Difference between revisions of "Labline: Electron Beam Evaporator"

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(Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Labline E-beam Evaporator |HeaderColor = #F2682A |ImageOne = KJLC-Labline-Metal-Evaporator.jpg |ImageTwo = |InstrumentType = ...")
 
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|StaffPhone = 626-395-3371
|StaffPhone = 626-395-3371
|Manufacturer = Kurt J. Lesker Company
|Manufacturer = Kurt J. Lesker Company
|Techniques = E-beam evaporation,<br>Ion-assisted deposition (IAD),</br>Ion milling
|Model = Labline
|Techniques = E-beam Evaporation,<br>Ion-Assisted Deposition (IAD),</br>Ion Milling
|EmailList = kni-labline@caltech.edu
|EmailList = kni-labline@caltech.edu
|EmailListName =  Labline
|EmailListName =  Labline
}}
}}
== Description ==
== Description ==
The Labline electron beam evaporator system is a load-locked platform with cryopump for fast sample turnaround and user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning and ion-assisted deposition during evaporation.
The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.


===== Applications =====
===== Applications =====
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* Lift-off
* Lift-off
* Non-selective etch
* Non-selective etch
* Ion-assisted deposition (simultaneous etching + deposition)
* Ion-assisted deposition (simultaneous etching & deposition)


== Resources ==
== Resources ==
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===== Hardware Specifications =====
===== Hardware Specifications =====
* Typical base pressure: 1E-7 to 1E-8 Torr
* Typical base pressure: 1E-7 to 1E-8 Torr
* All dry pumping system (cryo + scroll pumps)
* All dry pumping system (cryo & scroll pumps)
* Load lock equipped system with manual wafer transfer
* Load-lock-equipped system with manual wafer transfer
* Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
* Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
* 1x Argon ion source (Filament type)
* 1x Argon ion source (Filament type)

Revision as of 19:49, 27 May 2019

Labline E-beam Evaporator
KJLC-Labline-Metal-Evaporator.jpg
Instrument Type Deposition
Techniques E-beam Evaporation,
Ion-Assisted Deposition (IAD),
Ion Milling
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on LabRunr
Request training by email
Sign up for Labline email list
Lab Location B123 Steele
Lab Phone 626-395-1539
Manufacturer Kurt J. Lesker Company
Model Labline

Description

The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.

Applications
  • Metal deposition (Ti, Pt, Au, Al)
  • Lift-off
  • Non-selective etch
  • Ion-assisted deposition (simultaneous etching & deposition)

Resources

SOPs & Troubleshooting
Video Tutorials

Specifications

Hardware Specifications
  • Typical base pressure: 1E-7 to 1E-8 Torr
  • All dry pumping system (cryo & scroll pumps)
  • Load-lock-equipped system with manual wafer transfer
  • Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
  • 1x Argon ion source (Filament type)