For non-conductive specimens that cannot be effectively SEM- or FIB-imaged with some combination of low voltage, low current, zero detector bias, and scanning filters, depositing a thin (e.g. 2-10 nm), conductive layer of carbon on the surface can help. This carbon evaporator produces amorphous, conductive films, the morphology of which is not detectable in an SEM or FIB image. After imaging is complete, the carbon can be gently removed with an O2 plasma using, for example, the lab's Tergeo Plus Plasma Cleaner.
Applications
Coat material surface to make sample conductive for use in an SEM or FIB
Coat resist surface to make sample conductive for use with e-beam lithography
Apply carbon to a specimen or device for any other fabrication use
Resources
The Carbon Evaporator source needs to be periodically disconnected from the instrument by the user so that the carbon thread can be changed; see the SOP and notes in the SOP section on this page for instructions on how to change the thread
Note: always install as a "double thread," i.e. double the thread back over itself before installing – a thread length that is approximately twice the length of the evaporator's door width is long enough to double over and install.
