Nova 200 NanoLab: SEM & EDS: Difference between revisions
Jump to navigation
Jump to search
No edit summary |
|||
(26 intermediate revisions by 5 users not shown) | |||
Line 7: | Line 7: | ||
|RoomLocation = B203 Steele | |RoomLocation = B203 Steele | ||
|LabPhone = 626-395-1542 | |LabPhone = 626-395-1542 | ||
|PrimaryStaff = [[ | |PrimaryStaff = [[Alireza Ghaffari]] | ||
|StaffEmail = | |StaffEmail = alireza@caltech.edu | ||
|StaffPhone = 626-395- | |StaffPhone = 626-395-3984 | ||
|Manufacturer = FEI (now Thermo Fisher) | |Manufacturer = FEI (now Thermo Fisher) | ||
|Model = Nova 200 NanoLab | |Model = Nova 200 NanoLab | ||
|Techniques = SEM, EDS | |Techniques = SEM, EDS<br>Immersion Lens Imaging | ||
|RequestTraining = | |RequestTraining = alireza@caltech.edu | ||
|EmailList = kni-sem-fib | |EmailList = kni-sem-fib | ||
|EmailListName = SEM-FIB | |EmailListName = SEM-FIB | ||
}} | }} | ||
== Description == | == Description == | ||
The Nova 200 is the KNI's highest-resolution field-emission gun (FEG) analytical scanning electron microscope (SEM), equipped with an immersion lens for imaging sub-10 nm features and | The Nova 200 is the KNI's highest-resolution field-emission gun (FEG) analytical scanning electron microscope (SEM), equipped with an immersion lens for imaging sub-10 nm features and energy dispersive spectroscopy (EDS) for compositional analysis. It is also outfitted with a gallium focused ion beam (Ga-FIB) column, which is currently not operational because the [[Nova_600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | Nova 600 NanoLab]] and [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab]] together meet the KNI's Ga-FIB demand; Ga-FIB could be reactivated on the Nova 200 in the future. See a full list of training and educational resources for this instrument below. | ||
===== SEM Applications ===== | ===== SEM Applications ===== | ||
* Ultra-High-Resolution Imaging (Immersion Mode aka UHR Mode) | * Ultra-High-Resolution Imaging (Immersion Mode aka UHR Mode) | ||
Line 26: | Line 26: | ||
* Tungsten deposition via Gas Injection System (GIS) | * Tungsten deposition via Gas Injection System (GIS) | ||
* Automated imaging with RunScript program & AutoScript language | * Automated imaging with RunScript program & AutoScript language | ||
===== EDS | ===== EDS Applications ===== | ||
* Spectrum acquisition for quantitative compositional analysis | * Spectrum acquisition for qualitative and quantitative compositional analysis | ||
* Linescan acquisition for 1D spatial compositional analysis | * Linescan acquisition for 1D spatial compositional analysis | ||
* Map acquisition for 2D spatial compositional analysis | * Map acquisition for 2D spatial compositional analysis | ||
== Resources == | == Resources == | ||
===== SOPs & | ===== Equipment Status ===== | ||
* | * [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Nova 200 NanoLab from the dropdown menu) | ||
* EDS | |||
* [https://caltech.box.com/s/ | ===== SOPs & Manuals & SDS ===== | ||
* [https://caltech.box.com/s/mpsxkxmf5y8wjw9daijwbudeoqkkeudu KNI Microscopy Policies] | |||
* [https://caltech.box.com/s/4f1hqp83pwc1v1k5qke6xi68i28fjvz8 Nova200 and EDS SOP, Manuals, SDS] | |||
* [https://caltech.box.com/s/og4309108q4k2jwhkaxqtpiujg2al5iu Nova NanoLab Operation Manual] | |||
* [https://caltech.box.com/s/fime6qbew8bj2zac9a0vc4gx4qaivssd Bruker Quantax EDS Operation Manual] | |||
* [https://caltech.box.com/s/zb5m72tc5c61pegangjjwj3wc8rbj1vr Gas Injection Systems – Deposition of Tungsten (Technical Note)] | |||
* [https://caltech.box.com/s/th6cpko7opc9pccn2ukmdc88oh8oa6zw Gas Injection Systems – Delineation Etch for SiO<sub>2</sub> (Technical Note)] | |||
* [https://caltech.box.com/s/u56ho1hve4pf9713aw09iolukfc8wsb1 Gas Injection Systems – Selective Carbon Etching (Technical Note)] | |||
* [https://caltech.box.com/s/110tb0o8avjziwa1y4d017dbbcpkxfop Scripting – AutoScript Language Manual (year 2000 Technical Note: most complete)] | |||
* [https://caltech.box.com/s/tlqgvtkkiahi261megm087i61gqlfzrc Scripting – RunScript Manual] | |||
===== Video Tutorials ===== | ===== Video Tutorials ===== | ||
* [https://youtu.be/UfF_ljwvepQ Getting Started] | [https://youtu.be/luC-5TgNPsQ Basic SEM Alignment] | * [https://youtu.be/UfF_ljwvepQ Getting Started] | [https://youtu.be/luC-5TgNPsQ Basic SEM Alignment] | ||
