Carbon Evaporator

Carbon Evaporator & Sputter Coater Instrument Type Deposition, Sample Prep for Microscopy Techniques Carbon Deposition and Gold Sputtering Staff Manager Yonghwi Kim Staff Email ykim@caltech.edu Staff Phone 626-395-5994 Reserve time on FBS Request training via FBS User Dashboard Lab Location B233 Steele Lab Phone 626-395-5885 Manufacturer Leica Model EM ACE600

Description

For non-conductive specimens that cannot be effectively SEM- or FIB-imaged with some combination of low voltage, low current, zero detector bias, and scanning filters, depositing a thin conductive layer of carbon on the surface can improve imaging. This carbon evaporator produces high-quality amorphous films with thicknesses ranging from sub-nm to 10 nm, with a morphology that is generally undetectable in electron microscopes. After imaging, the carbon layer can be gently removed using an O₂ plasma, for example, with the lab's Tergeo Plus Plasma Cleaner. The is also equipped with a metal sputtering capability (e.g., Au), which produces a fine-grained metallic layer and expands its range of applications.

Applications

• Coat a material surface to make a sample conductive for SEM or FIB imaging.
• Coat resist surface to make a ample conductive for e-beam lithography.
• Apply carbon to a specimen or device for other fabrication purposes.

Possible Target Materials & Deposition Methods

• Carbon — via evaporation
• Metal (e.g., Au, Pt, Cr, W) — via sputtering

Resources

Equipment Data

The Carbon Evaporator source needs to be periodically disconnected from the instrument by the user so that the carbon thread can be changed; see the SOP and notes in the SOP section on this page for instructions on how to change the thread

SOP & Troubleshooting

• SOP & Troubleshooting Guide
• The procedure to install a new carbon thread can be found on Page 39 of the Operating Manual
  • Note: always install as a "double thread," i.e. double the thread back over itself before installing – a thread length that is approximately twice the length of the evaporator's door width is long enough to double over and install.

Video

• Leica's Product Overview Video

Technical Notes

• Technical Notes Provided by Leica

Manufacturer Manual

• Operating Manual

Specifications

Manufacturer Specifications

• Manufacturer Product Guide

Carbon Evaporation Specifications

• Average Deposition Rate: ~1 nm per pulse, when using a double thread (i.e. a thread that is doubled over on itself; see notes in SOP section above)
• Monitor deposition thickness using the quartz crystal thickness monitor, or simply program the number of pulses that you want

Related Instrumentation in the KNI

Sample Preparation for Microscopy

• Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface
• Carbon Evaporator (Leica EM ACE600) to make samples conductive
• TEM Sample Preparation Equipment: Polishing Stations, 3 mm Disk Cutter, Dimpler, Argon Ion Mill

Scanning Electron & Ion Microscopes

• Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe
• Nova 200 NanoLab: SEM, EDS & WDS
• Sirion: SEM & EDS
• Quanta 200F: SEM, ESEM, Lithography & Probe Station
• ORION NanoFab: Helium, Neon & Gallium FIB