The system is designed for processing up to one-hundred, 150 mm (6") silicon or sapphire wafers per tube and can accommodate smaller sample sizes also. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.
Applications
Dry & Wet oxidation
Annealing
Allowed Materials
Silicon or sapphire that is completely free of metal or organic contamination
Recommended to have undergone a standard RCA clean or similar beforehand
No other sample material allowed
No metal or organic contamination
Wafers must not have been contacted by metal tweezers, etc. without appropriate cleaning to remove metal contamination
