* Silicon or sapphire that is completely free of metal or organic contamination
** Recommended to have undergone a standard RCA clean or similar beforehand
* No other sample material allowed
* No metal or organic contamination
** Wafers must not have been contacted by metal tweezers, etc. without appropriate cleaning to remove metal contamination
===== Gas List =====
* Nitrogen
* Oxygen
* Water Vapor (Tube 1)
== Resources ==
===== Equipment Status =====
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Furnace1 or Furnace2 from the dropdown menu)
===== Tystar Oxidation Recipe =====
* [https://caltech.box.com/s/nqiiqwlhip4dcult2mtuvvdlxw0gv086 Wet Oxidation 1000C ]
===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/yrvj5tar3r2e2ldq9orm2bh5mlkavw05 KNI SOP ]

Latest revision as of 05:38, 30 June 2022

Tystar Tytan Tube Furnaces 1 & 2
Tystar-Tytan-Tube-Furnaces.jpg
Instrument Type Support Tools,
Thermal Processing
Techniques Oxidation, Annealing
Staff Manager Kelly McKenzie
Staff Email kmmckenz@caltech.edu
Staff Phone 626-395-5732
Reserve time on LabRunr
Request training by email
Sign up for Tystar email list
Lab Location B235 Steele
Lab Phone 626-395-1532
Manufacturer Tystar Corporation
Model Tytan Horizontal
Diffusion Furnace

Description

The system is designed for processing up to one-hundred, 150 mm (6") silicon or sapphire wafers per tube and can accommodate smaller sample sizes also. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.

Applications
  • Dry & Wet oxidation
  • Annealing
Allowed Materials
  • Silicon or sapphire that is completely free of metal or organic contamination
    • Recommended to have undergone a standard RCA clean or similar beforehand
  • No other sample material allowed
  • No metal or organic contamination
    • Wafers must not have been contacted by metal tweezers, etc. without appropriate cleaning to remove metal contamination
Gas List
  • Nitrogen
  • Oxygen
  • Water Vapor (Tube 1)

Resources

Equipment Status
Tystar Oxidation Recipe
SOPs & Troubleshooting