Difference between revisions of "Labline: Electron Beam Evaporator"

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|ImageTwo =  
|ImageTwo =  
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|RoomLocation = B123 Steele
|RoomLocation = B235C Steele
|LabPhone = 626-395-1539
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alex Wertheim]]
|PrimaryStaff = [[Alex Wertheim]]

Revision as of 21:10, 27 May 2019

Labline Evaporator
Instrument Type Deposition
Techniques E-beam Evaporation,
Ion-Assisted Deposition (IAD),
Ion Milling
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on LabRunr
Request training by email
Sign up for Labline email list
Lab Location B235C Steele
Lab Phone 626-395-1539
Manufacturer Kurt J. Lesker Company
Model Labline


The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.

  • Metal deposition (Ti, Pt, Au, Al)
  • Lift-off
  • Non-selective etch
  • Ion-assisted deposition (simultaneous etching & deposition)


SOPs & Troubleshooting
Video Tutorials


Hardware Specifications
  • Typical base pressure: 1E-7 to 1E-8 Torr
  • All dry pumping system (cryo & scroll pumps)
  • Load-lock-equipped system with manual wafer transfer
  • Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
  • 1x Argon ion source (Filament type)