EBPG 5200: 100 kV Electron Beam Lithography

EBPG 5200 File:EBPG-5200-Research-Image.jpg Instrument Type Lithography Techniques Electron Beam Lithography Staff Manager Guy A. DeRose, PhD Staff Email derose@caltech.edu Staff Phone 626-395-3423 Reserve time on FBS Request training via FBS User Dashboard Lab Location B233C Steele Lab Phone 626-395-1531 /1540 Manufacturer Raith Lithography BV Model {{{Model}}}

Description

The Raith EBPG 5200 is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 3" wafers, piece parts from a couple of mm to 3" diameter and up to 6.35mm thick, and 6" mask plates. This instrument can be outfitted with substrate holders to handle up to 200mm wafers. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.

Opertional Applications

• Non-aligned electron beam lithography
• Aligned (AKA direct-write) electron beam lithography

Scientific / technical Applications

• Nanophotonics
• Nano-optics
• Waveguides

Resources

SOPs & Troubleshooting

• EBPG SOP Type (Short Version | Long Version)
• KNI SOP
• Other SOP1
• Other SOP2
• Troubleshooting Guide

Video Tutorials

• Video 1 | Video 2
• Video Series: (Part 1 | Part 2 | Part 3)

Graphical Handouts

• Handout 1
• Handout 2

Presentations

• Presentation 1
• Presentation 2

Manufacturer Manuals

• Manual 1
• Manual 2

Specifications

Manufacturer Specifications

• Manufacturer Data Sheet

Specifications

• Voltage Range: 20, 50 or 100 kV
• Current Range: 50 pA - >200 nA
• Main Field size: Up to 1mm x 1mm
• Main Field resolution: 20 bit
• Maximum writing frequency: 100 MHz
• Aperture Sizes: 200um, 300um, 400um
• etc.