* Astigmatism Correction ([https://youtu.be/YeukVt1Fyi0 Details] | [https://youtu.be/WFfOi-rwlbA On Right-Angle Features] | [https://youtu.be/1syySgnTEqU Stigmator Alignment]) | * Astigmatism Correction ([https://youtu.be/YeukVt1Fyi0 Details] | [https://youtu.be/WFfOi-rwlbA On Right-Angle Features] | [https://youtu.be/1syySgnTEqU Stigmator Alignment]) | ||
* [https://youtu.be/ | * [https://youtu.be/R_RYbtumU20 Adjusting TLD Voltage to Capture SE vs. BSE Signal] | ||
* [https:// | * Bruker EDS ESPRIT 2 Software ([https://caltech.app.box.com/file/766742876889 Overview] | [https://caltech.box.com/s/gbzj8crfyhwkvs3aelsjpdfe9zpd8goc Basic Spectrum Collection and ID] | [https://caltech.app.box.com/file/766741864978?s=l77v3pct05r6q856sq53az5t0bugc6n4 Spectrum Acquisiton] | [https://caltech.box.com/s/cjshqsjmpto2sac78xw46anc6j1fl2y6 AutoID Verification] | [https://caltech.box.com/s/lbywvcpdw4t1i892b2bo0qg7jztf23jb Object Mode (Multi-Point Analysis)] | [https://caltech.app.box.com/file/766738174372 Line Profile Analysis]) | ||
===== Graphical Handouts ===== | ===== Graphical Handouts ===== | ||
* [https://caltech.box.com/s/pxl99bbc1jm1tbjshfaotm91xm0mqs1i SEM & EDS/WDS Concepts] | * [https://caltech.box.com/s/pxl99bbc1jm1tbjshfaotm91xm0mqs1i SEM & EDS/WDS Concepts] | ||
Line 46: | Line 57: | ||
* [https://caltech.box.com/s/ijd8gprg9gcavb6of5uegu7osinzsdet Guide to Optimizing SEM Imaging] | * [https://caltech.box.com/s/ijd8gprg9gcavb6of5uegu7osinzsdet Guide to Optimizing SEM Imaging] | ||
===== Presentations ===== | ===== Presentations ===== | ||
* SEM Essentials: Capabilities and Limitations of Scanning Electron Microscopy; and SEM Setup, Parameters and Theory for Successful Operations and Measurements | |||
**[https://caltech.box.com/s/eg20eqw7si5ka0bms251qurfwhys0hta Download .pptx Slides] | |||
* Scanning Electron Microscopy: Principles, Techniques & Applications | * Scanning Electron Microscopy: Principles, Techniques & Applications | ||
** [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f | ** [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f .pptx Slides] | [https://youtu.be/Zh21tp3aPEw YouTube Lecture] | ||
* Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications | * Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications | ||
** [https://caltech.box.com/s/f4k8jan85n5lf6f2tutjx4rkfzjq7y68 | ** [https://caltech.box.com/s/f4k8jan85n5lf6f2tutjx4rkfzjq7y68 .pptx Slides] | [https://youtu.be/3eSzisbNcGo YouTube Lecture] | ||
===== Simulation Software ===== | ===== Simulation Software ===== | ||
* [http://www.gel.usherbrooke.ca/casino/What.html CASINO Electron Beam Simulation Software] – simulate e-beam/specimen interactions (very useful for EDS & WDS) | * [http://www.gel.usherbrooke.ca/casino/What.html CASINO Electron Beam Simulation Software] – simulate e-beam/specimen interactions (very useful for EDS & WDS) | ||
Line 69: | Line 73: | ||
* Use the [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | | * Use the [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | | ||
O<sub>2</sub>/Ar Plasma Cleaner]] to remove hydrocarbons from the sample surface to avoid creating dark contamination spots on your features while imaging them. | O<sub>2</sub>/Ar Plasma Cleaner]] to remove hydrocarbons from the sample surface to avoid creating dark contamination spots on your features while imaging them. | ||
===== | ===== Stubs for specimen mounting ===== | ||
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some | * Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions. | ||
** [https://www.tedpella.com/sem_html/SEMpinmount.htm Buy stubs without copper clips] | ** [https://www.tedpella.com/sem_html/SEMpinmount.htm Buy stubs without copper clips] | ||
===== Guide to Choosing KNI SEMs & FIBs ===== | ===== Guide to Choosing KNI SEMs & FIBs ===== | ||
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]] | *[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]] | ||
Line 91: | Line 96: | ||
<br> | <br> | ||
<br> | <br> | ||
Latest revision as of 17:01, 16 November 2023
|
Description
The Nova 200 is the KNI's highest-resolution field-emission gun (FEG) analytical scanning electron microscope (SEM), equipped with an immersion lens for imaging sub-10 nm features and energy dispersive spectroscopy (EDS) for compositional analysis. It is also outfitted with a gallium focused ion beam (Ga-FIB) column, which is currently not operational because the Nova 600 NanoLab and ORION NanoFab together meet the KNI's Ga-FIB demand; Ga-FIB could be reactivated on the Nova 200 in the future. See a full list of training and educational resources for this instrument below.
