Difference between revisions of "Matthew S. Hunt, PhD"

From the KNI Lab at Caltech
Jump to navigation Jump to search
Line 63: Line 63:


== Personal ==
== Personal ==
Note that Matt changed his name from Matthew Hunt Sullivan to Matthew Sullivan Hunt in 2015 after getting married (and while working at Caltech).
Note that Matt changed his name from Matthew Hunt Sullivan to Matthew Sullivan Hunt in 2016 after getting married (and while working at Caltech).

Revision as of 05:38, 16 October 2019

Matthew S. Hunt, PhD
Matthew-S-Hunt.jpg
Title Assistant Director of
Staff Research
& Lead Microscopist
Responsibilities Microscopy, Lithography,
Staff Research Projects
Email matthew.hunt@caltech.edu
Phone 626-395-5994 (office)
203-470-0861 (cell)
Office 303 Steele

About

Role in the KNI

Matthew Hunt is the Assistant Director of Staff Research and Lead Microscopist for The Kavli Nanoscience Institute (KNI) at the California Institute of Technology. He directs research projects that are carried out by KNI technical staff, in collaboration with Caltech & non-Caltech PIs and student researchers, with the purpose of creating new nanofabrication techniques using the KNI's leading edge instrumentation. He also manages the KNI's suite of microscopy equipment – transmission electron microscopes, scanning electron microscopes, focused ion beam systems, an atomic force microscope, and related sample preparation equipment.

Matt joined the KNI in 2014 after completing his PhD related to the high temperature oxidation of turbine engine materials, through which he developed expertise in a number of electron, ion and x-ray microscopy techniques. His research interests lie in the development of new lithography and microscopy techniques that utilize various beam species (e.g. helium ions, neon ions, gallium ions, electrons) and the application thereof to the kinds of novel materials and devices that are important to users of the KNI.

Education

Matt received his Ph.D. and M.S. in Materials Science & Engineering from the University of California, Irvine and a B.S. in Chemical Engineering from the University of Notre Dame.

Lecture Materials

A slide from the microscopy presentations showing schematics of three emission sources – a field emission gun (FEG) for an SEM, a liquid metal ion source (LMIS) for a Ga-FIB, and a gas field ion source (GFIS) for a He- & Ne-FIB
Microscopy Presentations
Video Demonstrations
  • SEM & Ga-FIB Alignments (Playlist)
  • SEM & Ga-FIB Techniques (Playlist)
  • Cutting & Imaging Cross-Sections (Playlist)
  • TEM Lamella Sample Preparation with SEM/Ga-FIB (Playlist)
  • Helium & Neon Ion Microscopy Alignments & Techniques (Playlist)
  • Preparing a gas field ion source (GFIS) trimer for He- & Ne-FIB (Playlist)

Selected Publications

Articles
Figure 4a-c from "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," depicting 5.4 nm wide lines of resist, spaced 17 nm apart, written with 35 keV helium ions on silicon, shown before etch in (a) plan view and (b) tilted view, then (c) after etch in titled view. All images were captured using 30 keV helium ion microscopy. https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911
  • Scott M. Lewis, Matthew S. Hunt, Guy A. DeRose, Hayden R. Alty, Jarvis Li, Alex Wertheim, Lucia De Rose, Grigore A. Timco, Axel Scherer, Stephen G. Yeates, and Richard E. P. Winpenny, "Plasma-Etched Pattern Transfer of Sub-10 nm Structures Using a Metal–Organic Resist and Helium Ion Beam Lithography," ACS Nano Letters 2019, available online: https://pubs.acs.org/doi/10.1021/acs.nanolett.9b01911.
  • Scott M. Lewis, Guy A. DeRose, Matthew S. Hunt, Hayden Alty, Alex Werthiem, Jarvis Li, Trevor Fowler, Axel Scherer, Stepen G. Yeates, Richard E. P. Winpenny et al, "Design and Implementation of the Next Generation Electron Beam Resists for the Production of EUVL Photomasks," Photomask Technology 2018, p 24. https://doi.org/10.1117/12.2501808.
  • Scott M. Lewis, Antonio Fernandez, Guy A. DeRose, Matthew S. Hunt, Axel Scherer, Stephen G. Yeates, Richard E. P. Winpenny et al, "Use of Supramolecular Assemblies as Lithographic Resists," Angew. Chem. Int. Ed. 2017, 56 (24), 6749–6752. https://doi.org/10.1002/anie.201700224.
  • Matthew (Sullivan) Hunt, Daniel R. Mumm, "Transient stage oxidation of MCrAlY bond coat alloys in high temperature, high water vapor content environments," Surface and Coatings Technology 2014, Vol 258, 963-972. https://doi.org/10.1016/j.surfcoat.2014.07.048
  • Matthew (Sullivan) Hunt, Daniel R. Mumm, "Vapor-Phase-Mediated Phenomena Associated with High Temperature, High Water Content Oxidation of MCrAlX Bond Coats," Oxidation of Metals 2014, Vol 82. 1. https://doi.org/10.1007/s11085-014-9473-8
Conference Presentations

List of Managed Instruments

Microscopy & Lithography
Support Tools for Microscopy

Personal

Note that Matt changed his name from Matthew Hunt Sullivan to Matthew Sullivan Hunt in 2016 after getting married (and while working at Caltech).