Rapid Thermal Processor

Solaris Rapid Thermal Processor Instrument Type Metrology Techniques Rapid Thermal Processing Staff Manager Alex Wertheim Staff Email alexw@caltech.edu Staff Phone 626-395-3371 Reserve time on FBS Request training via FBS User Dashboard Lab Location B235 Steele Lab Phone 626-395-1539 Manufacturer Surface Science Integration Model Solaris 150

Description

The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

Applications

• Temperature range from room temperature to 1200 degrees C.
• Processing gasses available:
  • Nitrogen
  • Argon
  • Forming Gas (5% H2 in N2)

Resources

SOPs

• Solaris 150 – Rapid Thermal Processor -Short SOP
• Solaris 150 – Rapid Thermal Processor -Long SOP

Manuals

• Solaris 150 - Rapid Thermal Processor Manual