SEM Applications
- Ultra-High-Resolution Imaging (Immersion Mode aka UHR Mode)
- High-Resolution Imaging (Field-Free Mode aka Normal Mode)
- Secondary Electron (SE) imaging with an Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
- Backscattered Electron (BSE) imaging with a TLD
- Tungsten deposition via Gas Injection System (GIS)
- Automated imaging with RunScript program & AutoScript language
EDS Applications
- Spectrum acquisition for qualitative and quantitative compositional analysis
- Linescan acquisition for 1D spatial compositional analysis
- Map acquisition for 2D spatial compositional analysis
Resources
Equipment Status
- LabRunr Equipment Status (Select Nova 200 NanoLab from the dropdown menu)
SOPs & Manuals & SDS
- KNI Microscopy Policies
- Nova200 and EDS SOP, Manuals, SDS
- Nova NanoLab Operation Manual
- Bruker Quantax EDS Operation Manual
- Gas Injection Systems – Deposition of Tungsten (Technical Note)
- Gas Injection Systems – Delineation Etch for SiO2 (Technical Note)
- Gas Injection Systems – Selective Carbon Etching (Technical Note)
- Scripting – AutoScript Language Manual (year 2000 Technical Note: most complete)
- Scripting – RunScript Manual
Video Tutorials
- Getting Started | Basic SEM Alignment
- Astigmatism Correction (Details | On Right-Angle Features | Stigmator Alignment)
- Adjusting TLD Voltage to Capture SE vs. BSE Signal
- Bruker EDS ESPRIT 2 Software (Overview | Basic Spectrum Collection and ID | Spectrum Acquisiton | AutoID Verification | Object Mode (Multi-Point Analysis) | Line Profile Analysis)
Graphical Handouts
Presentations
- SEM Essentials: Capabilities and Limitations of Scanning Electron Microscopy; and SEM Setup, Parameters and Theory for Successful Operations and Measurements
- Scanning Electron Microscopy: Principles, Techniques & Applications
- Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications
Simulation Software
- CASINO Electron Beam Simulation Software – simulate e-beam/specimen interactions (very useful for EDS & WDS)
- The Stopping & Range of Ions in Matter (SRIM) – simulate i-beam/specimen interactions
Calibrate Measurements with NIST Standard
- The KNI has a NIST-traceable standard against which SEM measurements can be compared. See Slides 54-55 of the SEM Presentation for details. Ask staff for help finding and using the standard in the lab.
Sample Preparation
- Use the Carbon Evaporator to make non-conductive samples conductive by applying 2-10 nm of evaporated carbon.
- Use the O2/Ar Plasma Cleaner to remove hydrocarbons from the sample surface to avoid creating dark contamination spots on your features while imaging them.
Stubs for specimen mounting
- Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.
Guide to Choosing KNI SEMs & FIBs
Specifications
Manufacturer Specifications
- Nova 200 NanoLab Data Sheet (not all parameters apply to our instrument, see below for details specific to the KNI's Nova 200)
SEM Specifications
- Minimum Feature Size Resolved in Immersion Mode: ~5 nm
- Voltage Range: 0.2 to 30.0 kV
- Current Range: ~10 pA to 20 nA
- Apertures: 30 μm, 40 μm, 50 μm, 100 μm
- Eucentric Height: ~4.8 mm working distance (WD)
- Stage Range: ±25 mm X & Y travel, 50 mm Z travel, -12 to 58° tilt, 360° rotation
- ETD Grid Bias Range: -150 to 300 V
- TLD Bias Range: -100 to 150 V
- Ultimate Vacuum: 5e-6 mbar