The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.
- Metal & Oxide deposition
- Etch hard-mask formation
SOPs & Troubleshooting
- Typical base pressure: 1E-6 to 1E-7 Torr
- All dry pumping system (cryo + dry mechanical pump)
- Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source