Rapid Thermal Processor: Difference between revisions

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== Resources ==
== Resources ==
===== SOPs =====
===== SOPs =====
* SHORT [https://caltech.app.box.com/file/1270820147602]
*[https://caltech.box.com/s/9less1mp9tg7xya8ugycnw11dhw0lnjf Solaris 150 – Rapid Thermal Processor -Short SOP]
* LONG [https://caltech.app.box.com/file/1270821163104]
*[https://caltech.box.com/s/7uozrq6pmgkcr6l8u3qhnka9sgtgf3u9 Solaris 150 – Rapid Thermal Processor -Long SOP]
 


===== Manuals =====
===== Manuals =====
* Solaris 150 [https://caltech.app.box.com/file/1237887943601]
*[https://caltech.app.box.com/file/1237887943601 Solaris 150 - Rapid Thermal Processor Manual]
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Latest revision as of 23:51, 23 August 2024

Solaris Rapid Thermal Processor
RTP.jpeg
Instrument Type Metrology
Techniques Rapid Thermal Processing
Staff Manager Alireza Ghaffari
Staff Email alireza@caltech.edu
Staff Phone 626-395-3984
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B235 Steele
Lab Phone 626-395-1539
Manufacturer Surface science integration
Model Solaris 150

Description

The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

Applications
  • Temperature range from room temperature to 1200 degrees C.
  • Processing gasses available:
    • Nitrogen
    • Argon
    • Forming Gas (5% H2 in N2)

Resources

SOPs


Manuals




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