Labline: Electron Beam Evaporator

Labline E-beam Evaporator Instrument Type Deposition Techniques E-beam evaporation, Ion-assisted deposition (IAD), Ion milling Staff Manager Alex Wertheim Staff Email alexw@caltech.edu Staff Phone 626-395-3371 Reserve time on FBS Request training via FBS User Dashboard Lab Location B123 Steele Lab Phone 626-395-1539 Manufacturer Kurt J. Lesker Company Model {{{Model}}}

Description

The Labline electron beam evaporator system is a load-locked platform with cryopump for fast sample turnaround and user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning and ion-assisted deposition during evaporation.

Applications

• Metal deposition (Ti, Pt, Au, Al)
• Lift-off
• Non-selective etch
• Ion-assisted deposition (simultaneous etching + deposition)

Resources

SOPs & Troubleshooting

• KNI SOP
• Troubleshooting Guide

Video Tutorials

• Labline Training

Specifications

Hardware Specifications

• Typical base pressure: 1E-7 to 1E-8 Torr
• All dry pumping system (cryo + scroll pumps)
• Load lock equipped system with manual wafer transfer
• Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
• 1x Argon ion source (Filament type)