Labline: Electron Beam Evaporator: Difference between revisions
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(Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Labline E-beam Evaporator |HeaderColor = #F2682A |ImageOne = KJLC-Labline-Metal-Evaporator.jpg |ImageTwo = |InstrumentType = ...") |
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|StaffPhone = 626-395-3371 | |StaffPhone = 626-395-3371 | ||
|Manufacturer = Kurt J. Lesker Company | |Manufacturer = Kurt J. Lesker Company | ||
|Techniques = E-beam | |Model = Labline | ||
|Techniques = E-beam Evaporation,<br>Ion-Assisted Deposition (IAD),</br>Ion Milling | |||
|EmailList = kni-labline@caltech.edu | |EmailList = kni-labline@caltech.edu | ||
|EmailListName = Labline | |EmailListName = Labline | ||
}} | }} | ||
== Description == | == Description == | ||
The Labline electron beam evaporator system is a load-locked platform with cryopump for fast sample turnaround and user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning and ion-assisted deposition during evaporation. | The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation. | ||
===== Applications ===== | ===== Applications ===== | ||
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* Lift-off | * Lift-off | ||
* Non-selective etch | * Non-selective etch | ||
* Ion-assisted deposition (simultaneous etching | * Ion-assisted deposition (simultaneous etching & deposition) | ||
== Resources == | == Resources == | ||
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===== Hardware Specifications ===== | ===== Hardware Specifications ===== | ||
* Typical base pressure: 1E-7 to 1E-8 Torr | * Typical base pressure: 1E-7 to 1E-8 Torr | ||
* All dry pumping system (cryo | * All dry pumping system (cryo & scroll pumps) | ||
* Load lock equipped system with manual wafer transfer | * Load-lock-equipped system with manual wafer transfer | ||
* Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source | * Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source | ||
* 1x Argon ion source (Filament type) | * 1x Argon ion source (Filament type) | ||
Revision as of 19:49, 27 May 2019
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Description
The Labline electron beam evaporator system is a load-locked platform with a cryopump for fast sample turnaround and a user-friendly interface for precise control of film parameters during deposition. It is fitted with a Kaufman and Robinson EH 400 End-Hall permanent magnet ion source that can be used for cleaning substrates and ion-assisted deposition during evaporation.
Applications
- Metal deposition (Ti, Pt, Au, Al)
- Lift-off
- Non-selective etch
- Ion-assisted deposition (simultaneous etching & deposition)
Resources
SOPs & Troubleshooting
Video Tutorials
Specifications
Hardware Specifications
- Typical base pressure: 1E-7 to 1E-8 Torr
- All dry pumping system (cryo & scroll pumps)
- Load-lock-equipped system with manual wafer transfer
- Evaporation Source: 1x single emitter, 4-pocket e-beam evaporation source
- 1x Argon ion source (Filament type)